Mechanism of low-temperature helical streamer discharge driven by pulsed electromagnetic field

Zou Dan-Dan; Tu Chen-Sheng; Hu Ping-Zi; Li Chun-Hua; Qian Mu-Yang

doi:10.7498/aps.72.20230034

Abstract

Under the condition of specific pulsed discharge parameters, the discharge mode conversion of the low-temperature plasma jet discharge channel that originally propagates along a straight line will occur, forming a three-dimensional helical plasma channel. Unlike the traditional helical wave discharge, there are no factors such as an external constant magnetic field that destroys the poloidal symmetry of the dielectric tube, and the chiral direction of the helical streamer will change with the discharge parameters. In order to understand in depth the electromagnetic mechanism of the helical structure in the plasma jet, and the source and influencing factors of the poloidal electric field that leads to the helical shape and determines the chirality in this new type of discharge, we analyze the complex characteristics and electromagnetic mechanism of the helical streamer, such as the chiral direction, pitch, branching, by establishing a self-consistent plasma theoretical model. It is found that the phase of the poloidal wave mode has an effect on the chiral selection of the helical streamer, that the electron density has an influence on the pitch of the streamer, and that the repetition frequency has an effect on the bifurcation point. The above discharge characteristics and their influencing factors are of scientific significance in exploring the interaction mechanism of electromagnetic wave and plasma, and also in providing experimental and theoretical support for the chiral application of low-temperature plasma.

Keywords:

Authors and contacts

1.
East China Jiaotong University, Nanchang 330013, China
2.
Hefei University of Technology, Hefei 230009, China
3.
Nanchang University, Nanchang 330031, China

Corresponding author: Li Chun-Hua, lch2014@hfut.edu.cn

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 12005061, 12065019) and the China Postdoctoral Science Foundation (Grant No. 2019M662271).

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References

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[23]	Li X C, Li Y R, Zhang P P, Jia P Y, Dong L F 2016 Sci. Rep. 6 35653 Google Scholar
[24]	Mericam-Bourdet N, Laroussi M, Begum A, Karakas E 2009 J. Phys. D Appl. Phys. 42 055207 Google Scholar
[25]	Liu W Z, Li Z Y, Zhao L X, Zheng Q T, Ma C L 2018 Phy. Plasmas 25 083505 Google Scholar
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[27]	Hofmann S, Sobota A, Bruggeman P 2012 IEEE Trans. Plasma Sci. 40 2888 Google Scholar
[28]	Wu S, Wang Z, Huang Q, Tan X, Lu X, Ostrikov K 2013 Phys. Plasmas 20 0235032
[29]	Wu S, Xu H, Xian Y, Lu Y, Lu X 2015 AIP Adv. 5 0271102
[30]	Zhang R B, Han Q T, Li S, Liu H 2017 Transactions of China Electrotechnical Society 32 282
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[32]	汪肇坤, 杨振宇, 陶欢, 赵茗 2016 物理学报 65 217802 Google Scholar Wang Z K, Yang Z Y, Tao H, Zhao M 2016 Acta Phys. Sin. 65 217802 Google Scholar
[33]	潘飞, 王小艳, 汪芃, 黎维新, 唐国宁 2016 物理学报 65 198201 Google Scholar Pan F, Wang X Y, Wang P, Li W X, Tang G N 2016 Acta Phys. Sin. 65 198201 Google Scholar
[34]	曾永辉, 江五贵, Qin Qing-Hua 2016 物理学报 65 148802 Google Scholar Zeng Y H, Jiang W G, Qin Q H 2016 Acta Phys. Sin. 65 148802 Google Scholar
[35]	王红芳, 董丽芳, 刘富成, 刘书华, 刘微粒 2007 河北大学学报 27 475 Wang H F, Dong L F, Liu F C, Liu S H, Liu W L 2007 J. Heibei Univ. (Nat. Sci. Ed.) 27 475 (in Chinese)
[36]	Lieberman M A, Booth J P, Chabert P, Rax J M, Turner M M 2002 Plasma Sources Sci. Technol. 11 283 Google Scholar
[37]	Zhao K, Wen D Q, Liu Y X, Lieberman M A, Economou D, Wang Y N 2019 Phys. Rev. Lett. 122 185002 Google Scholar
[38]	曹星 2015 硕士学位论文 (武汉: 华中科技大学) Cao X 2015 M. S. Dessertation (Wuhan: Huazhong University of Science and Technology) (in Chinese)
[39]	杨敏, 王佳明, 齐凯旋, 李小平, 谢楷, 张琼杰, 刘浩岩, 董鹏 2022 物理学报 71 235201 Yang M, Wang J M, Qi K X, Li X P, Xie K, Zhang Q J, Liu H Y, Dong P 2022 Acta Phys. Sin. 71 235201
[40]	Zou D D, Ji Q Z, Zhang Y, Kravchenko O V, Atul J K, Ostrikov K K 2022 IEEE Trans. Plasma Sci. 50 4805 Google Scholar
[41]	Arrayás M, Ebert U, Hundsdorfer W 2002 Phys. Rev. Lett. 88 174502 Google Scholar
[42]	Brau F, Luque A, Davidovitch B, Ebert U 2009 Phys. Rev. E 79 066211 Google Scholar
[43]	Wu S Q, Lu X P, Zou D D, Pan Y 2013 J. Appl. Phys. 114 263001

