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真空弧离子源在真空镀膜、材料表面改性、真空大电流开关、加速器离子注入等领域有广泛应用，目前国内外对真空弧放电等离子体的研究主要针对纯金属或合金电极，对含氢电极的研究和公开报道较少. 本文利用高时空分辨的四分幅图像诊断系统，结合氢和钛原子特征线单色器件，研究了含氢钛电极的真空弧微秒级脉冲放电等离子体的轴向和径向时空分布特性. 研究表明：在真空击穿阶段，阳极区域发光更为明显，阳极电极解吸附释放的氢原子是引发击穿的主要放电介质；在真空弧阶段，阴极-绝缘-真空三结合点处产生圆锥状阴极斑，喷射出大量的等离子体以维持弧放电，同时电极内壁非阴极斑区域也有少量等离子体产生，等离子体中H原子的轴向和径向空间分布均比Ti原子均匀.Vacuum arc ion sources have been used in a wide range including vacuum coating, materials surface modification, switching devices and other fields. At present, researches on the vacuum arc ion source are mainly targeting the pure metal or alloy electrodes, but the researches on the hydrogenous electrode are rarely reported. The axial and radial distributions of the hydrogenous electrode vacuum arc discharge plasma are studied by using high speed four-frame camera equipped with the narrow-band filters of strong lines of H I and Ti I. It is found that the anode is intensively luminous in the vacuum breakdown. The observation from the camera with the filter reveals that the vacuum breakdown is ignited mainly by the anode hydrogen desorption. The vacuum arc is sustained by plasmas emitted from either the cathode spots or the electrode inner wall. The cone-shaped cathode spot located at the cathode-insulator-vacuum junction is the main plasma source. It is found that the distribution of hydrogen atoms is much more homogeneous than that of titanium atoms, which may be due to the earlier beginning of hydrogen desorption, the bigger emitting area and faster diffusion speed of hydrogen atom.
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Keywords:
- vacuum arc /
- hydrogenous electrode /
- plasma /
- high speed framing camera
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[1] Georgy Y, Yushkov, Andr A 2008 Appl. Phys. Lett. 92 041502
[2] [3] Brown I G 1994 Rev. Sci. Instrum. 65 3061
[4] [5] Brown I G, Oks E M 1997 IEEE Trans. Plasma Sci. 25 1222
[6] Boxman R L, Zhitomirsky V N 2006 Rev. Sci. Instrum. 77 021101
[7] [8] Bacon F M 1975 J. Appl. Phys. 46 4750
[9] [10] [11] Rosenthal H, Beilis I, Goldsmith S, Boxman R L 1996 J. Phys. D: Appl. Phys. 29 1245
[12] Popov S A, Batrakov A V, Methling R, Uhrlandt D, Weltmann K 2009 IEEE Trans. Plasma Sci. 37 1419
[13] [14] [15] Methling R, Popov S A, Batrakov A V, Uhrlandt D, Weltmann K 2013 IEEE Trans. Plasma Sci. 41 1904
[16] [17] Earwaker L G, England J B A, Goldie D J 1987 Nucl. Instrum. Methods Phys. Res. Sect. B 24-25 711
[18] [19] Lu J L, Cao J X 2012 Acta Phys. Sin. 61 148801 (in Chinese) [卢金炼, 曹觉先 2012 物理学报 61 148801]
[20] Bhosle V, Baburaj E G, Miranova M, Salama K 2003 Mater. Eng. A 356 190
[21] [22] [23] Dai Y Y, Yang L, Peng S M, Long X G, Zhou X S, Zu X T 2012 Acta Phys. Sin. 61 108801 (in Chinese) [代云雅, 杨莉, 彭述明, 龙兴贵, 周晓松, 祖小涛 2012 物理学报 61 108801]
[24] [25] Zhang L, Zhu Z H, Yang B F, Long X G, Luo S Z 2006 Acta Phys. Sin. 55 5418 (in Chinese) [张莉, 朱正和, 杨本福, 龙兴贵, 罗顺忠 2006 物理学报 55 5418]
[26] [27] Chen L, Jin D Z, Cheng L, Shi L, Tan X H, Dai J Y, Hu S D 2011 High Power Laser and Particle Beams 23 1361 (in Chinese) [陈磊, 金大志, 程亮, 石磊, 谈效华, 戴晶怡, 胡思得 2011 强激光与粒子束 23 1361]
[28] Sun J Z, Li X T, Bai J, Wang D Z 2012 Chin. Phys. B 21 055205
[29] [30] Li X C, Niu D Y, Xu L F, Jia P Y, Chang Y Y 2012 Chin. Phys. B 21 075204
[31] [32] Zuo Y H, Wang J G, Zhu J H, Niu S L, Fan R Y 2012 Acta Phys. Sin. 61 177901 (in Chinese) [左应红, 王建国, 朱金辉, 牛胜利, 范如玉 2012 物理学报 61 177901]
[33] [34] [35] Mesyats G A, Proskurovsky D I 1988 Pulsed Electrical Discharge in Vacuum (Berlin: Springer-Verlag) pp72-78
[36] Dukhopel'nikov D V, Zhukov A V, Kirillov D V, Marakhtanov M K 2005 Measur. Tech. 48 995
[37] [38] Vitel Y, Lamoureux M, Abada H, Lejeune A, Faure C, Tourneur P L, Godechot X, Cochard S 2002 Plasma Sources Sci. Technol. 11 333
[39] [40] Kondrat'eva N P, Koval' N N, Korolev Y D, Schanin P M 1999 J. Phys. D: Appl. Phys. 32 699
[41] [42] [43] Tang P Y, Dai J Y, Tan X H, Jin D Z, Liu T, Ding B N 2005 Nucl. Tech. 28 217 (in Chinese) [唐平瀛, 戴晶怡, 谈效华, 金大志, 刘铁, 丁伯南 2005 核技术 28 217]
[44] [45] Zheng C K 2009 Plasma Physics (Beijing: Peking University Press) p173 (in Chinese) [郑春开 2009 等离子体物理 (北京: 北京大学出版社) 第173页]
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