-
Taking advantage of the glowing discharge technology and plasma mass spectrometry diagnosis technology, the variation rules of positive ion species and energy with power in H2/C4H8 mixture gas are investigated. The characteristic ions are measured and their forming process is discussed. The results show that the intensity of the C-H segment ions in the H2/C4H8 plasma increases with radio-frequency (RF) power increasing, the intensity reaches a maximum at an RF power of 20 W, and then reduces after the RF power has reached 25 W. The relative concentration of m/e 57 (C4H9+) is highest when the power is less than 10 W, and when the power is more than 10 W, the relative concentration of m/e 39 (C3H3+) reaches a maximum. The energy of the C-H segment ions increases gradually with the increase of RF power. The qualitative analyses of H2/C4H8 plasma composition and energy will be beneficial to improving the fabrication technology of glowing discharge polymer coating.
[1] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]
[2] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1996 Fusion Technol. (USA) 31 381
[3] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[4] Auciello O, Flamn D L (Translated by Zheng S B, Hu J F, Guo S J, Hong M Y) 1994 Plasma Diagnostics (vol. 1): Discharge Parameters and Chemistry (Beijing: Electronic Industry Press) p38 (in Chinese) [奥切洛O, 弗拉姆 D L著 (郑少白, 胡建芳, 郭淑静, 洪明苑译) 1994 等离子体诊断 (第一卷): 放电参量和化学 (北京: 电子工业出版社) 第38页]
[5] Benninghoven A 1994 Angew. Chem. Int. Ed. Engl. 33 1023
[6] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[7] Zhang Q 2003 Modern Technique and Characterization Methods (Self-Complied Teaching Materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[8] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Edn.) (Beijing: Science Press) p16(in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定 (第二版) (北京: 科学出版社) 第16页]
[9] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[10] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[11] Ding J N, Qi H S, Yuan N Y, He Y L Cheng G G, Fan Z, Pan H B, Wang J X, Wang X Q 2009 Chin. J. Vac. Sci. Technol. 29 188 (in Chinese) [丁建宁, 祁宏山, 袁宁一, 何宇亮, 程广贵, 范真, 潘海彬, 王君雄, 王秀琴 2009 真空科学与技术学报 29 188]
[12] Bauer M, Schwarz-Selinger T, Jacob W 2005 J. Appl. Phys. 98 73302
-
[1] Zhang B L, He Z B, Wu W D, Liu X H, Yang X D 2009 Acta Phys. Sin. 58 4636 (in Chinese) [张宝玲, 何智兵, 吴卫东, 刘兴华, 杨向东 2009 物理学报 58 6436]
[2] Mcquillan B W, Nikroo A, Steinman D A, Elsner F H, Czechowicz D G, Hoppe M L, Sixtus M, Miller W J 1996 Fusion Technol. (USA) 31 381
[3] Ristein J, Stief R T, Ley L, Beyer J 1998 J. Appl. Phys. 84 3836
[4] Auciello O, Flamn D L (Translated by Zheng S B, Hu J F, Guo S J, Hong M Y) 1994 Plasma Diagnostics (vol. 1): Discharge Parameters and Chemistry (Beijing: Electronic Industry Press) p38 (in Chinese) [奥切洛O, 弗拉姆 D L著 (郑少白, 胡建芳, 郭淑静, 洪明苑译) 1994 等离子体诊断 (第一卷): 放电参量和化学 (北京: 电子工业出版社) 第38页]
[5] Benninghoven A 1994 Angew. Chem. Int. Ed. Engl. 33 1023
[6] Zhao Y X, Sun X Y 2010 The Spectrum Analysis on Structure of Organic Molecules (Beijing: Science Press) p1 (in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱解析 (北京: 科学出版社) 第1页]
[7] Zhang Q 2003 Modern Technique and Characterization Methods (Self-Complied Teaching Materials by Sichuan University) p154 (in Chinese) [张倩 2003 近代测试技术及表征 (四川大学自编讲义) 第154页]
[8] Zhao Y X, Sun X Y 2010 The Spectral Identification on Structure of Organic Molecules (2nd Edn.) (Beijing: Science Press) p16(in Chinese) [赵瑶兴, 孙祥玉 2010 有机分子结构光谱鉴定 (第二版) (北京: 科学出版社) 第16页]
[9] VanLeyen D, Hagenhoff B, Niehuis E, Benninghoven A, Bletss I V, Hercules D M 1989 J. Vac. Sci. Technol. A7 1790
[10] Hittle L R, Hercules D M 1994 Surf. Interface Anal. 21 217
[11] Ding J N, Qi H S, Yuan N Y, He Y L Cheng G G, Fan Z, Pan H B, Wang J X, Wang X Q 2009 Chin. J. Vac. Sci. Technol. 29 188 (in Chinese) [丁建宁, 祁宏山, 袁宁一, 何宇亮, 程广贵, 范真, 潘海彬, 王君雄, 王秀琴 2009 真空科学与技术学报 29 188]
[12] Bauer M, Schwarz-Selinger T, Jacob W 2005 J. Appl. Phys. 98 73302
Catalog
Metrics
- Abstract views: 6579
- PDF Downloads: 516
- Cited By: 0
下载:
