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摘要: 用射频/直流磁控溅射法制备了CeO2/Nb2O5双层氧敏薄膜，利用X射线光电子能谱(XPS)，描述并解释了单层CeO2薄膜中氧随温度变化的动力学行为，以及CeO2/Nb2O5薄膜界面对氧敏特性的影响.通过对Ce3d XPS谱的高斯拟合，计算了Ce3+浓度并给出了判定Ce4+还原的标志.结果表明，界面效应可以提高CeO2/Nb2O5薄膜中Ce4+的还原能力，使之远远高于单层CeO2薄膜，这对薄膜的氧敏特性是极为有利的.
Abstract: The CeO2 single layer and CeO2/Nb2O5 double-layer films have been deposited on a Al2O3 ceramic substrates by a reactive rf/dc sputtering magnetron system. The variation of kinetic behavior of oxygen in CeO2 single layer with temperatures, and also the influence of CeO2/Nb2O5 interface on oxygen sensitivity of the films have been studied by XPS. X-ray photoelectron spectra of Ce3d core level were deconvoluted by Gaussian function for calculating the different concentration of Ce3+ and Ce4+ in the films. The results have shown that the CeO2/Nb2O5 double-layer could improve reduction capability of Ce4+ easily due to the interface effect, so that the reduction capability is higher in CeO2/Nb2O5 double-layer than they were in CeO2 single layer.