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[1] Aksenov I I, Belous V A, Padalka V G, Khoroshikh V M 1978 Sov. J. Plasma Phys. 4 425
[2] Bilek M M M, Yin Y, Mckenzie D R 1996 IEEE Trans. Plasma Sci. 24 1165
[3] Boxman R L, Goldsmith S, Ben-Shalom A, Kaplan L, Arbilly D, Gidalevich E, Zhitomirsky V, Ishaya A, Keidar M, Beilis I I 1995 IEEE Trans. Plasma Sci. 23 939
[4] Anders A, Anders S, Brown I G 1994 J. Appl. Phys. 75 4900
[5] Shi X, Tay B K, Lau S P 2012 Int. J. Mod. Phys. B 14 136
[6] Yuvakkumar R, Peranantham P, Nathanael A J, Nataraj D, Mangalaraj D, Sun I H, Peranantham P, Nataraj D 2015 J. Nanosci. Nanotechnol. 15 2523
[7] Wang N, Komvopoulos K 2013 J. Mater. Res. 28 2124
[8] Diaz B, Swiatowska J, Maurice V, Seyeux A, Harkonen E, Ritala M, Tervakangas S, Kolehmainen J, Marcus P 2013 Electrochim. Acta 90 232
[9] Han L, Yang L, Yang L M C, Wang Y W, Zhao Y Q 2011 Acta Phys. Sin. 60 046802 (in Chinese) [韩亮, 杨立, 杨拉毛草, 王炎武, 赵玉清 2011 物理学报 60 046802]
[10] Wen F, Huang N, Jing F J, Sun H, Cao Y 2011 Adv. Mater. Res. 287 2203
[11] Li L H, Lu Q Y, Fu R K Y, Chu P K 2008 Surf. Coat. Technol. 203 887
[12] Xue Q J, Wang L P 2012 Diamond-like Carbon Films Material (Beijing: Science Press) pp40-47 (in Chinese) [薛群基, 王立平 2012 类金刚石碳基薄膜材料 (北京: 科学出版社) 第 40-47 页]
[13] Bootkul D, Supsermpol B, Saenphinit N, Aramwit C, Intarasiri S 2014 Appl. Surf. Sci. 310 284
[14] Xu Z, Sun H, Leng Y X, Li X, Yang W, Huang N 2015 Appl. Surf. Sci. 328 319
[15] Xu S, Flynn D, Tay B K, Prawer S, Nugent K W, Silva S R P, Lifshitz Y, Milne W I 1997 Philos. Mag. B 76 351
[16] Choi J, Kato T 2003 J. Appl. Phys. 93 8722
[17] Liu A P, Liu M, Yu J C, Qian G D, Tang W H 2015 Chin. Phys. B 24 056804
[18] Bilek M M M, Mckenzie D R, Yin Y, Chhowalla M U, Milne W I 1996 IEEE Trans. Plasma Sci. 24 1291
[19] Li L H, Xia L F, Ma X X, Sun Y, Li G, Yu W D 1999 Chin. J. Vac. Sci. Technol. 3 207 (in Chinese) [李刘合, 夏立芳, 马欣新, 孙跃, 李光, 于伟东 1999 真空科学与技术学报 3 207]
[20] Xu S, Tay B K, Tan H S, Zhong L, Tu Y Q, Silva S R P, Milne W I 1996 J. Appl. Phys. 79 7234
[21] Sun P, Hu M, Zhang F, Ji Y Q, Liu H S, Liu D D, Leng J 2015 Chin. Phys. B 24 067803
[22] Zavaleyev V, Walkowicz J 2015 Thin Solid Films 581 32
[23] Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Second Edition) (Hoboken: John Wiley Sons, Inc.) pp185-186
[24] D L Tang, R K Y Fu, X B Tian, P Peng, P K Chu 2003 Nucl. Instrum. Methods Phys. Res. Sect. B 206 808
[25] Brown I G 1994 Rev. Sci. Instrum. 65 3061
[26] Chu P K, Li L 2006 Mater. Chem. Phys. 96 253
[27] Yang F Z, Shen L R, Wang S Q, Tang D L, Jin F Y, Liu H F 2013 Acta Phys. Sin. 62 017802 (in Chinese) [杨发展, 沈丽如, 王世庆, 唐德礼, 金凡亚, 刘海峰 2013 物理学报 62 017802]
