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Sun Gui-Hua, Zhang Qing-Li, Luo Jian-Qiao, Sun Dun-Lu, Gu Chang-Jiang, Zheng Li-Li, Han Song, Li Wei-Min. Growth and characterization of Ti:MgAl2O4 laser crystal by Czochralski method. Acta Physica Sinica,
2020, 69(1): 014210.
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Zhang Shi-Yu, Yu Zhi-Nong, Cheng Jin, Wu De-Long, Li Xu-Yang, Xue Wei. Effects of annealing temperature and Ga content on properties of solution-processed InGaZnO thin film. Acta Physica Sinica,
2016, 65(12): 128502.
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Tan Zai-Shang, Wu Xiao-Meng, Fan Zhong-Yong, Ding Shi-Jin. Effect of thermal annealing on the structure and properties of plasma enhanced chemical vapor deposited SiCOH film. Acta Physica Sinica,
2015, 64(10): 107701.
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Gao Xun, Song Xiao-Wei, Guo Kai-Min, Tao Hai-Yan, Lin Jing-Quan. Optical emission spectra of Si plasma induced by femtosecond laser pulse. Acta Physica Sinica,
2011, 60(2): 025203.
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2010, 59(7): 4802-4807.
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Ding Hong-Lin, Liu Kui, Wang Xiang, Fang Zhong-Hui, Huang Jian, Yu Lin-Wei, Li Wei, Huang Xin-Fan, Chen Kun-Ji. Effect of control oxide on the performance of nanocrystalline silicon based double-barrier floating gate memory structure. Acta Physica Sinica,
2008, 57(7): 4482-4486.
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Gao Jian-Xia, Song Guo-Feng, Guo Bao-Shan, Gan Qiao-Qiang, Chen Liang-Hui. Surface plasmon modulated nano-aperture vertical-cavity surface-emitting laser. Acta Physica Sinica,
2007, 56(10): 5827-5830.
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Wang Bi-Ben, Xu Xing-Zi, Zhang Bing. Growth of carbon nanotips by plasma-enhanced hot filament chemical vapor deposition. Acta Physica Sinica,
2006, 55(2): 941-946.
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Yu Wei, Wang Bao-Zhu, Yang Yan-Bin, Lu Wan-Bing, Fu Guang-Sheng. Optical emission diagnosis of helicon-wave-plasma-enhanced chemical vapor deposition of nanocrystalline silicon. Acta Physica Sinica,
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Ma Zhong-Yuan, Huang Xin-Fan, Zhu Da, Li Wei, Chen Kun-Ji, Feng Duan. Photoluminescence from a-Si:H/SiO2 multilayers fabricated using in situ layer by layer plasma oxidation. Acta Physica Sinica,
2004, 53(8): 2746-2750.
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2004, 53(5): 1562-1566.
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Li Huo-Quan, Ning Zhao-Yuan, Cheng Shan-Hua, Jiang Mei-Fu. Photoluminescence centers and shift of ZnO films deposited by rf magnetron sputtering. Acta Physica Sinica,
2004, 53(3): 867-870.
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2002, 51(7): 1564-1570.
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2000, 49(6): 1180-1184.
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1987, 36(3): 293-300.
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