Experimental study on laser produced tin droplet plasma extreme ultraviolet light source

Chen Hong; Lan Hui; Chen Zi-Qi; Liu Lu-Ning; Wu Tao; Zuo Du-Luo; Lu Pei-Xiang; Wang Xin-Bing

doi:10.7498/aps.64.075202

Abstract

Extreme ultraviolet lithography (EUVL), which uses the extreme ultraviolet radiation at a wavelength of 13.5 nm, is the leading candidate of next generation lithography addressing not only the 10 nm half-pitch nodes, but several nodes beyond that. Among all the methods for getting EUV radiation, laser-produced plasma (LPP) light source is the most promising EUV light source because of its high conversion efficiency (CE), large collect angle and low debris output. In this paper, pulsed TEA-CO2 laser and Nd:YAG laser are used to irradiate tin droplets to obtain plasma EUV emission, and the properties of EUV radiation from the plasma are studied. Results show that the EUV emission spectra induced by Nd:YAG laser have an obvious blueshift as compared with those by CO2 laser. In addition, the LPP sources are point light sources, so that the angular distribution of EUV emission from LPP can be described by Lambertian distribution.

Keywords:

Authors and contacts

1.
School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China;
2.
Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;
3.
School of Science, Wuhan Institute of Technology, Wuhan 430073, China
Funds: Project supported by the Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 11304235).

References

[1]	Bakshi V 2009 EUV lithography (Bellingham: Spie Press) pp104
[2]	Brandt D C, Fomenkov I V, Farrar N R, Fontaine B L, Myers D W, Brown D J, Ershov A I, Böwering N R, Riggs D J, Rafac R J, Dea S D, Peeters R, Meiling H, Harned N, Smith D, Pirati A, Kazinczi R 2014 Extreme Ultraviolet (EUV) Lithography V90480C San Jose, California, United States, February 23-27 2014
[3]	Mizoguchi H, Nakarai H, Abe T, Ohta T, Nowak K M, Kawasuji Y, Tanaka H, Watanabe Y, Hori T, Kodama T, Shiraishi Y, Yanagida T, Yamada T, Yamazaki T, Okazaki S, Saitou T 2014 Extreme Ultraviolet (EUV) Lithography V 90480D San Jose, California, United States, February 23-27 2014
[4]	Abhari R S, Rollinger B, Giovannini A Z, Morris O, Henderson I, Ellwi S S 2012 Journal of MicroNanolithography, MEMS, MOEMS 11 021114
[5]	Giovannini A Z, Abhari R S 2013 Journal of Applied Physics 114 033303
[6]	Masnavi M, Szilagyi J, Parchamy H, Richardson M C 2013 Applied Physics Letters 102 164102
[7]	Ni Q L 2003 Ph. D. Dissertation (Changchun: University of Chinese Academy of Sciences) (in Chinese) [尼启良 2003 博士学位论文 (长春: 中国科学院研究生院, 长春光学精密机械与物理研究所)]
[8]	Jin C S, Wang Z S, Cao J L 2000 Optics and Precision Engineering 8 66 (in Chinese) [金春水, 王占山, 曹健林 2000 光学精密工程 8 66]
[9]	Cai Y, Wang W T, Yang M, Liu H S, Lu P X, Li R X, Xu Z Z 2008 Acta Phys. Sin. 57 5100 (in Chinese) [蔡懿, 王文涛, 杨明, 刘建胜, 陆培祥, 李儒新, 徐至展 2008 物理学报 57 5100]
[10]	Zhao Y P, Xu Q, Xiao D L, Ding N, Xie Y, Li Q, Wang Q 2013 Acta Phys. Sin. 62 245204 (in Chinese) [赵永蓬, 徐强, 肖德龙, 丁宁, 谢耀, 李琦, 王骐 2013 物理学报 62 245204]
[11]	Dou Y P, Sun C K, Liu C Z, Gao J, Hao Z Q, Lin J Q 2014 Chin. Phys. B 23 075202
[12]	Wang H C, Wang Z S, Li F S, Qin S J, Du Y, Wang L, Zhang Z, Chen L Y 2004 Acta Phys. Sin. 53 2368 (in Chinese) [王洪昌, 王占山, 李佛生, 秦树基, 杜芸, 王利, 张众, 陈玲燕 2004 物理学报 53 2368]
[13]	Wu T, Wang X B, Wang S Y, Tang J, Lu P X, Lu H 2012 Journal of Applied Physics 111 063304
[14]	Wu T, Wang X B, Tang J, Rao Z M, Wang S Y 2011 Laser Technology 35 800 (in Chinese) [吴涛, 王新兵, 唐建, 饶志明, 王少义 2011 激光技术 35 800]
[15]	Wu H Y, Wu Y G, Wang Z H, Lu G, Ling L J, Xia Z H, Chen N B 2011 Acta Photonica Sinica 40 0001 (in Chinese) [伍和云, 吴永刚, 王振华, 吕刚, 凌磊婕, 夏子奂, 陈乃波 2011 光子学报 40 0001]
[16]	Bob R, Luna B, Nadia G, Abhari R S 2012 Extreme Ultraviolet Lithography III 83222P San Jose, California United States, February 12 2012
[17]	Wang J L, Chen W W, Cai L, Ma Y R, Liu Y S, Lv G S, Shao M J, Jin Y Q, Sang F T 2006 High Power Laser and Particle Beams 18 935 (in Chinese) [王景龙, 陈文武, 蔡龙, 马月仁, 刘宇时, 吕国盛, 邵明君, 金玉奇, 桑凤亭 2006 强激光与粒子束 18 935]
[18]	Cui Y Q, Wang W M, Sheng Z M, Li Y T, Zhang J 2013 Plasma Physics and Controlled Fusion 55 085008
[19]	Bakshi V 2006 EUV Sources for Lithography (Bellingham, WA: Spie Press) p113

