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光束相干合成中填充因子对远场光强分布的影响

谭毅 李新阳

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光束相干合成中填充因子对远场光强分布的影响

谭毅, 李新阳

Influence of filling factor on far-field intensity distribution in coherent beam combination

Tan Yi, Li Xin-Yang
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  • 理论推导了相干光束阵列远场光强分布的解析表达式. 介绍了填充因子及五种相干合成效果评价参数的定义. 分析了填充因子对远场光强分布的影响,发现填充因子通过影响空间调制因子来改变远场光强分布. 求得了相干合成效果评价参数与填充因子的关系式,并绘制了关系曲线. 计算结果表明,斯特列尔比与填充因子无关,恒为1;中央主瓣半径与填充因子成正比关系;中央主瓣能量密度受填充因子的影响较小;中央主瓣能量比与填充因子的平方成近似正比关系;桶中功率与填充因子的关系很复杂,但总体上随着填充因子的减小而减小. 分析显示,若要保证中央主瓣能量比和PIB值均大于最佳值的一半,则填充因子应大于√2/2.
    Theoretical analysis on the far-field diffraction of the coherent beam combination (CBC) is presented. An introduction is given to the definitions of filling factor and evaluation parameter of CBC. Based on the theoretical mode and definition, the influence of filling factor on far-field intensity distribution and the relationship between evaluation parameter and filling factor are theoretically described in detail. It is found that the filling factor influences far-field intensity distribution through space modulation factor. Results also indicate that SR is a constant which has not connection with the filling factor, and CR is of a linear relation with filling factor, and NACL has little connections with filling factor, and RCL varies approximately linearly with the square of filling factor, and PIB decreases when filling factor increases in general. If we make the filling factor larger than √2/2, more than half of the best values of RCL and PIB may be obtained.
    • 基金项目: 国家自然科学基金(批准号:61205069,61138007)资助的课题.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 61205069, 61138007).
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    Geng C, Tan Y, Mou J B, Li X Y 2013 Acta Phys. Sin. 62 024206 (in Chinese)[耿超, 谭毅, 牟进博, 李新阳 2013 物理学报 62 024206]

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    Wang X H, Fu Q, Shen F, Rao C H 2012 Opt. Express 20 4663

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    Haik C, Hiroaki F, Masayuki F 2013 Opt. Lett. 38 1227

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    Mang Y X, Wang X L, Zhou P, Ma H T, Zhao H C, Xu X J, Si L, Liu Z J, Zhao Y J 2011 Acta Phys. Sin. 60 094211 (in Chinese)[马阎星, 王小林, 周朴, 马浩统, 赵海川, 许晓军, 司磊, 刘泽金, 赵伊君 2011 物理学报 60 094211]

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    Xiao R, Hou J, Jiang Z F 2006 Acta Phys. Sin. 55 184 (in Chinese)[肖瑞, 侯静, 姜宗福 2006 物理学报 55 184]

    [15]

    Xiao R, Hou J, Jiang Z F, Liu M 2006 Acta Phys. Sin. 12 6464 (in Chinese)[肖瑞, 侯静, 姜宗福, 刘明 2006 物理学报 12 6464]

    [16]

    Wang X L, Ma Y X, Zhou P, He B, Xue Y H, Liu C, Li Z, Xiao H, Xu X J, Zhou J, Liu Z J, Zhao Y J 2011 Chin. Phys. B 20 114203

    [17]

    Zhou P, Ma Y X, Wang X L, Ma H T, Xu X J, Liu Z J 2010 Chin. Phys. B 19 014202

    [18]

    Vorontsov M A, Lachinova S L 2008 J. Opt. Soc. Am. A 25 1949

    [19]

    Zhou P, Wang X L, Ma Y X, Ma H T, Xu X J, Liu Z J 2010 Laser & Optoelectronics Progress 47 021401-1(in Chinese)[周朴, 王小林, 马阎星, 马浩统, 许晓军, 刘泽金 2010 激光与光电子学进展 47 021401-1]

    [20]

    Zhou P, Wang X L, Ma Y X, Ma H T, Liu Z J, Xu X J 2009 Chin. Phys. Lett. 26 044206

    [21]

    Wang X H, Zheng Y, Shen F, Rao C H 2012 J. Opt. Soc. Am. A 29 702

    [22]

    Tang Q J, Shi X C, Hu Q Q 2007 Journal of Pro Pulsion Technology 28 566(in Chinese)[唐前进, 施翔春, 胡企铨 2007 推进技术 28 566]

    [23]

    Cao J Q, Lu Q S, Hou J, Xu X J 2008 Chinese Journal of Lasers 35 351 (in Chinese)[曹涧秋, 陆启生, 侯静, 许晓军 2008 中国激光 35 351]

    [24]

    Khajavikhan M, Hoyer-Leitzel A, Leger J R 2008 Opt. Lett 33 2377

    [25]

    Goodno G D, Komine H 2006 Opt. Lett 31 1247

    [26]

    Liu Z J, Zhou P, Xu X J 2009 Chinese Journal of Lasers 36 773 (in Chinese) [刘泽金, 周朴, 许晓军 2009 中国激光 36 773]

    [27]

    Lv B D, Ji X L, Luo S R 2004 Infrared and Laser Engineering 33 14 (in Chinese) [吕百达, 季小玲, 罗时荣, 2004 红外与激光工程 2004 33 14]

  • [1]

    Perram G P, Marciniak M A, Goda M 2004 Proc. SPIE 2004 5414-1

    [2]

    Michael J L John J W 2011 Proc. SPIE 2011 818704

    [3]

    Song W L 2006 Laser & Infrared 36 755(in Chinese)[宋威廉 2006 激光与红外 36 755]

    [4]

