Manipulations of properties of the W-line emitting from the Si<sup>+</sup> Self-ion-implanted Si thin films on insulated oxide layer
Acta Physica Sinica
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Acta Phys. Sin.  2011, Vol. 60 Issue (10): 106104     doi:10.7498/aps.60.106104
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Manipulations of properties of the W-line emitting from the Si+ Self-ion-implanted Si thin films on insulated oxide layer
Wang Chong1, Yang Yu1, Yang Rui-Dong1, Li Liang1, Wei Dong1, Jin Ying-Xia1, Bao Ji-Ming2
1. Institute of Optoelectronic Information Materials, Yunnan University, Kunming 650091;
2. Department of Electrical and Computer Engineering, University of Houston, Houston, Texas 77204, USA
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