[1] |
Luo Ling-Feng, Yang Juan, Geng Hai, Wu Xian-Ming, Mou Hao. Numerical simulation of magnetic field influence on plasma and electron extraction of electron cyclotron resonance neutralizer. Acta Physica Sinica,
2024, 73(16): 165203.
doi: 10.7498/aps.73.20240612
|
[2] |
Li Xin, Zeng Ming, Liu Hui, Ning Zhong-Xi, Yu Da-Ren. Iodine electron cyclotron resonance plasma source for electric propulsion. Acta Physica Sinica,
2023, 72(22): 225202.
doi: 10.7498/aps.72.20230785
|
[3] |
Liu Ming-Wei, Gong Shun-Feng, Li Jin, Jiang Chun-Lei, Zhang Yu-Tao, Zhou Bing-Ju. Non-resonant direct laser acceleration in underdense plasma channels. Acta Physica Sinica,
2015, 64(14): 145201.
doi: 10.7498/aps.64.145201
|
[4] |
Gao Bi-Rong, Liu Yue. Numerical study on uniformity of electron cyclotron resonance plasma density. Acta Physica Sinica,
2011, 60(4): 045201.
doi: 10.7498/aps.60.045201
|
[5] |
Yang Juan, Shi Feng, Yang Tie-Lian, Meng Zhi-Qiang. Numerical simulation on the plasma field within discharge chamber of electron cyclotron resonance ion thruster. Acta Physica Sinica,
2010, 59(12): 8701-8706.
doi: 10.7498/aps.59.8701
|
[6] |
Ke Bo, Wang Lei, Ni Tian-Ling, Ding Fang, Chen Mu-Di, Zhou Hai-Yang, Wen Xiao-Hui, Zhu Xiao-Dong. Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma. Acta Physica Sinica,
2010, 59(2): 1338-1343.
doi: 10.7498/aps.59.1338
|
[7] |
Wu Zhen-Yu, Yang Yin-Tang, Wang Jia-You. Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition. Acta Physica Sinica,
2006, 55(5): 2572-2577.
doi: 10.7498/aps.55.2572
|
[8] |
Chen Zhuo, He Wei, Pu Yi-Kang. Measurement of metastable state densities and electron temperatures in an electron cyclotron resonance argon plasma. Acta Physica Sinica,
2005, 54(5): 2153-2157.
doi: 10.7498/aps.54.2153
|
[9] |
Ye Chao, Ning Zhao-Yuan, Cheng Shan-Hua, Xin Yu, Xu Sheng-Hua. Effect of C═C content on I-V characteristics of fluorinated amorphous carbon thin films. Acta Physica Sinica,
2004, 53(5): 1496-1500.
doi: 10.7498/aps.53.1496
|
[10] |
Huang Feng, Cheng Shan-Hua, Ning Zhao-Yuan, Yang Shen-Dong, Ye Chao. . Acta Physica Sinica,
2002, 51(6): 1383-1387.
doi: 10.7498/aps.51.1383
|
[11] |
Ye Chao, Ning Zhao-Yuan, Cheng Shan-Hua, Wang Xiang-Ying. . Acta Physica Sinica,
2002, 51(11): 2640-2643.
doi: 10.7498/aps.51.2640
|
[12] |
Huang Song, Xin Yu, Ning Zhao-Yuan, Cheng Shan-Hua, Lu Xin-Hua. . Acta Physica Sinica,
2002, 51(11): 2635-2639.
doi: 10.7498/aps.51.2635
|
[13] |
YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA, KANG JIAN. STUDY ON α-C∶F FILMS DEPOSITED BY ELECTRON CYCLOTRONRESONANCE PLASMA CHEMICAL VAPOR DEPOSITION. Acta Physica Sinica,
2001, 50(4): 784-789.
doi: 10.7498/aps.50.784
|
[14] |
YE CHAO, NING ZHAO-YUAN, CHENG SHAN-HUA. OPTICAL PROPERTIES OF AMORPHOUS FLUORINATED CARBON FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA. Acta Physica Sinica,
2001, 50(10): 2017-2022.
doi: 10.7498/aps.50.2017
|
[15] |
Yang Hong-Bo, Liu Wan-Dong, Zheng Jian, Zhang Ge, Liang Xiao-Peng, Xie Jin-Lin, Yu Chang-Xuan. . Acta Physica Sinica,
2000, 49(3): 508-512.
doi: 10.7498/aps.49.508
|
[16] |
Liu Ming-Hai, Hu Xi-Wei, Wu Qin-Chong, Yu Guo-Yang. . Acta Physica Sinica,
2000, 49(3): 497-501.
doi: 10.7498/aps.49.497
|
[17] |
NING ZHAO-YUAN, CHENG SHAN-HUA. ETCHING PROPERTIES OF AMORPHOUS HYDROGENATED CARBON FILMS IN A MULTIPOLE ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA SYSTEM. Acta Physica Sinica,
1999, 48(10): 1950-1956.
doi: 10.7498/aps.48.1950
|
[18] |
DU XIAO-LONG, CHEN GUANG-CHAO, JIANG DE-YI, YAO XIN-ZI, ZHU HE-SUN. PROPERTIES OF ELECTRON CYCLOTRON RESONANCE PLASMAS AND THEIR INFLUENCE ON THE DEPOSITION OF GaN FILMS. Acta Physica Sinica,
1999, 48(2): 257-266.
doi: 10.7498/aps.48.257
|
[19] |
GONG YE, WEN XIAO-JUN, ZHANG PENG-YUN, DENG XIN-LU. NUMERICAL STUDY OF ION TRANSPORT IN ECR MICROWAVE PLASMA WITH A CYLINDER MODEL. Acta Physica Sinica,
1997, 46(12): 2376-2383.
doi: 10.7498/aps.46.2376
|
[20] |
CHEN YAN-PING, ZHOU YU-MEI. ECRH IN NON-THERMAL EQUILIBRIUM PLASMAS IN WEAKLY RELATIVISTIC REGIME. Acta Physica Sinica,
1984, 33(7): 1050-1057.
doi: 10.7498/aps.33.1050
|