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[1] Aksenov I I, Belous V A, Padalka V G, Khoroshikh V M 1978 Sov. J. Plasma Phys. 4 425
[2] Bilek M M M, Yin Y, Mckenzie D R 1996 IEEE Trans. Plasma Sci. 24 1165
[3] Boxman R L, Goldsmith S, Ben-Shalom A, Kaplan L, Arbilly D, Gidalevich E, Zhitomirsky V, Ishaya A, Keidar M, Beilis I I 1995 IEEE Trans. Plasma Sci. 23 939
[4] Anders A, Anders S, Brown I G 1994 J. Appl. Phys. 75 4900
[5] Shi X, Tay B K, Lau S P 2012 Int. J. Mod. Phys. B 14 136
[6] Yuvakkumar R, Peranantham P, Nathanael A J, Nataraj D, Mangalaraj D, Sun I H, Peranantham P, Nataraj D 2015 J. Nanosci. Nanotechnol. 15 2523
[7] Wang N, Komvopoulos K 2013 J. Mater. Res. 28 2124
[8] Diaz B, Swiatowska J, Maurice V, Seyeux A, Harkonen E, Ritala M, Tervakangas S, Kolehmainen J, Marcus P 2013 Electrochim. Acta 90 232
[9] Han L, Yang L, Yang L M C, Wang Y W, Zhao Y Q 2011 Acta Phys. Sin. 60 046802 (in Chinese) [韩亮, 杨立, 杨拉毛草, 王炎武, 赵玉清 2011 物理学报 60 046802]
[10] Wen F, Huang N, Jing F J, Sun H, Cao Y 2011 Adv. Mater. Res. 287 2203
[11] Li L H, Lu Q Y, Fu R K Y, Chu P K 2008 Surf. Coat. Technol. 203 887
[12] Xue Q J, Wang L P 2012 Diamond-like Carbon Films Material (Beijing: Science Press) pp40-47 (in Chinese) [薛群基, 王立平 2012 类金刚石碳基薄膜材料 (北京: 科学出版社) 第 40-47 页]
[13] Bootkul D, Supsermpol B, Saenphinit N, Aramwit C, Intarasiri S 2014 Appl. Surf. Sci. 310 284
[14] Xu Z, Sun H, Leng Y X, Li X, Yang W, Huang N 2015 Appl. Surf. Sci. 328 319
[15] Xu S, Flynn D, Tay B K, Prawer S, Nugent K W, Silva S R P, Lifshitz Y, Milne W I 1997 Philos. Mag. B 76 351
[16] Choi J, Kato T 2003 J. Appl. Phys. 93 8722
[17] Liu A P, Liu M, Yu J C, Qian G D, Tang W H 2015 Chin. Phys. B 24 056804
[18] Bilek M M M, Mckenzie D R, Yin Y, Chhowalla M U, Milne W I 1996 IEEE Trans. Plasma Sci. 24 1291
[19] Li L H, Xia L F, Ma X X, Sun Y, Li G, Yu W D 1999 Chin. J. Vac. Sci. Technol. 3 207 (in Chinese) [李刘合, 夏立芳, 马欣新, 孙跃, 李光, 于伟东 1999 真空科学与技术学报 3 207]
[20] Xu S, Tay B K, Tan H S, Zhong L, Tu Y Q, Silva S R P, Milne W I 1996 J. Appl. Phys. 79 7234
[21] Sun P, Hu M, Zhang F, Ji Y Q, Liu H S, Liu D D, Leng J 2015 Chin. Phys. B 24 067803
[22] Zavaleyev V, Walkowicz J 2015 Thin Solid Films 581 32
[23] Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (Second Edition) (Hoboken: John Wiley Sons, Inc.) pp185-186
[24] D L Tang, R K Y Fu, X B Tian, P Peng, P K Chu 2003 Nucl. Instrum. Methods Phys. Res. Sect. B 206 808
[25] Brown I G 1994 Rev. Sci. Instrum. 65 3061
[26] Chu P K, Li L 2006 Mater. Chem. Phys. 96 253
[27] Yang F Z, Shen L R, Wang S Q, Tang D L, Jin F Y, Liu H F 2013 Acta Phys. Sin. 62 017802 (in Chinese) [杨发展, 沈丽如, 王世庆, 唐德礼, 金凡亚, 刘海峰 2013 物理学报 62 017802]
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