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本文提出了一个二类超导体中电子散射磁通钉扎的非理想平面模型。此模型比现有的理想化模型更接近实际情形。计算了此模型下的δK/K及一个刚性磁通线阵所受的钉扎力。在所得的结果中,散射平面厚度、散射几率及杂质含量对钉扎力的影响与实验结果符合较好。A model of non-ideal plane of electron scatter flux pinning is proposed. The spread of △K/K are calculated under this model. Using GL free energy formula, The dependences of flux pinning force on thickness of the plane and impurity of matrix and electron scatter probability are obtained. The results agree well with experimental data qualitatively.
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