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TiN/SiNx multilayer coatings were deposited at different deposition pressure by reactive magnetron sputtering. The microstructure and mechanical properties of the coatings were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM) and nanoindentation. The results showed that the layer structure became rough and the preferred orientation of TiN transferred from (200) to (111) plane with the increase of deposition pressure. Surface roughness of the coatings increased but the hardness and elastic modulus decreased with increasing deposition pressure. The variation of mechanical properties are attributed to the changes in layer structures and the densities of the coatings.
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Keywords:
- TiN/SiNx multilayer coatings /
- interface width /
- topography
[1] Derflinger V, Brandle H, Zimmermann H 1999 Surf. Coat. Technol. 113 286
[2] Veprek S, Niederhofer A, Moto K, Bolom T, Mannling H D, Nesladek P, Dollinger G, Bergmaier A 2000 Surf. Coat. Technol. 133-134 152
[3] Yu L H, Dong S R, Xu J H, Li G Y 2008 Acta Phy. Sin. 57 7063 (in Chinese) [喻利花、董师润、许俊华、李戈扬 2008 物理学报 57 7063]
[4] Kong M, Wei L, Dong Y S, Li G Y 2006 Acta Phy. Sin. 55 0770 (in Chinese) [孔 明、魏 仑、董云杉、李戈扬 2006 物 理学报 55 0770] 〖5] Xu J H, Yu L H, Azuma Y, Fujimoto T, Umehara H, Kojima I 2002 Appl. Phys. Lett. 81 4139
[5] Hu X P, Zhang H J, Dai J W, Li G Y, Gu M Y 2005 J. Vac. Sci. Technol. A 23 114
[6] Soderberg H, Odén M, Larsson T, Hultman L, Molina-Aldareguia J M 2006 Appl. Phys. Lett. 88 191902
[7] Jonathan F S, Feng H, John A B 2005 J. Vac. Sci. Technol. A 23 78
[8] Huang J H, Lau K W, Yu G P 2005 Surf. Coat. Technol. 191 17
[9] Musil J, Polakova H, Suna J, Vlcek J 2004 Surf. Coat. Technol. 177-178 289
[10] Yang B C, Wang W S 1994 Thin Film Physics and Technology (Chengdu: University of Electronic Science and Technology Press) pp60—103 (in Chinese) [杨邦朝、王文生 1994 薄膜物理与技术 (成都:电子科技大学出版社) 第60—103页]
[11] Wainfan N, Parratt L G 1960 J. Appl. Phys. 31 1331
[12] Zheng W T 2004 Thin Film Materials and Technology (Beijing: Chemical Industry Press) pp47—134 (in Chinese) 郑伟涛 2004 薄膜材料与薄膜技术 (北京:化学工业出版社) 第47—134
[13] Pelleg J, Zevin L Z, Lungo S 1991 Thin Solid Films 197 117
[14] Greene, J E, Sundgren J-E, Hultman L, Petrov I, Bergstrom D B 1995 Appl. Phys. Lett. 67 2928
[15] Chu X, Barnett S A 1995 J. Appl. Phys. 77 4403
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[1] Derflinger V, Brandle H, Zimmermann H 1999 Surf. Coat. Technol. 113 286
[2] Veprek S, Niederhofer A, Moto K, Bolom T, Mannling H D, Nesladek P, Dollinger G, Bergmaier A 2000 Surf. Coat. Technol. 133-134 152
[3] Yu L H, Dong S R, Xu J H, Li G Y 2008 Acta Phy. Sin. 57 7063 (in Chinese) [喻利花、董师润、许俊华、李戈扬 2008 物理学报 57 7063]
[4] Kong M, Wei L, Dong Y S, Li G Y 2006 Acta Phy. Sin. 55 0770 (in Chinese) [孔 明、魏 仑、董云杉、李戈扬 2006 物 理学报 55 0770] 〖5] Xu J H, Yu L H, Azuma Y, Fujimoto T, Umehara H, Kojima I 2002 Appl. Phys. Lett. 81 4139
[5] Hu X P, Zhang H J, Dai J W, Li G Y, Gu M Y 2005 J. Vac. Sci. Technol. A 23 114
[6] Soderberg H, Odén M, Larsson T, Hultman L, Molina-Aldareguia J M 2006 Appl. Phys. Lett. 88 191902
[7] Jonathan F S, Feng H, John A B 2005 J. Vac. Sci. Technol. A 23 78
[8] Huang J H, Lau K W, Yu G P 2005 Surf. Coat. Technol. 191 17
[9] Musil J, Polakova H, Suna J, Vlcek J 2004 Surf. Coat. Technol. 177-178 289
[10] Yang B C, Wang W S 1994 Thin Film Physics and Technology (Chengdu: University of Electronic Science and Technology Press) pp60—103 (in Chinese) [杨邦朝、王文生 1994 薄膜物理与技术 (成都:电子科技大学出版社) 第60—103页]
[11] Wainfan N, Parratt L G 1960 J. Appl. Phys. 31 1331
[12] Zheng W T 2004 Thin Film Materials and Technology (Beijing: Chemical Industry Press) pp47—134 (in Chinese) 郑伟涛 2004 薄膜材料与薄膜技术 (北京:化学工业出版社) 第47—134
[13] Pelleg J, Zevin L Z, Lungo S 1991 Thin Solid Films 197 117
[14] Greene, J E, Sundgren J-E, Hultman L, Petrov I, Bergstrom D B 1995 Appl. Phys. Lett. 67 2928
[15] Chu X, Barnett S A 1995 J. Appl. Phys. 77 4403
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