Cited By

[1]	Bakshi V 2009 EUV lithography (Bellingham: Spie Press) pp104
[2]	Brandt D C, Fomenkov I V, Farrar N R, Fontaine B L, Myers D W, Brown D J, Ershov A I, Böwering N R, Riggs D J, Rafac R J, Dea S D, Peeters R, Meiling H, Harned N, Smith D, Pirati A, Kazinczi R 2014 Extreme Ultraviolet (EUV) Lithography V90480C San Jose, California, United States, February 23-27 2014
[3]	Mizoguchi H, Nakarai H, Abe T, Ohta T, Nowak K M, Kawasuji Y, Tanaka H, Watanabe Y, Hori T, Kodama T, Shiraishi Y, Yanagida T, Yamada T, Yamazaki T, Okazaki S, Saitou T 2014 Extreme Ultraviolet (EUV) Lithography V 90480D San Jose, California, United States, February 23-27 2014
[4]	Abhari R S, Rollinger B, Giovannini A Z, Morris O, Henderson I, Ellwi S S 2012 Journal of MicroNanolithography, MEMS, MOEMS 11 021114
[5]	Giovannini A Z, Abhari R S 2013 Journal of Applied Physics 114 033303
[6]	Masnavi M, Szilagyi J, Parchamy H, Richardson M C 2013 Applied Physics Letters 102 164102
[7]	Ni Q L 2003 Ph. D. Dissertation (Changchun: University of Chinese Academy of Sciences) (in Chinese) [尼启良 2003 博士学位论文 (长春: 中国科学院研究生院, 长春光学精密机械与物理研究所)]
[8]	Jin C S, Wang Z S, Cao J L 2000 Optics and Precision Engineering 8 66 (in Chinese) [金春水, 王占山, 曹健林 2000 光学精密工程 8 66]
[9]	Cai Y, Wang W T, Yang M, Liu H S, Lu P X, Li R X, Xu Z Z 2008 Acta Phys. Sin. 57 5100 (in Chinese) [蔡懿, 王文涛, 杨明, 刘建胜, 陆培祥, 李儒新, 徐至展 2008 物理学报 57 5100]
[10]	Zhao Y P, Xu Q, Xiao D L, Ding N, Xie Y, Li Q, Wang Q 2013 Acta Phys. Sin. 62 245204 (in Chinese) [赵永蓬, 徐强, 肖德龙, 丁宁, 谢耀, 李琦, 王骐 2013 物理学报 62 245204]
[11]	Dou Y P, Sun C K, Liu C Z, Gao J, Hao Z Q, Lin J Q 2014 Chin. Phys. B 23 075202
[12]	Wang H C, Wang Z S, Li F S, Qin S J, Du Y, Wang L, Zhang Z, Chen L Y 2004 Acta Phys. Sin. 53 2368 (in Chinese) [王洪昌, 王占山, 李佛生, 秦树基, 杜芸, 王利, 张众, 陈玲燕 2004 物理学报 53 2368]
[13]	Wu T, Wang X B, Wang S Y, Tang J, Lu P X, Lu H 2012 Journal of Applied Physics 111 063304
[14]	Wu T, Wang X B, Tang J, Rao Z M, Wang S Y 2011 Laser Technology 35 800 (in Chinese) [吴涛, 王新兵, 唐建, 饶志明, 王少义 2011 激光技术 35 800]
[15]	Wu H Y, Wu Y G, Wang Z H, Lu G, Ling L J, Xia Z H, Chen N B 2011 Acta Photonica Sinica 40 0001 (in Chinese) [伍和云, 吴永刚, 王振华, 吕刚, 凌磊婕, 夏子奂, 陈乃波 2011 光子学报 40 0001]
[16]	Bob R, Luna B, Nadia G, Abhari R S 2012 Extreme Ultraviolet Lithography III 83222P San Jose, California United States, February 12 2012
[17]	Wang J L, Chen W W, Cai L, Ma Y R, Liu Y S, Lv G S, Shao M J, Jin Y Q, Sang F T 2006 High Power Laser and Particle Beams 18 935 (in Chinese) [王景龙, 陈文武, 蔡龙, 马月仁, 刘宇时, 吕国盛, 邵明君, 金玉奇, 桑凤亭 2006 强激光与粒子束 18 935]
[18]	Cui Y Q, Wang W M, Sheng Z M, Li Y T, Zhang J 2013 Plasma Physics and Controlled Fusion 55 085008
[19]	Bakshi V 2006 EUV Sources for Lithography (Bellingham, WA: Spie Press) p113