Cited By

图 1 螺旋流注放电实验装置示意图

Figure 1. Schematic diagram of helical streamer discharge device.

DownLoad: Full-Size Img PowerPoint

图 2 电磁场圆柱几何坐标位型

Figure 2. Cylindrical geometric coordinate and configuration of electromagnetic field.

DownLoad: Full-Size Img PowerPoint

图 3 不同手性方向的螺旋流注　(a) 左手性方向; (b) 右手性方向

Figure 3. The helical streamers with different chiral directions: (a) The left hand-side direction; (b) the right hand-side direction.

DownLoad: Full-Size Img PowerPoint

图 4 不同电极结构(针电极和环电极)产生螺旋流注的螺距随放电轴向距离的分布

Figure 4. The pitches of helical streamers generated by different electrode structures (needle electrode and ring electrode) with the axial distance of discharge.

DownLoad: Full-Size Img PowerPoint

图 5 放电电压为7 kV下不同脉冲重复频率的螺旋流注放电图像

Figure 5. Helical streamer discharge images with different pulse repetition rates at 7 kV discharge voltage.

DownLoad: Full-Size Img PowerPoint

图 6 放电电压为7 kV下不同脉冲重复频率的螺旋流注分叉前直段区域的光学直径

Figure 6. Optical diameter of the straight section before the helical streamer branching with different pulse repetition rates at a discharge voltage of 7 kV.

