[1] |
Lee J K, Babaeva N Y, Kim H C, Manuilenko O V, Shon JW2004 IEEE Trans. Plasma Sci. 32 47 |
[2] |
Boyle P C, Ellingboe A R, Turner M M 2004 Plasma Sourc. Sci. Technol. 13 493 |
[3] |
Kitajima T, Takeo Y, Petrovic Z L, Makabe T 2000 Appl. Phys. Lett. 77 489 |
[4] |
Kim H C, Lee J K, Shon J W 2003 Phys. Plasmas 10 4545 |
[5] |
Chung T H 2005 Phys. Plasmas 12 104503 |
[6] |
Salabas A, Brinkmann R P 2005 Plasma Sourc. Sci. Technol. 14 S53 |
[7] |
Boyle P C, Ellingboe A R, Turner M M 2004 J. Phys. D: Appl. Phys. 37 697 |
[8] |
Kim H C, Lee J K 2005 Phys. Plasmas 12 053501 |
[9] |
Kim H C, Lee J K 2004 Phys. Rev. Lett. 93 085003 |
[10] |
Kawamura E, Lieberman M A, Lichtenberg A J 2006 Phys. Plasmas 13 053506 |
[11] |
Lee J K, Manuilenko O V, Babaeva N Yu, Kim H C, Shon J W 2005 Plasma Sourc. Sci. Technol. 14 89 |
[12] |
Lowe H D, Goto H H, Ohmi T 1991 J. Vac. Sci. Technol. A 9 3090 |
[13] |
Goto H H, Lowe H D, Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048 |
[14] |
Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L J, Makabe T 2004 J. Appl. Phys. 95 870 |
[15] |
Karkari S K, Ellingboe A R 2006 Appl. Phys. Lett. 88 101501 |
[16] |
Ohmori T, Goto T K, Kitajima T, Makabe T 2003 Appl. Phys. Lett. 83 4637 |
[17] |
Li X S, Bi Z H, Chang D L, Li Z C 2008 Appl. Phys. Lett. 93 031504 |
[18] |
Li Z C, Chang D L, Li X S, Bi Z H, Lu W Q 2010 Phys. Plasmas 17 033501 |
[19] |
Lisovskiy V A, Yegorenkov V D 2006 Vacuum 80 458 |
[20] |
Sudit I D, Chen F F 1994 Plasma Sourc. Sci. Technol. 3 162 |
[21] |
Braithwaite N S J, Benjamin N M P, Allen J E 1987 J. Phys. E: Sci. Instrum. 20 1046 |
[22] |
Paranjpe A P, McVittie J P, Self S A 1990 J. Appl. Phys. 67 6718 |
[23] |
Hebner G A, Paterson A M 2010 Plasma Sourc. Sci. Technol. 19 015020 |
[24] |
Kitajima T, Takeo Y, Makabe T 1999 J. Vac. Sci. Technol. A 17 2510 |
[25] |
Schulze J, Gans T, O’Connell D, Czarnetzki U, Ellingboe A R, Turner M M 2007 J. Phys. D 40 7008 |
[26] |
Ishimaru M, Ohba T, Ohmori T, Yagisawa T, Kitajima T, Makabe T. 2008 Appl. Phys. Lett. 92 071501 |
[27] |
Chen Z Y, Donnelly V M, Economou D J, Chen L, Funk M, Sundararajan R 2009 J. Vac. Sci. Technol. A 27 1159 |
[28] |
Karkari S K, Ellingboe A R, Gaman C 2008 Appl. Phys. Lett. 93 071501 |
[29] |
Booth J P, Curley G, Mari′c D, Chabert P 2010 Plasma Sourc. Sci. Technol. 19 01500 |
[30] |
Lu W Q (Chinese Patent) 200610134481.0. [2007-06-27] [陆文琪 中国专利] 200610134481.0. [2007-06-27] |
[31] |
Huddlestone R H, Leonard S L 1965 Plasma Diagnostic Techniques (New York: Academic) pp 150, 183 |
[32] |
Zhao G L, Xu Y, Shang J P, Zhu A M, Lu W Q, Wang Y N 2009 Modern Phys. Lett. B 23 3409 |
[33] |
Overzet L J, Hopkins M B 1993 Appl. Phys. Lett. 63 2484 |
[34] |
Lieberman M A, Lichtenberg A J 2007 (Translated by Pa Y K) Principles of Plasma Discharges and Mayeriols Processing (2nd Ed.) (in Chinese) [迈克尔 · A. 力伯曼, 阿伦 · J. 里登伯格著, 蒲以康 等译 2007 等离子体 放电原理与材料处理 (北京: 科学出版社) p 291] |
[35] |
Gogolides E, Sawin H H 1992 J. Appl. Phys. 72 3971 |
[36] |
Bukowski J D, Graves D B, Vitello P 1996 J. Appl. Phys. 80 2614 |
[37] |
Stewart R A, Vitello P, Graves D B, Jaeger E F, Berry L A 1995 Plasma Sourc. Sci. Technol. 4 36 |
[38] |
Nitschke T E, Graves D B 1994 J. Appl. Phys. 76 5646 |
[39] |
Boeuf J P, Pitchford L C 1995 Phys. Rev. E 51 1376 |
[40] |
Godyak V A, Piejak R B, Alexandrovich BM1992 Plasma Sourc. Sci. Technol. 1 36 |