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Yang Xin-An, Li Jian-Qi, Ding Peng, Liu Fa-Min. Microstructure and magnetic properties of the cobalt ions implanted TiO2 films. Acta Physica Sinica,
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2008, 57(9): 5810-5816.
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Yang Yi-Tao, Zhang Chong-Hong, Zhou Li-Hong, Li Bing-Sheng. A study of damage evolution during annealing of helium-implanted magnesium-aluminate spinel. Acta Physica Sinica,
2008, 57(8): 5165-5169.
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He Shao-Long, Li Hong-Nian, Li Hai-Yang, Zhang Han-Jie, Lü Bin, He Pi-Mo, Bao Shi-Ning, Xu Ya-Bo. X-ray photoemission studies of Yb intercalated C60 thin film. Acta Physica Sinica,
2004, 53(3): 915-921.
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Zhang Gu-Ling, Wang Jiu-Li, Yang Wu-Bao, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze. TiN coating for inner surface modification by grid enhanced plasma source ion im plantation. Acta Physica Sinica,
2003, 52(9): 2213-2218.
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QIU HUA-TAN, WANG YOU-NIAN. COULOMB EXPLOSIONS FOR SWIFT C60 ION-CLUSTERS PENETRATING IN SOLIDS Ⅰ—THE MODEL OF SPHERICAL SHELL. Acta Physica Sinica,
2000, 49(8): 1528-1533.
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2000, 49(3): 513-517.
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2000, 49(3): 544-547.
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1999, 48(7): 1269-1274.
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CHEN GUANG-HUA, ZHANG YANG, YAN HUI. PHOTOLUMINESCENCE CHARACTERISTICS AND GROWTH-OF TEXTURED C60 FILMS. Acta Physica Sinica,
1997, 46(7): 1375-1379.
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1997, 46(6): 1183-1187.
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1994, 43(6): 973-978.
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1994, 43(2): 248-252.
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1994, 43(4): 566-569.
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SHEN ZHEN-YU, YE LING. A PRELIMINARY STUDY ON THE ORIENTATION OF C60 CLUSTERS IN CRYSTAL. Acta Physica Sinica,
1993, 42(7): 1117-1120.
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ZHANG YUE-LU, BI SI-YUN, MEI LIANG-MO, LUAN KAI-ZHENG, LIU YI-HUA. STUDIES ON THE AMORPHOUS STATE FORMATION EFFECT OF BORON ION IMPLANTATION INTO POLYCRYSTALLINE IRON THIN FILMS. Acta Physica Sinica,
1988, 37(8): 1373-1375.
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CHEN GUO-MING, CHEN GUO-LIANG, YANG JIE, ZOU SHI-CHANG. INVESTIGATION OF THIN FILM Si3N4 FORMED BY LOW ENERGY ION IMPLANTATION. Acta Physica Sinica,
1988, 37(3): 475-480.
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ZHANG YUE-LU, MEI LIANG-MO, GUO YI-CHENG, GUO XIAO-QIN, CONG PEI-JIE. STUDIES ON PRODUCING AMORPHOUS ALLOY LAYERS BY BORON ION IMPLANTATION INTO POLYCRYSTALLINE IRON FILMS. Acta Physica Sinica,
1986, 35(7): 850-854.
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MO DANG, LU YIN-CHENG, LI DAN-HUI, LIU SHANG-HE, LU WU-XING. ELLIPSOMETRIC STUDY OF DAMAGE AND ANNEALING IN ARSENIC ION IMPLANTED SILICON. Acta Physica Sinica,
1980, 29(9): 1214-1216.
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