Electronic state and its effect on the hydrophilicity of Cu/TiOx composite films

Xu Hui; Wang Shun-Li; Liu Ai-Ping; Chen Ben-Yong; Tang Wei-Hua

doi:10.7498/aps.59.3601

Abstract

Cu/TiOx composite films have been deposited by RF magnetron sputtering at room temperature. The chemical components and structures of the Cu/TiOx composite films have been characterized by X-ray diffractometer (XRD), X-ray photoelectron spectroscopy (XPS), UV-vis spectroscopy and water contact angel measurement. It is found that the titanium presents in the form of Ti3+ before and after annealing. The results of UV-vis spectroscopy show the visible light absorption features of Cu/TiOx composite films with the absorption edge at about 600 nm. Contact angle results indicate that the Cu/TiOx films are hydrophilic, which is attributed to the added Cu.

Keywords:

Authors and contacts

1.
浙江理工大学物理系，光电材料与器件中心，杭州 310018

References

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Cited By

[1]	［1］Park D R, Zhang J, Ikeue K, Yamashita H, Anpo M 1999 J. Catal. 185 114
[2]	［2］Francois M, Danglot J, Grimbert B, Mounaix P, Muller M, Vanbe-sien O, Lippens D 2002 Microelectron. Eng. 61 537
[3]	［3］Hagfeldt A, Graetzel M 1995 Chem. Rev. 95 49
[4]	［4］Li Y, Sun S, Ma M, Ouyang Y, Yan W 2008 Chem. Eng. J. 142 147
[5]	［5］Sunada K, Watanabe T, Hashimoto K 2003 Environ. Sci. Technol. 37 4785
[6]	［6］Ollis D F, Pelizzetti E, Serpone N 1991 Environ. Sci. Technol. 25 1522
[7]	［7］Lee D, Rubner M F, Cohen R E 2006 Nano Lett. 6 2305
[8]	［8］Liu Y Y, Qian L Q, Gou C, Jia X, Wang J W, Tang W H 2009 J. Alloys Compd. 479 532
[9]	［9］Jian J K, Li Q, Sun Y F, Zheng Y F, Zhou X L 2008 Acta Phys.Sin. 57 3880 ( in Chinese ) ［简基康、李茜、孙言飞、郑毓峰、周向玲 2008 物理学报 57 3880］
[10]	］Young C, Lim T M, Chiang K, Scott J, Amal R 2008 Appl. Catal. B: Environ. 78 1
[11]	］Paramasivam I, Macak J M, Schmuki P 2008 Electrochem. Commun. 10 71
[12]	］Kontapakdee K, Panpranot J, Praserthdam P 2007 Catal. Commun. 8 2166
[13]	］Patil S R, tangar U L, Gross S, Schubert U 2008 J. Adv. Oxid. Technol. 11 327
[14]	］Meng F M, Sun Z Q 2009 Appl. Sur. Sci. 255 6715
[15]	］Ashkaarran A A, Mohammadizadeh M R 2007 Eur. Phys. J. Appl. Phys. 40 155
[16]	］Wang D Y, Lin H C, Yen C C 2006 Thin Solid Films 515 1047
[17]	］Geng X H, Sun J, Sun F H, Wang G H, Wei C C, Xiong S Z, Xu S Z, Yue Q, Zhang X D, Zhao Y 2009 Acta Phys.Sin. 58 1293 ( in Chinese ) ［耿新华、孙建、孙福河、王光红、魏长春、熊绍珍、许盛之、岳强、张晓丹、赵颖 2009 物理学报 58 1293］
[18]	］Sirghi L, Nakamura M, Hatanaka Y, Takai O 2001 Langmuir 17 8199
[19]	］Shen J, Wo S T, Cui X L, Cai Z W, Yang X L, Zhang Z J 2004 Acta Phys. -Chim. Sin. 20 1191 (in Chinese) ［沈杰、沃松涛、崔晓莉、蔡臻炜、杨锡良、章壮健 2004 物理化学学报 20 1191］
[20]	］Ji F, Ma J, Ma H L, Wang Y H,Yu X H, Zhang X J 2005 Acta Phys.Sin. 54 1731 ( in Chinese ) ［计峰、马瑾、马洪磊、王玉恒、余旭浒、张锡健 2005 物理学报 54 1731］
[21]	］Liu S H, Wang D H, Pan C H 1988 X-ray Photoelectron Spectroscopy (1st ed) ( Beijing: Science Press ) p47 ( in Chinese ) ［刘世宏、王当憨、潘承璜 1988 X-射线光电子能谱分析 (第一版) (北京:科学出版社) 第47页］
[22]	］Hou D L, Zhao R B, Meng H J, Jia L Y, Ye X J, Zhou H J, Li X L 2008 Thin Solid Films 516 3223
[23]	］Wang D Y, Lin H C, Yen C C 2006 Thin Solid Films 515 1047
[24]	］Sanjines R, Tang H, Berger H, Gozzo F, Margaritondo G, Levy F 1994 J. Appl. Phys. 75 2945
[25]	］Liang Y J, Che M C 1993 The Handbook of Inorganic Thermodynamics (1st ed) (Shenyang: Northeasten University Press) p379 ［梁英教、车荫昌 1993 无机物热力学数据手册 (第一版)（沈阳：东北大学出版社）第379页］
[26]	］Lee H J, Hahn S H, Kim E J, You Y Z 2004 J. Mater. Sci. 39 3683
[27]	］Zhang Y, Wang S T, Li X B, Chen L Y, Qian Y T, Zhang Z D 2006 J. Crystal Growth 291 196
[28]	］Xu Y Y, Chen D R, Jiao X. L 2005 J. Phys. Chem. 109 13561
[29]	］Zhang L L, Liu P Y, Zhong F, Zuo L, Sun W D 2005 J. Vac. Sci. Technol. 25 259 ( in Chinese ) ［张丽丽、刘彭义、仲飞、翟琳、孙汪典 2005 真空科学与技术学报 25 259］
[30]	］Sakai N, Wang R, Fujishima A, Watanabe T, Hashimoto K 1998 Langmuir 14 5918

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Vol. 59, Issue 5 - 2010-03-05

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