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In order to solve the problems of unstable discharge, low deposition rate and large difference in ionization rate between different targets in high power impulse magnetron sputtering, a novel cylindrical cathode with annular magnetic field based on hollow cathode effect is proposed, which can be used to produce ion beam with high ionization rate, high plasma density and no large particles. However, the traditional channel structure could not guarantee its high efficiency and uniform heat dissipation. The sealing ring may be damaged by ablation due to high power density, which restricts the further improvement of power density. Therefore, it is necessary to optimize the design of the channel structure. SolidWorks flow simulation software is used to simulate the cooling channel of plasma source. The influence of water hole structure parameters on cooling effect is analyzed, including distribution angle, hole number, diameter and inlet hole height. And the channel structure parameters are optimized. The results show that the increasing of the circumferential distribution range of the water hole is beneficial to the uniformity of heat dissipation, ensuring a large temperature difference between cooling water and copper sleeve, and strengthening heat exchange. The water inlet hole set in the upper layer of the structure is conducive to alleviating the temperature stratification phenomenon of the cooling water, so that the copper sleeve and sealing ring are in good cooling condition. Appropriately reducing the aperture is beneficial to increasing the cooling water jet velocity, enhancing the jet impact effect, and then increasing the turbulence degree, strengthening the heat transfer and improving the heat transfer efficiency. By systematically studying the influencing factors, the optimized cooling flow field structure of cylindrical cathode with an annular magnetic field is obtained. The distribution angle is 30°, the number of holes is 6, the aperture is 4 mm, and the height of water inlet hole is 36 mm. The optimized channel structure can improve the utilization rate of cooling water, obtaining better cooling effect at the same flow rate, and improving the discharge stability of the plasma source, which provides a basis for designing the cooling structure of the cylindrical cathode with annular magnetic field.
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Keywords:
- cylindrical cathode with annular magnetic field /
- numerical simulation /
- cooling /
- optimized design for the flow channel structure
[1] D'Avico L, Beltrami R, Lecis N, Trasatti S P 2019 Coatings 9 7
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图 1 环形磁场金属等离子体源简化模型
Figure 1. Simplified model of cylindrical cathode with annular magnetic field.
图 2 计算模型的网格划分
Figure 2. Grid of computing mode.
图 3 不同功率下等离子体源的放电情况
Figure 3. Discharge of plasma source at different power.
图 4 出口冷却水温升的实验值与模拟值对比
Figure 4. Comparison of experimental and simulated water temperature rise.
图 5 不同孔分布角度的出水孔高度(40 mm)冷却水温度切面
Figure 5. Water temperature section with outlet height (40 mm) of different hole distribution angles.
图 6 不同出入水孔数量的铜套表面温度
Figure 6. Surface temperature of copper sleeve with different number of holes.
图 7 不同水压下出入水孔孔径对胶圈温度的影响
Figure 7. Influence of hole diameter on apron temperature under different water pressure.
图 8 出入水孔孔径对入水孔射流速度的影响
Figure 8. Influence of hole diameter on water jet velocity at water inlet.
图 9 入水孔高度对冷却效果的影响 (a)胶圈温度; (b)出水孔侧铜套温度
Figure 9. Influence of hole height on cooling effect: (a) Apron temperature; (b) copper sleeve temperature of outlet side.
图 10 入水孔高度分别为6与36 mm时的冷却水温度云图
Figure 10. Temperature nephogram of cooling water when h is 6 and 36 mm.
表 1 模型中各零部件材料物性参数
Table 1. Material property parameters of each component in the model.
材料 密度ρ/kg·m–3 比热J/kg·K 热导率W/m·K 部件 纯铁 7874 447 80 磁短路环 紫铜 8960 384 401 铜套、铜靶 软钢 7870 472 51.9 上板、上盖板、
周向套、底板钕铁硼 7400 502 32.2 环形磁铁 氟橡胶 1250 1790 0.2 胶圈 水 1000 4182 0.58 冷却水 
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表 2 不同出入水孔分布角度、孔数时的胶圈最高温度 (℃)
Table 2. Maximum temperature of aprons with different distribution angles and number of holes (℃).
