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物理学报. 1996, 45(7): 1178-1184.
doi: 10.7498/aps.45.1178.
GaAs(001)表面外延生长Mn薄膜的XPS研究
- 收稿日期: 1995-04-03
- 刊出日期: 1996-07-20
摘要: 利用x射线光电子能谱的深度剖面技术,对不同衬底温度下分子束外延生长的Mn薄膜及其与GaAs(001)衬底间的界面进行了元素组分和化学结合状态随深度变化的研究。实验发现衬底温度等于400K时制备的fcc-Mn/GaAs(001)体系中,fcc-Mn层与GaAs衬底之间存在一层较厚的Mn-Ga-As的缓冲层;衬底温度等于300K(室温)时制备的a-Mn/GaAs(001)体系中也存在类似的缓冲层,但它的厚度与fcc-Mn的情形相比要小得多;而当衬底温度等于450K时制备的体系在GaAs衬底之上全部是Mn-Ga
English Abstract
AN XPS STUDY OF Mn THIN FILMS GROWN ON GaAs(001l) SURFACE
- Received Date:
03 April 1995
- Published Online:
20 July 1996
Abstract: The composition depth profiles of the Mn thin films grown on GaAs(00l) surface using MBE technique are studied with X-ray photoelectron spectroscopy(XPS) . The experimental results show that the fcc-Mn/GaAs(001) system grown on a 400 K substrate has a sandwich structure with a Mn-Ga-As buffer layer located between the fcc-Mn layer and the GaAs substrate; the α-Mn/GaAs (001) system grown on a 300 K substrate also has a similar buffer layer which is much thinner than that of the fcc-Mn/GaAs(001) system;and the system grown on a 450 K substrate is a Mn-Ga-As alloy beyond the GaAs substrate and it has no Mn-dominated area. It is concluded that to keep the substrate at a proper temperature(400 K) during growth to obtain a suitable thickness of buffer layer is an essential requirement to grow fcc-Mn on GaAs(00l) surface.
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