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Surface morphology and optical properties of Ta2O5 films prepared by radio frequency sputtering

Di Guo-Qing

Surface morphology and optical properties of Ta2O5 films prepared by radio frequency sputtering

Di Guo-Qing
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Publishing process
  • Received Date:  19 April 2010
  • Accepted Date:  31 May 2010
  • Published Online:  15 March 2011

Surface morphology and optical properties of Ta2O5 films prepared by radio frequency sputtering

  • 1. Jiangsu Key Laboratory of Thin Films, Department of Physics, Soochow University, Suzhou 215006, China

Abstract: Ta2O5 films were deposited at room temperature by radio frequency(RF) sputtering with the target of bulk Ta2O5, in Ar or Ar-O2 mixture atmosphere. The reflectivity spectra measured from two sides of a film are compared to evaluate the optical absorption of the film. It is found that the excess optical absorption arises from deficiency in oxygen during sputtering. These defects can be eliminated effectively by selecting adequate Ar-O2 mixture and power for sputtering, and unabsorbing Ta2O5 films with compactness and smoothness can be obtained without annealing.

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