DownLoad: Full-Size Img PowerPoint

[1]	陈乐迪, 范仁浩, 刘雨, 唐贡惠, 马中丽, 彭茹雯, 王牧 2022 物理学报 71 187802 Google Scholar Chen L D, Fan R H, Liu Y, Tang G H, Ma Z L, Peng R W, Wang M 2022 Acta Phys. Sin. 71 187802 Google Scholar
[2]	谢建华, 周其林 2015 科学通报 60 2679 Xie J H, Zhou Q L 2015 Sci. Bull. 60 2679
[3]	李和平, 于达仁, 孙文廷, 刘定新, 李杰, 韩先伟, 李增耀, 孙冰, 吴云 2016 高电压技术 42 3697 Li H P, Yu D R, Sun W Y, Liu X D, Li J, Han X W, Li Z Y, Sun B, Wu Y 2016 High Voltage Eng. 42 3697
[4]	卢新培, 严萍, 任春生, 邵涛 2011 中国科学: 物理学力学天文学 41 801 Google Scholar Lu X P, Yan P, Ren C S, Shao T 2011 Sci. China:Phys. , Mech. Astron. 41 801 Google Scholar
[5]	Lu X P, Naidis G V, Laroussi M, Ostrikov K 2014 Phy. Rep. 540 123 Google Scholar
[6]	张一川, 杨宽, 李唤, 朱晓东 2016 物理学报 65 145201 Google Scholar Zhang Y C, Yang K, Li H, Zhu X D 2016 Acta Phys. Sin. 65 145201 Google Scholar
[7]	Shi X M, Cai J F, Xu G M, Ren H B, Chen S L, Chang Z S, Liu J R, Huang C Y, Zhang G J, Wu X L 2016 Plasma Sci. Technol. 18 353 Google Scholar
[8]	Wu K Y, Ren C H, Jia B Y, Lin X T, Zhao N, Jia P Y, Li X C 2019 Plasma Processes Polym. 16 e1900073.1
[9]	陈柬, 杨静, 阮陈, 方志 2016 绝缘材料 49 45 Chen J, Yang J, Ruan C, Fang Z 2016 Insul. Mater. 49 45
[10]	金英, 钱沐扬, 任春生, 王德真 2012 高电压技术 38 1682 Jin Y, Qin M Y, Ren C S, Wang D Z 2012 High Voltage Eng. 38 1682
[11]	徐尧, 汪建华, 高建保, 薛垂庆 2013 强激光与粒子束 25 2909 Google Scholar Xu Y, Wang J H, Gao J B, Xie C Q 2013 High Power Laser Part. Beams 25 2909 Google Scholar
[12]	李文浩, 田朝, 冯绅绅, 宁付鹏, 白超, 尤江, 侯吉磊, 孟月东, 万树德, 方应翠 2018 真空科学与技术学报 38 695 Li W H, Tian C, Feng S S, Ning F P, Bai C, You J, Hou J L, Meng Y D, Wan A D, Fang Y C 2018 Chin. J. Vac. Sci. Technol. 38 695
[13]	刘富成, 王德真 2012 高电压技术 7 1749 Liu F C, Wang D Z 2012 Chin. J. Vac. Sci. Technol. 7 1749
[14]	Teschke M, Kedziersk J, Finantu-Dinu E G, Korzec D, Engemann J 2005 IEEE Trans. Plasma Sci. 33 310 Google Scholar
[15]	Darny T, Robert E, Dozias S, Pouvesle J M 2014 IEEE Trans. Plasma Sci. 42 2506 Google Scholar
[16]	Xia G, Chen Z, Yin Z, Hao J, Xu Z, Xue C, Hu D, Zhou M, Hu Y, Kudryavtsev A 2015 IEEE Trans. Plasma Sci. 43 1825 Google Scholar
[17]	Zou D D, Cao X, Lu X P, Ostrikov K 2015 Phys. Plasmas 22 103517 Google Scholar
[18]	邹丹旦, 蔡智超, 吴鹏, 李春华, 曾晗, 张红丽, 崔春梅 2017 物理学报 66 155202 Google Scholar Zou D D, Cai Z C, Wu P, Li C H, Zeng H, Zhang H L, Cui C M 2017 Acta Phys. Sin. 66 155202 Google Scholar
[19]	Nie L L, Liu F W, Zhou X C, Lu X P, Xian Y B 2018 Phys. Plasmas 25 053507 Google Scholar
[20]	Liu F, Li J, Wu F, Nie L, Lu X 2018 J. Phys. D Appl. Phys. 51 294003 Google Scholar
[21]	Wu S Q, Wu F, Liu C, Liu X Y, Chen Y X, Shao T, Zhang C H 2019 Plasma Pro. Polym. 16 e1800176.1
