基于光谱椭偏仪的纳米光栅无损检测

马智超; 徐智谋; 彭静; 孙堂友; 陈修国; 赵文宁; 刘思思; 武兴会; 邹超; 刘世元

doi:10.7498/aps.63.039101

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摘要

本文制备了硅基和光刻胶两种材料的纳米光栅，利用自研制的新型广义椭偏仪对该纳米结构的光栅进行了测量，随后利用建立的拟合模型对其测量数据进行了拟合，结果证明了运用该仪器进行纳米光栅结构无损检测的可行性，在入射角60，方位角75的测量条件下，纳米结构关键尺寸、侧壁角等三维形貌参数的测量精度最大可达99.97%，最大误差小于1%，该技术对于无损检测有着一定的推动意义.

关键词:

纳米压印 /
光栅 /
无损检测 /
拟合

作者及机构信息

1.
华中科技大学光学与电子信息学院, 武汉 430074;

2.
武汉科技大学理学院, 武汉 430081;

3.
华中科技大学数学制造装备与技术国家重点实验室, 武汉 430074

基金项目: 国家自然科学基金（批准号：61076042，60607006）、国家重大科学仪器设备开发专项（批准号：2011YQ16000205）和国家高技术研究发展计划（批准号：2011AA03A106）资助的课题.

参考文献

[1]	Chou S Y, Krauss P R, Renstrom P J 1996 Science 272 85
[2]	Colburn M, Suez I, Choi B J, Meissl M, Bailey T, Sreenivasan S V, Ekerdt J G, Grant Willson C 2001 J. Vac. Sci. Technol. B 19 2685
[3]	Ding Y, Hyun Wook Ro, Alvine K J, Okerberg B C, Zhou J, Douglas J F, Karim A, Soles C L 2008 Adv. Funct. Mater. 18 1854
[4]	Ding Y, Hyun Wook Ro, Douglas J F, Jones R L, Hine D R, Karim A, Soles C L 2007 Adv. Mater. 19 1377
[5]	Tan C L, Yi Y X, Wang G P 2002 Acta Phys. Sin. 51 1063(in Chinese) [淡春雷, 易永祥, 汪国平 2002 物理学报 51 1063]
[6]	Takuya Ohzono, Hirohmi Watanabe, Richard Vendamme, Carina kamaga, Toyoki Kunitake, Teruya Ishihara, Masatsugu Shimomura 2007 Adv. Mater. 19 3229
[7]	Ren L Y, Liu L R, Liu D A, Luan Z 2003 Acta Phys. Sin. 52 2788(in Chinese)[任立勇, 刘立人, 刘德安, 栾竹 2003 物理学报 52 2788]
[8]	Jones R L, Tengjiao Hu, Soles C L, Lin E K, Reano R M, Pang S W, Casa D M 2006 Nano Letters 6 1728
[9]	Zhao H J, Peng Y J, Tan Y 2009 Chin. Phys. B 18 2326
[10]	Fuard D, Corinne, Farys V, Gourgon C, Schiavone P 2005 J. Vac. Sci. Technol. B 23 3069
[11]	Wang J P, Jin Y X, Ma J Y 2010 Chin. Phys. B 19 054202
[12]	Jones R L, Hu T J, Lin E K, Wen L W 2003 Appl. Phys. Lett. 83 4059
[13]	Lei Y H, Liu X, Guo J C 2011 Chin. Phys. B 20 042901
[14]	Mu Q Q, Liu Y J, Hu L F 2006 Acta Phys. Sin. 55 1055 (in Chinese) [穆全全, 刘永军, 胡立发 2006 物理学报 55 1055]
[15]	Zhang Z, Xu Z M, Sun T Y 2013 Acta Phys. Sin. 62 168102 (in Chinese) [张铮, 徐智谋, 孙堂友 2013 物理学报 62 168102]
[16]	Lee J H, Ro H W, Huang R, Lemaillet P, Germer T A, Soles C L, Stafford C M 2012 Nano Letters 12 5995
[17]	Patrick H J, Germer T A, Ding Y, Ro H W, Richter L J, Soles C L 2008 Appl. Phys. Lett. 93 233105
[18]	Herzinger C M, Johs B, MCGahan W A, Woollam J A 1998 J. Appl. Phys. 83 3323
[19]	Stafford C M, Harrison C, Beers K L, Karim A, Amis E J, Vanlandingham M R, Kim H, Willivolksen, Miller R D, Simonyi E E 2004 Nat. Mater. 3 345
[20]	El kodadi M, Soulan S, Mbesacier, Schiavone P 2009 Micro. Engin. 86 1040
[21]	Al-Assaad R M, Li T, Hu W C 2008 J. Micro/Nanolith. MEMS MOEMS 7 013008

