Influence of solution conductivity on discharge mode in alternating-current voltage driven liquid-electrode discharge

LI Xuechen; ZHANG Xi; ZHU Guoji; PANG Xuexia; JIA Pengying; SUN Hui; RAN Junxia; LI Qing; LI Jinmao

doi:10.7498/aps.74.20250680

Abstract

A liquid-electrode discharge system excited by an alternating-current sinusoidal voltage is employed to investigate the discharge modes with varying liquid conductivity (σ). The results indicate that with σ increasing, the discharge transitions from the uniform mode to the pattern mode, which undergoes various self-organized patterns such as gear, circular saw, discrete spots, single-arm spiral, and concentric rings on the liquid surface. The voltage and current waveforms reveal that the discharge occurs only in the negative half-cycle of applied voltage (when the liquid acts as the instantaneous anode). After gas breakdown, the discharge current rises rapidly to a peak, and then slowly decreases. For the uniform mode, the current decreases monotonically. However, during the current decreasing in the pattern mode, there appears a plateau in which the current keeps almost invariant with time. As σ increases, the values of the peak current and the plateau increase, and the breakdown moment advances. In addition, fast photography achieved through an intensified charge-coupled device (ICCD) shows that regardless of the discharge mode, a uniform disk is initially generated on the liquid surface, and various non-uniform patterns are formed during the plateau stage. Based on the reaction-diffusion model, numerical simulations are carried out through changing ion strength and current strength, which are related to the variables m and l. The simulated discharge modes are well in line with those obtained in the experiments. Moreover, spectral line intensity ratios related to electron temperature and electron density are determined through the spectra emitted from the discharge near the liquid surface. By fitting the spectra, gas temperature and molecular vibration temperature are obtained, which show an increasing trend with σ increasing.

Keywords:

Authors and contacts

1.
College of Physics Science and Technology, Heibei University, Baoding 071002, China
2.
Hebei Key Laboratory of Photo-Electricity Information and Materials, Hebei University, Baoding 071002, China
3.
College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
4.
Engineering Research Center of Zero-carbon Energy Buildings and Measurement Techniques, Ministry of Education, Baoding 071002, China

Corresponding author: LI Jinmao, plasmalab@126.com

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 12375250, 11875121, 51977057, 11805013). the Natural Science Foundation of Hebei Province, China (Grant Nos. A2022201036, A2023201012), the Optoelectronic Information Materials Laboratory Performance Subsidy Fund Program of Hebei Province, China (Grant No. 22567634H), the Funds for Distinguished Young Scientists of Hebei Province, China (Grant No. A2012201045), the Natural Science Interdisciplinary Research Program of Hebei University, China (Grant Nos. DXK201908, DXK202011), and the Post-graduate’s Innovation Fund Program of Hebei University, China (Grant No. HBU2022bs004).

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References

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Cited By

图 1 实验装置示意图

Figure 1. Schematic diagram of the experimental setup.

DownLoad: Full-Size Img PowerPoint

图 2 曝光时间t_exp为0.25 ms, 溶液σ变化时(a)均匀模式和(b)—(f)斑图模式的照片, 其中(b)齿轮模式; (c)锯盘模式; (d)离散点模式; (e)单臂螺旋模式; (f)同心圆环模式

Figure 2. Images of the uniform mode (a) and the self-organized patterns (b)–(f) with varying σ. Panel (b)–(f) correspond to (b) gear, (c) circular saw, (d) discrete spots, (e) single-arm spiral, and (f) concentric rings, respectively. The exposure time (t_exp) is 0.25 ms.

DownLoad: Full-Size Img PowerPoint

图 3 溶液σ变化时(不同放电模式)施加电压与放电电流的波形.

Figure 3. Waveforms of applied voltage and discharge current with varying σ (different discharge modes).

DownLoad: Full-Size Img PowerPoint

图 4 单次曝光ICCD (t_exp = 500 ns)拍摄液面上放电的时间演化图像(ICCD的门时刻在对应的电流波形中标注)　(a) 均匀模式; (b) 齿轮模式; (c) 锯盘模式; (d) 离散点模式; (e) 单臂螺旋模式; (f) 同心圆环模式

Figure 4. Single-shot ICCD images with t_exp of 500 ns for the discharges on the liquid surface: (a) The uniform mode; (b) gear pattern; (c) circular saw pattern; (d) discrete spots pattern; (e) single-arm spiral pattern; (f) concentric rings pattern. The gate moments of the ICCD are labelled in the corresponding current waveform.

DownLoad: Full-Size Img PowerPoint

图 5 (a) 单次曝光ICCD (t_exp = 500 ns) 拍摄的均匀模式和斑图模式的照片; (b) 利用反应-扩散模型获得不同变量(l和m)值的放电模式

Figure 5. (a) Images of the uniform mode and the patterns captured by the ICCD with t_exp of 500 ns; (b) the discharge modes predicted by the reaction-diffusion model with different values of variables (l and m).

