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SMALL-ANGLE X-RAY DIFFRACTION STUDY OF AMORPHOUS MULTILAYER AND SINGLE LAYER THIN FILMS

WU ZHI-QIANG LU XIANG-DONG HUANG WEN-YONG LIU HONG-TU JIN HUAI-CHENG WANG CHANG-SUI ZHOU GUI-EN WU ZI-QIN

SMALL-ANGLE X-RAY DIFFRACTION STUDY OF AMORPHOUS MULTILAYER AND SINGLE LAYER THIN FILMS

WU ZHI-QIANG, LU XIANG-DONG, HUANG WEN-YONG, LIU HONG-TU, JIN HUAI-CHENG, WANG CHANG-SUI, ZHOU GUI-EN, WU ZI-QIN
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  • Received Date:  09 June 1986
  • Published Online:  20 March 2005

SMALL-ANGLE X-RAY DIFFRACTION STUDY OF AMORPHOUS MULTILAYER AND SINGLE LAYER THIN FILMS

  • 1. (1)广东省韩山师范专科学校物理系,教师; (2)中国科学技术大学结构分析开放实验室; (3)中国科学技术大学物理系

Abstract: Small-angle X-ray diffraction study of amorphous a-Si:H/(a-SiNx:H) periodical multilayer thin films and some single layer films has been undertaken. A number of satellite peaks were found in the lower side of Bragg diffraction peaks of multilayer thin films with a less number of periods. A number of diffraction peaks were also found for the small-angle diffraction of single layer films. We have presented a simple formula for calculating the X-ray diffraction intensity of multilayer and single layer films. A satisfactory explaination of experimental results was obtained. Consequently, a simple method for measuring the total thickness of both multilayer and single layer thin films has been presented.

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