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氮原子、分子与团簇离子注入Si(111)的特性研究

王培录 刘仲阳 郑思孝 廖小东 杨朝文 唐阿友 师勉恭 杨百方 缪竞威

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氮原子、分子与团簇离子注入Si(111)的特性研究

王培录, 刘仲阳, 郑思孝, 廖小东, 杨朝文, 唐阿友, 师勉恭, 杨百方, 缪竞威

STUDIES ON THE FEATURE OF Si(111) SURFACE IMPLANTED BY NITROGEN ATOM,MOLECULE AND CLUSTER IONS

WANG PEI-LU, LIU ZHONG-YANG, ZHENG SI-XIAO, LIAO XIAO-DONG, YANG CHAO-WEN, TANG A-YOU, SHI MIAN-GONG, YANG BEI-FANG, MIAO JING-WEI
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  • 用椭偏仪、傅氏变换红外吸收谱(FTIR)、X射线光电子能谱(XPS)以及原子力显微镜(AFM)对N+1,N+2,N+10离子高剂量(1.7×1017ions/cm2)注入Si(111)的表面进行测试分析,发现三种不同尺度的离子注入后,均使Si由复折射率变化为实折射率,表面出现含氮硅键的介质层.但其表面形貌各异:N+
    The measurement and analysis were carried out on the Si(111) surface implanted by N+1,N+2,N+10 cluster ions with high doses (1.7×1017ions/cm2) at 76keV energy using ellipsometry,Fourier-transform infrared (FT-IR) absorption spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy.It was found that the medium layer containing Si-N bond on the surface appeared,and their complex refractive index turned into real;however,at the same implantation dose their surface morphologies were different from each other.Expect for a few pittings,the N+1-implanted surface had a best fineness (average roughness Ra≈4.2nm), close to the unimplanted original surface.The N+2-implanted surface had a black dendritic area,and had a poorer fineness (Ra≈16nm).While in the N+10-implanted surface appeared a ripple structure,with the poorest fineness (Ra≈40nm).It was indicated that the roughness of the material surface increased with the ion size and fluence at the high energy in contrast to the cluster implantation at the low energy.
    • 基金项目: 国家自然科学基金重点项目(批准号:19735004、19575033);高等学校博士学科点专项科研基金(批准号:2000061017)资助的课题.
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出版历程
  • 收稿日期:  2000-11-25
  • 刊出日期:  2001-05-20

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