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SIMULTANEOUS MEASUREMENT OF THE CONSTITUENT AND THICKNESS OF THIN FILM BY X-RAY EDS

CHENG WAN-BONG GAO QIAO-JUN WU ZI-QIN

SIMULTANEOUS MEASUREMENT OF THE CONSTITUENT AND THICKNESS OF THIN FILM BY X-RAY EDS

CHENG WAN-BONG, GAO QIAO-JUN, WU ZI-QIN
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  • Received Date:  31 July 1980
  • Published Online:  27 July 2005

SIMULTANEOUS MEASUREMENT OF THE CONSTITUENT AND THICKNESS OF THIN FILM BY X-RAY EDS

  • 1. 北京大学物理系

Abstract: A new method which can simultaneously determine the constituent and thickness of the alloy films using the X-ray EDS has been developed. The constituent is determined by the ratios of the kα intensties of elements in the film. The thickness of the film deposited on a NaCl substrate is measured by the attenuation of the ratios of Na kα intensity/Cl kα intensity. It is not necessary to use bulk standards of pure elements. This method has been applied to Cu-Si alloy films of different thickness deposited on NaCl substrate. Under various experimental conditions, the constituent and thickness data are determined satisfactorily.

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