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采用辉光放电技术和等离子体质谱诊断技术, 研究了H2/C4H8混合气体等离子体中正离子成分及主要正离子能量随射频功率的变化规律, 并分析了H2/C4H8混合气体主要的离解机理和形成过程. 研究表明: 随着射频功率的增加, 碳氢碎片离子的浓度增加, 在20 W时达到最大值, 25 W后有所减小. 当射频功率小于10 W时, H2/C4H8混合气体等离子体中C4H9+相对浓度最大, 当功率大于或等于10 W时, C3H3+相对浓度最大. 随着射频功率的增大, 碳氢碎片离子的能量逐渐增加. 对H2/C4H8混合气体等离子体的组成与能量进行的定性分析, 将为H2/C4H8混合气体辉光放电聚合物涂层工艺参数优化提供参考.Taking advantage of the glowing discharge technology and plasma mass spectrometry diagnosis technology, the variation rules of positive ion species and energy with power in H2/C4H8 mixture gas are investigated. The characteristic ions are measured and their forming process is discussed. The results show that the intensity of the C-H segment ions in the H2/C4H8 plasma increases with radio-frequency (RF) power increasing, the intensity reaches a maximum at an RF power of 20 W, and then reduces after the RF power has reached 25 W. The relative concentration of m/e 57 (C4H9+) is highest when the power is less than 10 W, and when the power is more than 10 W, the relative concentration of m/e 39 (C3H3+) reaches a maximum. The energy of the C-H segment ions increases gradually with the increase of RF power. The qualitative analyses of H2/C4H8 plasma composition and energy will be beneficial to improving the fabrication technology of glowing discharge polymer coating.
[1] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]
[2] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1996 Fusion Technol. (USA) 31 381
[3] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[4] Auciello O, Flamn D L (Translated by Zheng S B, Hu J F, Guo S J, Hong M Y) 1994 Plasma Diagnostics (vol. 1): Discharge Parameters and Chemistry (Beijing: Electronic Industry Press) p38 (in Chinese) [奥切洛O, 弗拉姆 D L著 (郑少白, 胡建芳, 郭淑静, 洪明苑译) 1994 等离子体诊断 (第一卷): 放电参量和化学 (北京: 电子工业出版社) 第38页]
[5] Benninghoven A 1994 Angew. Chem. Int. Ed. Engl. 33 1023
[6] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[7] Zhang Q 2003 Modern Technique and Characterization Methods (Self-Complied Teaching Materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[8] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Edn.) (Beijing: Science Press) p16(in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定 (第二版) (北京: 科学出版社) 第16页]
[9] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[10] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[11] Ding J N, Qi H S, Yuan N Y, He Y L Cheng G G, Fan Z, Pan H B, Wang J X, Wang X Q 2009 Chin. J. Vac. Sci. Technol. 29 188 (in Chinese) [丁建宁, 祁宏山, 袁宁一, 何宇亮, 程广贵, 范真, 潘海彬, 王君雄, 王秀琴 2009 真空科学与技术学报 29 188]
[12] Bauer M, Schwarz-Selinger T, Jacob W 2005 J. Appl. Phys. 98 73302
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[1] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]
[2] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1996 Fusion Technol. (USA) 31 381
[3] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[4] Auciello O, Flamn D L (Translated by Zheng S B, Hu J F, Guo S J, Hong M Y) 1994 Plasma Diagnostics (vol. 1): Discharge Parameters and Chemistry (Beijing: Electronic Industry Press) p38 (in Chinese) [奥切洛O, 弗拉姆 D L著 (郑少白, 胡建芳, 郭淑静, 洪明苑译) 1994 等离子体诊断 (第一卷): 放电参量和化学 (北京: 电子工业出版社) 第38页]
[5] Benninghoven A 1994 Angew. Chem. Int. Ed. Engl. 33 1023
[6] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[7] Zhang Q 2003 Modern Technique and Characterization Methods (Self-Complied Teaching Materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[8] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Edn.) (Beijing: Science Press) p16(in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定 (第二版) (北京: 科学出版社) 第16页]
[9] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[10] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[11] Ding J N, Qi H S, Yuan N Y, He Y L Cheng G G, Fan Z, Pan H B, Wang J X, Wang X Q 2009 Chin. J. Vac. Sci. Technol. 29 188 (in Chinese) [丁建宁, 祁宏山, 袁宁一, 何宇亮, 程广贵, 范真, 潘海彬, 王君雄, 王秀琴 2009 真空科学与技术学报 29 188]
[12] Bauer M, Schwarz-Selinger T, Jacob W 2005 J. Appl. Phys. 98 73302
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