DownLoad: Full-Size Img PowerPoint

图 6 (a) 300—800 nm扫描范围内来自于液体表面的发射光谱; (b) $ {\text{N}}_{2}^{+}{(}{\text{B}}^{2}{\Sigma}_{\text{u}}^{+}\to{\text{X}}^{2}{\Sigma}_{\text{g}}^{+}{)} $ 转动谱带拟合实例; (c), (d) T_e与N_e (c)及T_v与T_g (d)随σ的变化

Figure 6. (a) 300 to 800 nm scanned spectrum emitted from the discharge near the liquid surface; (b) experimental and simulated spectra of $ {\text{N}}_{2}^{+}{(}{\text{B}}^{2}{\Sigma}_{\text{u}}^{+}\to{\text{X}}^{2}{\Sigma}_{\text{g}}^{+}{)} $; (c), (d) T_e and N_e (c), T_v and T_g (d) as a function of σ.

DownLoad: Full-Size Img PowerPoint

[1]	Bruggeman P, Leys C 2009 J. Phys. D: Appl. Phys. 42 053001 Google Scholar
[2]	李雪辰, 耿金伶, 贾鹏英, 吴凯玥, 贾博宇, 康鹏程 2018 物理学报 67 075201 Google Scholar Li X C, Geng J L, Jia P Y, Wu K Y, Jia B Y, Kang P C 2018 Acta Phys. Sin. 67 075201 Google Scholar
[3]	Saifutdinov A I 2022 Plasma Sources Sci. Technol. 31 094008 Google Scholar
[4]	Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501 Google Scholar
[5]	Foster J E, Kovach Y E, Lai J, Garcia M C 2020 Plasma Sources Sci. Technol. 29 034004 Google Scholar
[6]	Kovačević V V, Sretenović G B, Obradović B M, Kuraica M M 2022 J. Phys. D: Appl. Phys. 55 473002 Google Scholar
[7]	杨双越, 温小琼, 杨天元, 李霄 2024 物理学报 73 075203 Google Scholar Yang S Y, Wen X Q, Yang Y T, Li X 2024 Acta Phys. Sin. 73 075203 Google Scholar
[8]	Jamróz P, Gręda K, Pohl P, Żyrnicki W 2014 Plasma Chem Plasma Process. 34 25 Google Scholar
[9]	Webb M R, Hieftje G M 2009 Anal. Chem. 81 862 Google Scholar
[10]	Chen Q, Li J S, Li Y F 2015 J. Phys. D: Appl. Phys. 48 424005 Google Scholar
[11]	Zheng P C, Liu K M, Wang J M, Dai Y, Yu B, Zhou X J, Hao H G, Luo Y 2012 Appl. Surf. Sci. 259 494 Google Scholar
[12]	Chen Z T, Xu R G, Chen P J, Wang Q 2020 IEEE Trans. Plasma Sci. 48 3455 Google Scholar
[13]	Liang J P, Zhao Z L, Zhou X F, Yang D Z, Yuan H, Wang W C, Qiao J J 2020 Vacuum 181 109644 Google Scholar
[14]	Zhang S, Oehrlein G S 2021 J. Phys. D: Appl. Phys. 54 213001 Google Scholar
[15]	Vanraes P, Bogaerts A 2021 J. Appl. Phys. 129 220901 Google Scholar
[16]	Bruggeman P, Ribežl E, Maslani A, Degroote J, Malesevic A, Rego R, Vierendeels J, Leys C 2008 Plasma Sources Sci. Technol. 17 025012 Google Scholar
[17]	Shirai N, Suga G, Sasaki K 2020 Plasma Sources Sci. Technol. 29 025007 Google Scholar
[18]	Shirai N, Ichinose K, Uchida S, Tochikubo F 2011 Plasma Sources Sci. Technol. 20 034013 Google Scholar
[19]	Bruggeman P, Liu J J, Degroote J, Kong M G, Vierendeels J, Leys C 2008 J. Phys. D: Appl. Phys. 41 215201 Google Scholar
[20]	Xu S F, Zhong X X 2015 Phys. Plasmas 22 103519 Google Scholar
[21]	Xu S F, Zhong X X 2016 Phys. Plasmas 23 010701 Google Scholar
[22]	Jia P, Gao K, Zhou S, Chen J Y, Wu J C, Wu K Y, Li X C 2021 Plasma Sources Sci. Technol. 30 095021 Google Scholar
[23]	Gao K, Wu K Y, Jia P Y, Jia B Y, Kang P C, Li X C 2019 Phys. Plasmas 26 113501 Google Scholar
[24]	Zhang S Q, Dufour T 2018 Phys. Plasmas 25 073502 Google Scholar
[25]	Rumbach P, Lindsay A E, Go D B 2019 Plasma Sources Sci. Technol. 28 105014 Google Scholar
[26]	Shirai N, Ibuka S, Ishii S 2009 Appl. Phys. Express 2 036001 Google Scholar
