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A full-size three-dimensional model of large-scale rectangular surface-wave plasma (SWP) source was built, the power deposition problems of SWP source based on collision mechanism were investigated through numerical simulations. The microwave reflectivity curves varying with plasma parameters were obtained, and the influence of different antenna arrays on power deposition is analyzed. The results show that the power deposition of uniformly discharged SWP source mainly depends on plasma property, and too big or too small plasma density is unfavorable to the energy absorption. In the range of working gas pressure, SWP source can achieve effective power deposition only through collision mechanism, and the absorption rate of microwave can reach more than 80%, which agrees with the existing experimental result. The results also show that compact and intensive surface wave is more favorable to the absorption of microwave.
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Keywords:
- finite difference time domain method /
- plasma surface wave /
- power absorption /
- slot antenna
[1] Sugai H, Ghanashev I, Nagatsu M 1998 Plasma Sources Sci. Technol. 7 192
[2] Ghanashev I, Nagatsu M, Morita S, Sugai H 1998 J. Vac. Sci. Technol. A 16 1537
[3] Nagatsu M, Morita S, Ghanashev I, Ito A, Toyoda N, Sugai H J 2000 J. Phys. D: Appl. Phys. 33 1143
[4] Ghanashev I, Sugai H 2000 Phys. Plasmas 7 3051
[5] Ganashev I, Nagatsu M, Sugai H 1997 Jpn. J. Appl. Phys. 36 337
[6] Wu T J, Guan W J, Tsai C M 2001 Phys. Plasmas 8 3195
[7] Nagatsu M, Ghanashev I, Sugai H 1998 Plasma Sources Sci. Technol. 7 230
[8] Nagatsu M, Naito K, Ogino A, Nanko S 2006 Plasma Sources Sci. Technol. 15 37
[9] Yasaka Y, Koga K 2002 Phys. Plasmas 9 1029
[10] Liu M H, Sugai H, Hu X W, Ishijima T, Jiang Z H, Li B, Dan M 2006 Acta Phys. Sin. 55 5905 (in Chinese) [刘明海、 菅井秀郎、 胡希伟、 石岛芳夫、 江中和、 李 斌、 但 敏 2006 物理学报 55 5905]
[11] Ou Q R, Liang R Q 2002 Vacuum and Low Temperature 8 28(in Chinese)[欧琼荣、 梁荣庆 2002 真空与低温 8 28]
[12] Zhan R J, Wu C F, Wen X H, Zhu X D,Zhou H Y 2001 Vacuum Science and Technology 21 30(in Chinese)[詹如娟、 吴 丛凤、 温晓辉、 朱晓东、 周海洋 2001 真空科学与技术 21 30] 〖13] Liang Y Z, OU Q R, Liang B, Liang R Q 2008 Chin. Phys. Lett. 25 1761
[13] Chen Z Q, Zhou P Q, Chen W, Lan C H, Liu M H, Hu X W 2008 Plasma Science and Technology 10 655
[14] Lan C H, Chen Z Q, Liu M H, Hu X W 2009 Plasma Science and Technology 11 66
[15] Lan C H, Hu X W, Liu M H 2009 Chin. Phys. Lett. 26 035204
[16] Sugai H 2002 Plasma Electronic Engineering (Beijing: Science Press) (in Chinese)[菅井秀郎 2002 等离子体电子工程学 (北京:科学出版社)]
[17] Taflove A 1995 Computational Electrodynamics: the Finite-Difference Time-Domain Method (Boston: Artech House)
[18] Chen Q, Aoyagi H P, Katsurai M 1999 IEEE Trans. Plasma Science 27 164
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[1] Sugai H, Ghanashev I, Nagatsu M 1998 Plasma Sources Sci. Technol. 7 192
[2] Ghanashev I, Nagatsu M, Morita S, Sugai H 1998 J. Vac. Sci. Technol. A 16 1537
[3] Nagatsu M, Morita S, Ghanashev I, Ito A, Toyoda N, Sugai H J 2000 J. Phys. D: Appl. Phys. 33 1143
[4] Ghanashev I, Sugai H 2000 Phys. Plasmas 7 3051
[5] Ganashev I, Nagatsu M, Sugai H 1997 Jpn. J. Appl. Phys. 36 337
[6] Wu T J, Guan W J, Tsai C M 2001 Phys. Plasmas 8 3195
[7] Nagatsu M, Ghanashev I, Sugai H 1998 Plasma Sources Sci. Technol. 7 230
[8] Nagatsu M, Naito K, Ogino A, Nanko S 2006 Plasma Sources Sci. Technol. 15 37
[9] Yasaka Y, Koga K 2002 Phys. Plasmas 9 1029
[10] Liu M H, Sugai H, Hu X W, Ishijima T, Jiang Z H, Li B, Dan M 2006 Acta Phys. Sin. 55 5905 (in Chinese) [刘明海、 菅井秀郎、 胡希伟、 石岛芳夫、 江中和、 李 斌、 但 敏 2006 物理学报 55 5905]
[11] Ou Q R, Liang R Q 2002 Vacuum and Low Temperature 8 28(in Chinese)[欧琼荣、 梁荣庆 2002 真空与低温 8 28]
[12] Zhan R J, Wu C F, Wen X H, Zhu X D,Zhou H Y 2001 Vacuum Science and Technology 21 30(in Chinese)[詹如娟、 吴 丛凤、 温晓辉、 朱晓东、 周海洋 2001 真空科学与技术 21 30] 〖13] Liang Y Z, OU Q R, Liang B, Liang R Q 2008 Chin. Phys. Lett. 25 1761
[13] Chen Z Q, Zhou P Q, Chen W, Lan C H, Liu M H, Hu X W 2008 Plasma Science and Technology 10 655
[14] Lan C H, Chen Z Q, Liu M H, Hu X W 2009 Plasma Science and Technology 11 66
[15] Lan C H, Hu X W, Liu M H 2009 Chin. Phys. Lett. 26 035204
[16] Sugai H 2002 Plasma Electronic Engineering (Beijing: Science Press) (in Chinese)[菅井秀郎 2002 等离子体电子工程学 (北京:科学出版社)]
[17] Taflove A 1995 Computational Electrodynamics: the Finite-Difference Time-Domain Method (Boston: Artech House)
[18] Chen Q, Aoyagi H P, Katsurai M 1999 IEEE Trans. Plasma Science 27 164
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