Search

Article

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

Target ablation characteristics of thin films during nanosecond pulsed laser deposition in the ablation process

Zhang Duan-Ming Li Zhi-Hua Guan Li Li Li Tan Xin-Yu

Target ablation characteristics of thin films during nanosecond pulsed laser deposition in the ablation process

Zhang Duan-Ming, Li Zhi-Hua, Guan Li, Li Li, Tan Xin-Yu
PDF
Get Citation
Metrics
  • Abstract views:  2802
  • PDF Downloads:  1060
  • Cited By: 0
Publishing process
  • Received Date:  15 November 2004
  • Accepted Date:  07 March 2005
  • Published Online:  20 August 2005

Target ablation characteristics of thin films during nanosecond pulsed laser deposition in the ablation process

  • 1. (1)华中科技大学物理系,武汉 430074; (2)华中科技大学物理系,武汉 430074;三峡大学物理系,宜昌 443002

Abstract: The whole ablation process of target during the pulsed laser preparation of thin films is studied in this paper. An ablation model of targets in which the vapo rization is taken account is present based on the superheated theory. Different heat flux equations for different stages are then established. Finally, as usin g Si as the target, a finite difference method is employed to simulate the space _ and time_dependence of temperature in the target. Vaporization velocity and va porization thickness evolutions with different laser fluence are investigated. T he dependence of solid_liquid interface location S(t) on time which takes in to account the melting relaxation time is derived too. The results show that th e vaporization strongly affects the surface temperature in the pulsed laser abla tion. When the laser intensity reaches near the phase explosion energy threshold , the vaporization velocity and ablation depth will evidently decrease because o f the gas dynamic effects. This result is more appropriate than that obtained in previous works.

Catalog

    /

    返回文章
    返回