[27]	Yang Z M, Kovach Y, Foster J 2021 J. Appl. Phys. 129 163303 Google Scholar
[28]	Verreycken T, Bruggeman P, Leys C 2009 J. Appl. Phys 105 083312 Google Scholar
[29]	Shirai N, Uchida S, Tochikubo F 2014 Plasma Sources Sci. Technol. 23 054010 Google Scholar
[30]	Li X C, Kang P C, Gao K, Zhou S, Wu K Y, Jia P Y 2020 Plasma Processes Polym. 17 1900223 Google Scholar
[31]	Kovach Y E, Garcia M C, Foster J E 2021 Plasma Sources Sci. Technol. 30 015007 Google Scholar
[32]	Li X C, Zhou S, Gao K, Ran J X, Wu K Y, Jia P Y 2022 IEEE Trans. Plasma Sci. 50 1717 Google Scholar
[33]	Qin X R, Feng B W, Wang R Y, Ma Y P X, Zhang Q, Zhong X X 2024 Plasma Processes Polym. 21 2300055 Google Scholar
[34]	Li X C, Geng J L, Jia P Y, Zhang P P, Zhang Q, Li Y R 2017 Phys. Plasmas 24 113504 Google Scholar
[35]	Zheng P C, Wang X M, Wang J M, Yu B, Liu H D, Zhang B, Yang R 2014 Plasma Sources Sci. Technol. 24 015010 Google Scholar
[36]	Srivastava T, Simeni M S, Nayak G, Bruggeman P J 2022 Plasma Sources Sci. Technol. 31 085010 Google Scholar
[37]	Shirai N, Uchida S, Tochikubo F, Ishii S 2011 IEEE Trans. Plasma Sci. 39 2652 Google Scholar
[38]	Chen Y F, Feng B W, Zhang Q, Wang R Y, Ostrikov K (Ken), Zhong X X 2020 Plasma Sci. Technol. 22 055404 Google Scholar
[39]	Li J M, Zhang X, Tian S, Meng T T, Wan W J, Ran J X, Sun H, Jia P Y, Pang X X, Li X C 2025 Phys. Plasmas 32 032107 Google Scholar
[40]	Ghimire B, Kolobov V I, Xu K G 2023 Phys. Scr. 98 095602 Google Scholar
[41]	Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q, Li X C 2021 Phys. Plasmas 28 073501 Google Scholar
[42]	Rajzer Y P 1997 Gas Discharge Physicst (Berlin Heidelberg: Springer) p167
[43]	Purwins H G, Stollenwerk L 2014 Plasma Phys. Control. Fusion 56 123001 Google Scholar
[44]	Trelles J P 2016 J. Phys. D: Appl. Phys. 49 393002 Google Scholar
[45]	陈泽煜, 彭玉彬, 王瑞, 贺永宁, 崔万照 2022 物理学报 71 240702 Google Scholar Chen Z Y, Peng Y B, Wang R, He Y N, Cui W Z 2022 Acta Phys. Sin. 71 240702 Google Scholar
[46]	李汉明, 李钢, 李英骏, 李玉同, 张翼, 程涛, 聂超群, 张杰 2008 物理学报 57 0969 Google Scholar Li H M, Li G, Li Y J, Li Y T, Zhang Y, Cheng T, Nie C Q, Zhang J 2008 Acta Phys. Sin. 57 0969 Google Scholar
[47]	李雪辰, 常媛媛, 刘润甫, 赵欢欢, 狄聪 2013 物理学报 62 165205 Google Scholar Li X C, Chang Y Y, Liu R F, Zhao H H, Di C 2013 Acta Phys. Sin. 62 165205 Google Scholar
[48]	Belmonte T, Noël C, Gries T, Martin J, Henrion G 2015 Plasma Sources Sci. Technol. 24 064003 Google Scholar
[49]	张雪雪, 贾鹏英, 冉俊霞, 李金懋, 孙换霞, 李雪辰 2024 物理学报 73 085201 Google Scholar Zhang X X, Jia P Y, Ran J X, Li J M, Sun H X, Li X C 2024 Acta Phys. Sin. 73 085201 Google Scholar
[50]	Choi J H, Lee T I, Han I, Baik H K, Song K M, Lim Y S, Lee E S 2006 Plasma Sources Sci. Technol. 15 416 Google Scholar
[51]	Liu Y D, Yan H J, Guo H F, Fan Z H, Wang Y Y, Wu Y, Ren C S 2018 Phys. Plasmas 25 033519 Google Scholar
[52]	Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161 Google Scholar
[53]	Wu J C, Li X C, Ran J X, Jia H X, Wu K Y, Han G X, Liu J N, Chen J Y, Pang X X, Jia P Y 2023 Plasma Processes Polym. 20 2200188 Google Scholar

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