[22]	Liu L J, Zhang Y, Tian W J, Meng Y, Ouyang J T 2014 Appl. Phys. Lett. 104 244108 Google Scholar
[23]	Li X C, Li Y R, Zhang P P, Jia P Y, Dong L F 2016 Sci. Rep. 6 35653 Google Scholar
[24]	Mericam-Bourdet N, Laroussi M, Begum A, Karakas E 2009 J. Phys. D Appl. Phys. 42 055207 Google Scholar
[25]	Liu W Z, Li Z Y, Zhao L X, Zheng Q T, Ma C L 2018 Phy. Plasmas 25 083505 Google Scholar
[26]	Xiong Q, Nikiforov A Y, Lu X P, Ley C 2011 IEEE Trans. Plasma Sci. 39 2094 Google Scholar
[27]	Hofmann S, Sobota A, Bruggeman P 2012 IEEE Trans. Plasma Sci. 40 2888 Google Scholar
[28]	Wu S, Wang Z, Huang Q, Tan X, Lu X, Ostrikov K 2013 Phys. Plasmas 20 0235032
[29]	Wu S, Xu H, Xian Y, Lu Y, Lu X 2015 AIP Adv. 5 0271102
[30]	Zhang R B, Han Q T, Li S, Liu H 2017 Transactions of China Electrotechnical Society 32 282
[31]	白占国, 李新政, 李燕, 赵昆 2014 物理学报 63 228201 Google Scholar Bai Z G, Li X Z, Li Y, Zhao K 2014 Acta Phys. Sin. 63 228201 Google Scholar
[32]	汪肇坤, 杨振宇, 陶欢, 赵茗 2016 物理学报 65 217802 Google Scholar Wang Z K, Yang Z Y, Tao H, Zhao M 2016 Acta Phys. Sin. 65 217802 Google Scholar
[33]	潘飞, 王小艳, 汪芃, 黎维新, 唐国宁 2016 物理学报 65 198201 Google Scholar Pan F, Wang X Y, Wang P, Li W X, Tang G N 2016 Acta Phys. Sin. 65 198201 Google Scholar
[34]	曾永辉, 江五贵, Qin Qing-Hua 2016 物理学报 65 148802 Google Scholar Zeng Y H, Jiang W G, Qin Q H 2016 Acta Phys. Sin. 65 148802 Google Scholar
[35]	王红芳, 董丽芳, 刘富成, 刘书华, 刘微粒 2007 河北大学学报 27 475 Wang H F, Dong L F, Liu F C, Liu S H, Liu W L 2007 J. Heibei Univ. (Nat. Sci. Ed.) 27 475 (in Chinese)
[36]	Lieberman M A, Booth J P, Chabert P, Rax J M, Turner M M 2002 Plasma Sources Sci. Technol. 11 283 Google Scholar
[37]	Zhao K, Wen D Q, Liu Y X, Lieberman M A, Economou D, Wang Y N 2019 Phys. Rev. Lett. 122 185002 Google Scholar
[38]	曹星 2015 硕士学位论文 (武汉: 华中科技大学) Cao X 2015 M. S. Dessertation (Wuhan: Huazhong University of Science and Technology) (in Chinese)
[39]	杨敏, 王佳明, 齐凯旋, 李小平, 谢楷, 张琼杰, 刘浩岩, 董鹏 2022 物理学报 71 235201 Yang M, Wang J M, Qi K X, Li X P, Xie K, Zhang Q J, Liu H Y, Dong P 2022 Acta Phys. Sin. 71 235201
[40]	Zou D D, Ji Q Z, Zhang Y, Kravchenko O V, Atul J K, Ostrikov K K 2022 IEEE Trans. Plasma Sci. 50 4805 Google Scholar
[41]	Arrayás M, Ebert U, Hundsdorfer W 2002 Phys. Rev. Lett. 88 174502 Google Scholar
[42]	Brau F, Luque A, Davidovitch B, Ebert U 2009 Phys. Rev. E 79 066211 Google Scholar
[43]	Wu S Q, Lu X P, Zou D D, Pan Y 2013 J. Appl. Phys. 114 263001

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Vol. 72, Issue 11 - 2023-06-05

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