[1]	Li Hui, Tan Fang-Rui, Yin Hao-Yu, Ma Yue-Yang, Wu Xiao-Bin. Simulation study of decoherence and light intensity uniformization for extreme ultraviolet of uniform light pipe. Acta Physica Sinica, 2024, 73(11): 114201. doi: 10.7498/aps.73.20240335
[2]	Gao Cheng, Liu Yan-Peng, Yan Guan-Peng, Yan Jie, Chen Xiao-Qi, Hou Yong, Jin Feng-Tao, Wu Jian-Hua, Zeng Jiao-Long, Yuan Jian-Min. Theoretical investigation on extreme ultraviolet radiative opacity and emissivity of Sn plasmas at local-thermodynamic equilibrium. Acta Physica Sinica, 2023, 72(18): 183101. doi: 10.7498/aps.72.20230455
[3]	Si Ming-Qi, Wen Zhi-Lin, Zhang Qi-Jin, Dou Yin-Ping, Li Bo-Chao, Song Xiao-Wei, Xie Zhuo, Lin Jing-Quan. Radiation of extreme ultraviolet source and out-of-band from laser-irradiated low-density SnO₂ target. Acta Physica Sinica, 2023, 72(6): 065201. doi: 10.7498/aps.72.20222385
[4]	Xie Zhuo, Wen Zhi-Lin, Si Ming-Qi, Dou Yin-Ping, Song Xiao-Wei, Lin Jing-Quan. Characteristics of extreme ultraviolet emission from Gd plasma produced by dual pulse laser. Acta Physica Sinica, 2022, 71(3): 035202. doi: 10.7498/aps.71.20211450
[5]	. The characteristics of extreme ultraviolet emission from Gd plasma produced by dual pulse laser. Acta Physica Sinica, 2021, (): . doi: 10.7498/aps.70.20211450
[6]	Hai Bang, Zhang Shao-Feng, Zhang Min, Dong Da-Pu, Lei Jian-Ting, Zhao Dong-Mei, Ma Xin-Wen. A tabletop experimental system for investigating ultrafast atomic dynamics based on femtosecond extreme ultraviolet photons. Acta Physica Sinica, 2020, 69(23): 234208. doi: 10.7498/aps.69.20201035
[7]	Dou Yin-Ping, Xie Zhuo, Song Xiao-Lin, Tian Yong, Lin Jing-Quan. Experimental research on laser-produced Gd target plasma source for 6.7 nm lithography. Acta Physica Sinica, 2015, 64(23): 235202. doi: 10.7498/aps.64.235202
[8]	Zhang Ji-Yan, Yang Jia-Min, Yang Guo-Hong, Ding Yao-Nan, Li Jun, Yan Jun, Wu Ze-Qing, Ding Yong-Kun, Zhang Bao-Han, Zheng Zhi-Jian. Investigations on radiative opacity measurement by the method of direct laser-heating and self-backlighting. Acta Physica Sinica, 2013, 62(19): 195201. doi: 10.7498/aps.62.195201
[9]	Ling Wei-Jun, Dong Quan-Li, Zhang Lei, Zhang Shao-Gang, Dong Zhong, Wei Kai-Bin, Wang Shou-Jun, He Min-Qing, Sheng Zheng-Ming, Zhang Jie. Laser driven shock accelerated ion energy spectrumbroadening mechanisms in over-dense plasmas. Acta Physica Sinica, 2011, 60(7): 075201. doi: 10.7498/aps.60.075201