角度/(°) 5 10 15 20 25 30 数量/个 1 60.48 60.48 60.48 60.48 60.48 60.48 2 59.83 59.51 59.93 59.20 58.27 59.63 3 57.42 58.79 57.75 57.04 57.62 55.84 4 57.40 57.18 55.52 53.95 53.40 53.24 5 57.15 56.13 53.40 49.75 51.26 50.47 6 55.93 54.82 53.07 52.75 49.87 46.50
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[1] D'Avico L, Beltrami R, Lecis N, Trasatti S P 2019 Coatings 9 7
[2] Maksakova O, Simoẽs S, Pogrebnjak A, Bondar O, Kravchenko Y O, Koltunowicz T, Shaimardanov Z K 2019 J. Alloys Compd. 776 679
Google Scholar
[3] Vu T D, Chen Z, Zeng X, Jiang M, Liu S, Gao Y, Long Y 2019 J. Alloys Compd. C 7 2121
[4] Kouznetsov V, Macak K, Schneider J M, Helmersson U, Petrov I 1999 Surf. Coat. Technol. 122 290
Google Scholar
[5] 吴忠振, 田修波, 李春伟, Ricky K Y Fu, 潘锋, 朱剑豪 2014 物理学报 63 175201
Google Scholar
Wu Z Z, Tian X B, Li C W, Fu R K Y, Pan F, Chu P K 2014 Acta Phys. Sin. 63 175201
Google Scholar
[6] 吴忠振, 田修波, 潘锋, Ricky K Y Fu, 朱剑豪 2014 物理学报 63 185207
Google Scholar
Wu Z Z, Tian X B, Pan F, Fu R K Y, Chu P K 2014 Acta Phys. Sin. 63 185207
Google Scholar
[7] Biswas B, Purandare Y, Sugumaran A, Khan I, Hovsepian P E 2018 Surf. Coat. Technol. 336 84
Google Scholar
[8] Biswas B, Purandare Y, Khan I, Hovsepian P E 2018 Surf. Coat. Technol. 344 383
Google Scholar
[9] Vitelaru C, Aijaz A, Parau A C, Kiss A E, Sobetkii A, Kubart T 2018 J. Phys. D: Appl. Phys. 51 165201
Google Scholar
[10] Meier S M, Hecimovic A, Tsankov T V, Luggenhölscher D, Czarnetzki U 2018 Plasma Sources Sci. Technol. 27 035006
Google Scholar
[11] Diyatmika W, Liang F K, Lou B S, Lu J H, Sun D E, Lee J W 2018 Surf. Coat. Technol. 352 680
Google Scholar
[12] Ganesan R, Akhavan B, Dong X, McKenzie D, Bilek M 2018 Surf. Coat. Technol. 352 671
Google Scholar
[13] Rudolph M, Brenning N, Raadu M A, Hajihoseini H, Gudmundsson J T, Anders A, Lundin D 2020 Plasma Sources Sci. Technol. 29 05LT01
Google Scholar
[14] 吴忠振, 田修波, 潘锋, Ricky K Y Fu, 朱剑豪 2014 金属学报 10 1279
Google Scholar
Wu Z Z, Tian X B, Pan F, Fu R K Y, Chu P K 2014 Acta Meta. Sin. 10 1279
Google Scholar
[15] 肖舒, 吴忠振, 崔岁寒, 刘亮亮, 郑博聪, 林海, 傅劲裕, 田修波, 潘锋, 朱剑豪 2016 物理学报 65 185202
Google Scholar
Xiao S, Wu Z Z, Cui S H, Liu L L, Zheng B C, Lin H, Fu J Y, Tian X B, Pan F, Chu P K 2016 Acta Phys. Sin. 65 185202
Google Scholar
[16] 崔岁寒, 吴忠振, , 肖舒, 刘亮亮, 郑博聪, 林海, 傅劲裕, 田修波, 朱剑豪, 谭文长, 潘锋 2017 物理学报 66 095203
Google Scholar
Cui S H, Wu Z Z, Xiao S, Liu L L, Zheng B C, Lin H, Fu J Y, Tian X B, Chu P K, Tan W C, Pan F 2017 Acta Phys. Sin. 66 095203
Google Scholar
[17] 崔岁寒, 吴忠振, , 肖舒, 陈磊, 李体军, 刘亮亮, 傅劲裕, 田修波, 朱剑豪, 谭文长 2019 物理学报 68 195204
Google Scholar
Cui S H, Wu Z Z, Xiao S, Chen L, Li T J, Liu L L, Fu R K Y, Tian X B, Chu P K, Tan W C 2019 Acta Phys. Sin. 68 195204
Google Scholar
[18] Cui S H, Wu Z Z, Xiao S, Zheng B C, Chen L, Li T J, Fu R K Y, Chu P K, Tian X B, Tan W C Fang D N, Pan F 2020 J. Appl. Phys. 127 023301
Google Scholar
[19] Marin F, de Miranda J R, de Souza A F 2018 Polym. Eng. Sci. 58 552
Google Scholar
[20] Liu X, Xu X, Liu C, Bai W, Dang C 2018 Energy 147 1
Google Scholar
[21] 曹珍恩, 巩春志, 田修波, 杨士勤 2008 真空 2 70
Google Scholar
Cao Z E, Gong C Z, Tian X B, Yang S Q 2008 Vacuum 2 70
Google Scholar
[22] Bräuer G, Szyszka B, Vergöhl M, Bandorf R 2010 Vacuum 84 1354
Google Scholar
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