施引文献

[1]	Chou S Y, Krauss P R, Renstrom P J 1996 Science 272 85
[2]	Colburn M, Suez I, Choi B J, Meissl M, Bailey T, Sreenivasan S V, Ekerdt J G, Grant Willson C 2001 J. Vac. Sci. Technol. B 19 2685
[3]	Ding Y, Hyun Wook Ro, Alvine K J, Okerberg B C, Zhou J, Douglas J F, Karim A, Soles C L 2008 Adv. Funct. Mater. 18 1854
[4]	Ding Y, Hyun Wook Ro, Douglas J F, Jones R L, Hine D R, Karim A, Soles C L 2007 Adv. Mater. 19 1377
[5]	Tan C L, Yi Y X, Wang G P 2002 Acta Phys. Sin. 51 1063(in Chinese) [淡春雷, 易永祥, 汪国平 2002 物理学报 51 1063]
[6]	Takuya Ohzono, Hirohmi Watanabe, Richard Vendamme, Carina kamaga, Toyoki Kunitake, Teruya Ishihara, Masatsugu Shimomura 2007 Adv. Mater. 19 3229
[7]	Ren L Y, Liu L R, Liu D A, Luan Z 2003 Acta Phys. Sin. 52 2788(in Chinese)[任立勇, 刘立人, 刘德安, 栾竹 2003 物理学报 52 2788]
[8]	Jones R L, Tengjiao Hu, Soles C L, Lin E K, Reano R M, Pang S W, Casa D M 2006 Nano Letters 6 1728
[9]	Zhao H J, Peng Y J, Tan Y 2009 Chin. Phys. B 18 2326
[10]	Fuard D, Corinne, Farys V, Gourgon C, Schiavone P 2005 J. Vac. Sci. Technol. B 23 3069
[11]	Wang J P, Jin Y X, Ma J Y 2010 Chin. Phys. B 19 054202
[12]	Jones R L, Hu T J, Lin E K, Wen L W 2003 Appl. Phys. Lett. 83 4059
[13]	Lei Y H, Liu X, Guo J C 2011 Chin. Phys. B 20 042901
[14]	Mu Q Q, Liu Y J, Hu L F 2006 Acta Phys. Sin. 55 1055 (in Chinese) [穆全全, 刘永军, 胡立发 2006 物理学报 55 1055]
[15]	Zhang Z, Xu Z M, Sun T Y 2013 Acta Phys. Sin. 62 168102 (in Chinese) [张铮, 徐智谋, 孙堂友 2013 物理学报 62 168102]
[16]	Lee J H, Ro H W, Huang R, Lemaillet P, Germer T A, Soles C L, Stafford C M 2012 Nano Letters 12 5995
[17]	Patrick H J, Germer T A, Ding Y, Ro H W, Richter L J, Soles C L 2008 Appl. Phys. Lett. 93 233105
[18]	Herzinger C M, Johs B, MCGahan W A, Woollam J A 1998 J. Appl. Phys. 83 3323
[19]	Stafford C M, Harrison C, Beers K L, Karim A, Amis E J, Vanlandingham M R, Kim H, Willivolksen, Miller R D, Simonyi E E 2004 Nat. Mater. 3 345
[20]	El kodadi M, Soulan S, Mbesacier, Schiavone P 2009 Micro. Engin. 86 1040
[21]	Al-Assaad R M, Li T, Hu W C 2008 J. Micro/Nanolith. MEMS MOEMS 7 013008

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基于光谱椭偏仪的纳米光栅无损检测

1. 华中科技大学光学与电子信息学院, 武汉 430074;

2. 武汉科技大学理学院, 武汉 430081;

3. 华中科技大学数学制造装备与技术国家重点实验室, 武汉 430074

基金项目:

国家自然科学基金（批准号：61076042，60607006）、国家重大科学仪器设备开发专项（批准号：2011YQ16000205）和国家高技术研究发展计划（批准号：2011AA03A106）资助的课题.

收稿日期: 2013-10-09

修回日期: 2013-10-20

刊出日期: 2014-02-05

摘要: 本文制备了硅基和光刻胶两种材料的纳米光栅，利用自研制的新型广义椭偏仪对该纳米结构的光栅进行了测量，随后利用建立的拟合模型对其测量数据进行了拟合，结果证明了运用该仪器进行纳米光栅结构无损检测的可行性，在入射角60，方位角75的测量条件下，纳米结构关键尺寸、侧壁角等三维形貌参数的测量精度最大可达99.97%，最大误差小于1%，该技术对于无损检测有着一定的推动意义.

关键词:

纳米压印 /
光栅 /
无损检测 /
拟合

Nondestructive detection of nano grating by generalized ellipsometer

1.
School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China;

2.
College of Sciences, Wuhan University of Science and Technology, Wuhan 430081, China;

3.
State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China

Fund Project:

Project supported by the National Natural Science Foundation of China (Grant Nos. 61076042, 60607006), the Special Project on Development of National Key Scientic Instruments and Equipment of China (Grant No. 2011YQ16000205), and the National High Technology Research and Development Program of China (Grant No. 2011AA03A106).

Received Date: 09 October 2013

Accepted Date: 20 October 2013

Published Online: 05 February 2014

Abstract: The silicon nanometer structure grating and the photoresist nanometer structure grating were prepared. A fitting model was built on the new self-developed generalized ellipsometer. Then, the gratings was tested and fitted. Results proved that the machine could work well in nondestructive test of nano grating. Under the condition of the incident angle of 60 and the azimuth angle of 75, the measurement accuracy can be up to 99.97% for the three-dimensional morphology parameters such as key dimension and sidewall angle and so on, and the maximum error is less than 1%. This method is significant for the nondestructive test.

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