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ZHANG Yifan, JIA Wenzhu, TIAN Gangyu, QU Qingyuan, WANG Dengzhi, CAO Xinmin, ZHOU Jian, SONG Yuanhong. Standing wave effect on the uniformity of potential distribution between electrodes in large area capacitive coupled discharges. Acta Physica Sinica,
2025, 74(13): .
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Song Liu-Qin, Jia Wen-Zhu, Dong Wan, Zhang Yi-Fan, Dai Zhong-Ling, Song Yuan-Hong. Numerical investigation of SiO2 film deposition enhanced by capacitively coupled discharge plasma. Acta Physica Sinica,
2022, 71(17): 170201.
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Lu Yang-Dan, Lü Jian-Guo, Yang Ru-Qi, Lu Bo-Jing, Zhu Li-Ping, Ye Zhi-Zhen. Transparent conductive ZnO:Al/Cu mesh composite film and its electric heating performance. Acta Physica Sinica,
2022, 71(18): 187304.
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Cao Yu, Xue Lei, Zhou Jing, Wang Yi-Jun, Ni Jian, Zhang Jian-Jun. Developments of c-Si1-xGex:H thin films as near-infrared absorber for thin film silicon solar cells. Acta Physica Sinica,
2016, 65(14): 146801.
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Huang Li-Jing, Ren Nai-Fei, Li Bao-Jia, Zhou Ming. Effects of laser irradiation on the photoelectric properties of thermal-annealed metal/fluorine-doped tin oxide transparent conductive films. Acta Physica Sinica,
2015, 64(3): 034211.
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Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica,
2015, 64(10): 107701.
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Chen Ming, Zhou Xi-Ying, Mao Xiu-Juan, Shao Jia-Jia, Yang Guo-Liang. Influence of external magnetic field on properties of aluminum-doped zinc oxide films prepared by RF magnetron sputtering. Acta Physica Sinica,
2014, 63(9): 098103.
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He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on Si. Acta Physica Sinica,
2014, 63(12): 128102.
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Ding Yan-Li, Zhu Zhi-Li, Gu Jin-Hua, Shi Xin-Wei, Yang Shi-E, Gao Xiao-Yong, Chen Yong-Sheng, Lu Jing-Xiao. Effect of deposition rate on the scaling behavior of microcrystalline silicon films prepared by very high frequency-plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(2): 1190-1195.
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Zeng Guang-Gen, Li Bing, Zheng Jia-Gui, Wu Li-Li, Zhang Jing-Quan, Lei Zhi, Li Wei, Feng Liang-Huan. Performance of SnO2:F/SnO2 composite film as front-electrode for CdTe solar cells. Acta Physica Sinica,
2010, 59(10): 7437-7441.
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Song Jie, Guo Yan-Qing, Wang Xiang, Ding Hong-Lin, Huang Rui. Influence of excitation frequency on the growth properties of nanocrystalline silicon films with high hydrogen dilution. Acta Physica Sinica,
2010, 59(10): 7378-7382.
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Yuan He, Sun Chang-Zheng, Xu Jian-Ming, Wu Qing, Xiong Bing, Luo Yi. Design and fabrication of multilayer antireflection coating for optoelectronic devices by plasma enhanced chemical vapor deposition. Acta Physica Sinica,
2010, 59(10): 7239-7244.
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Zhang Xiao-Dan, Sun Fu-He, Xu Sheng-Zhi, Wang Guang-Hong, Wei Chang-Chun, Sun Jian, Hou Guo-Fu, Geng Xin-Hua, Xiong Shao-Zhen, Zhao Ying. Performance optimization of p-i-n type microcrystalline silicon thin films solar cells deposited in single chamber. Acta Physica Sinica,
2010, 59(2): 1344-1348.
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Wu Chen-Guo, Shen Jie, Li Dong, Ma Guo-Hong. Terahertz transmission properties of transparent conducting molybdenum-doped ZnO films. Acta Physica Sinica,
2009, 58(12): 8623-8629.
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Ji Ai-Ling, Ma Li-Bo, Liu Cheng, Wang Yong-Qian. Low temperature fabrication of nanostructured Si-SiOx and Si-SiNx composite films and their photoluminescence features. Acta Physica Sinica,
2004, 53(11): 3818-3822.
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Yang Hui-Dong, Wu Chun-Ｙa, Zhao Ying, Xue Jun-Ｍing, Geng Xin-Ｈua, Xiong Shao-Ｚhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica,
2003, 52(11): 2865-2869.
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Yu Wei, Liu Li-Hui, Hou Hai-Hong, Ding Xue-Cheng, Han Li, Fu Guang-Sheng. Silicon nitride films prepared by helicon wave plasam-enhanced chemical vapour deposition. Acta Physica Sinica,
2003, 52(3): 687-691.
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Cheng Shan-Hua, Ning Zhao-Yuan, Huang Feng. . Acta Physica Sinica,
2002, 51(3): 668-673.
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YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(4): 784-789.
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NING ZHAO-YUAN, CHENG SHAN-HUA, YE CHAO. CHEMICAL BONDING STRUCTURE OF FLUORINATED AMORPHOUS CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(3): 566-571.
doi: 10.7498/aps.50.566
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