[10]	Wang Wei, Zhang Jie, Zhao Gang. Effect of a Planckian radiation field on population of bound-electrons. Acta Physica Sinica, 2008, 57(3): 1759-1764. doi: 10.7498/aps.57.1759
[11]	Ji Yun-Jing, Bian Bao-Min, Tong Chao-Xia, Lu Jian. Study on the electrical potential signals induced by laser plasma in the target with bias-voltage. Acta Physica Sinica, 2008, 57(2): 980-984. doi: 10.7498/aps.57.980
[12]	Yu Quan-Zhi, Li Yu-Tong, Jiang Xiao-Hua, Liu Yong-Gang, Wang Zhe-Bin, Dong Quan-Li, Liu Feng, Zhang Zhe, Huang Li-Zhen, C. Danson, D. Pepler, Ding Yong-Kun, Fu Shi-Nian, Zhang Jie. Infulence of electron temperature on the two peaks of Thomson scattering ion-acoustic waves in laser plasmas. Acta Physica Sinica, 2007, 56(1): 359-365. doi: 10.7498/aps.56.359
[13]	Wang Wei, Zhang Jie, Zhao Gang. Simulation of the effects of X-ray emission from accretion disks on the interstellar materials. Acta Physica Sinica, 2006, 55(1): 287-293. doi: 10.7498/aps.55.287
[14]	Zheng Zhi-Yuan, Zhang Jie, Hao Zuo-Qiang, Yuan Xiao-Hui, Zhang Zhe, Lu Xin, Wang Zhao-Hua, Wei Zhi-Yi. Effects of target configuration on the laser plasma momentum-coupling coefficient. Acta Physica Sinica, 2006, 55(1): 326-330. doi: 10.7498/aps.55.326
[15]	Wang Wei, Zhang Jie, Dong Quan-Li, V.K.Senecha. Effects of target thickness on spectral characteristics of x-ray flux from the laser-produced plasmas. Acta Physica Sinica, 2004, 53(3): 967-972. doi: 10.7498/aps.53.967
[16]	Fu Xi-Quan, Guo Hong. Propagation of x-ray in the laser plasma and its effect in the diagnosis of elec tric density. Acta Physica Sinica, 2003, 52(7): 1682-1687. doi: 10.7498/aps.52.1682
[17]	Sun Ke-Xu, Huang Tian-Xuan, Ding Yong-Kun, Yi Rong-Qing, Jiang Shao-En, Cui Yan-Li, Tang Xiao-Qing, Chen Jiu-Lin, Zhang Bao-Han, Zheng Zhi-Jian. . Acta Physica Sinica, 2002, 51(8): 1750-1754. doi: 10.7498/aps.51.1750
[18]	. . Acta Physica Sinica, 2002, 51(3): 590-595. doi: 10.7498/aps.51.590
[19]	ZHANG JIE, WANG WEI. EFFECTS OF THE RADIATION FIELD ON THE PHYSICAL PROCESSES OF LASER-PRODUCED PLASMAS. Acta Physica Sinica, 2001, 50(8): 1517-1520. doi: 10.7498/aps.50.1517
[20]	ZHANG SHU-DONG, ZHANG WEI-JUN. VELOCITY OF EMISSION PARTICLES AND SHOCKWAVE PRODUCED BY LASER-ABLATED Al TARGET. Acta Physica Sinica, 2001, 50(8): 1512-1516. doi: 10.7498/aps.50.1512

Catalog

Vol. 64, Issue 7 - 2015-04-05

Metrics

Abstract views: 9827
PDF Downloads: 743
Cited By: 0

姓名
邮箱
手机号码
标题
留言内容
验证码

Search

Article

留言板