    Yamamoto B M, Bhachu B S, Cutter K P 2008 Advanced Solid-State Photonics 2008 WC5

    [5]

    Dawson J W, Messerly M J, Beach R J 2008 Opt. Express 16 13240

    [6]

    Peng Q J, Xu Z Y 2011 High Power Laser and Particle Beams 23 1708(in Chinese)[彭钦军, 许祖彦 2011 强激光与粒子束 23 1708]

    [7]

    McNaught S J, Asman C P, Injeyan H 2009 Frontiers in Optics 2009 FThD2

    [8]

    Wang X L, Zhou P, Ma Y X, Leng J Y, Xu X J, Liu Z J 2011 Opt. Lett. 36 3121

    [9]

    Yu C, Augst S, Redmond S, Goldizen K, Murphy D, Sanchez A, Fan T 2011 Opt. Lett. 36 2686

    [10]

    Geng C, Tan Y, Mou J B, Li X Y 2013 Acta Phys. Sin. 62 024206 (in Chinese)[耿超, 谭毅, 牟进博, 李新阳 2013 物理学报 62 024206]

    [11]

    Wang X H, Fu Q, Shen F, Rao C H 2012 Opt. Express 20 4663

    [12]

    Haik C, Hiroaki F, Masayuki F 2013 Opt. Lett. 38 1227

    [13]

    Mang Y X, Wang X L, Zhou P, Ma H T, Zhao H C, Xu X J, Si L, Liu Z J, Zhao Y J 2011 Acta Phys. Sin. 60 094211 (in Chinese)[马阎星, 王小林, 周朴, 马浩统, 赵海川, 许晓军, 司磊, 刘泽金, 赵伊君 2011 物理学报 60 094211]

    [14]

    Xiao R, Hou J, Jiang Z F 2006 Acta Phys. Sin. 55 184 (in Chinese)[肖瑞, 侯静, 姜宗福 2006 物理学报 55 184]

    [15]

    Xiao R, Hou J, Jiang Z F, Liu M 2006 Acta Phys. Sin. 12 6464 (in Chinese)[肖瑞, 侯静, 姜宗福, 刘明 2006 物理学报 12 6464]

    [16]

    Wang X L, Ma Y X, Zhou P, He B, Xue Y H, Liu C, Li Z, Xiao H, Xu X J, Zhou J, Liu Z J, Zhao Y J 2011 Chin. Phys. B 20 114203

    [17]

    Zhou P, Ma Y X, Wang X L, Ma H T, Xu X J, Liu Z J 2010 Chin. Phys. B 19 014202

    [18]

    Vorontsov M A, Lachinova S L 2008 J. Opt. Soc. Am. A 25 1949

    [19]

    Zhou P, Wang X L, Ma Y X, Ma H T, Xu X J, Liu Z J 2010 Laser & Optoelectronics Progress 47 021401-1(in Chinese)[周朴, 王小林, 马阎星, 马浩统, 许晓军, 刘泽金 2010 激光与光电子学进展 47 021401-1]

    [20]

    Zhou P, Wang X L, Ma Y X, Ma H T, Liu Z J, Xu X J 2009 Chin. Phys. Lett. 26 044206

    [21]

    Wang X H, Zheng Y, Shen F, Rao C H 2012 J. Opt. Soc. Am. A 29 702

    [22]

    Tang Q J, Shi X C, Hu Q Q 2007 Journal of Pro Pulsion Technology 28 566(in Chinese)[唐前进, 施翔春, 胡企铨 2007 推进技术 28 566]

    [23]

    Cao J Q, Lu Q S, Hou J, Xu X J 2008 Chinese Journal of Lasers 35 351 (in Chinese)[曹涧秋, 陆启生, 侯静, 许晓军 2008 中国激光 35 351]

    [24]

    Khajavikhan M, Hoyer-Leitzel A, Leger J R 2008 Opt. Lett 33 2377

    [25]

    Goodno G D, Komine H 2006 Opt. Lett 31 1247

    [26]

    Liu Z J, Zhou P, Xu X J 2009 Chinese Journal of Lasers 36 773 (in Chinese) [刘泽金, 周朴, 许晓军 2009 中国激光 36 773]

    [27]

    Lv B D, Ji X L, Luo S R 2004 Infrared and Laser Engineering 33 14 (in Chinese) [吕百达, 季小玲, 罗时荣, 2004 红外与激光工程 2004 33 14]

计量
  • 文章访问数:  2139
  • PDF下载量:  648
  • 被引次数: 0
出版历程
  • 收稿日期:  2013-11-19
  • 修回日期:  2014-01-09
  • 刊出日期:  2014-05-05

光束相干合成中填充因子对远场光强分布的影响

  • 1. 中国科学院自适应光学重点实验室, 成都 610209;
  • 2. 中国科学院光电技术研究所, 成都 610209;
  • 3. 中国科学院大学, 北京 100049
    基金项目: 

    国家自然科学基金(批准号:61205069,61138007)资助的课题.

摘要: 理论推导了相干光束阵列远场光强分布的解析表达式. 介绍了填充因子及五种相干合成效果评价参数的定义. 分析了填充因子对远场光强分布的影响,发现填充因子通过影响空间调制因子来改变远场光强分布. 求得了相干合成效果评价参数与填充因子的关系式,并绘制了关系曲线. 计算结果表明,斯特列尔比与填充因子无关,恒为1;中央主瓣半径与填充因子成正比关系;中央主瓣能量密度受填充因子的影响较小;中央主瓣能量比与填充因子的平方成近似正比关系;桶中功率与填充因子的关系很复杂,但总体上随着填充因子的减小而减小. 分析显示,若要保证中央主瓣能量比和PIB值均大于最佳值的一半,则填充因子应大于√2/2.

English Abstract

参考文献 (27)

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