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Fabrication of microcrystalline silicon thin film and the study of its microstructure and stability

Zhang Xiao-Dan Zhao Ying Gao Yan-Tao Zhu Feng Wei Chang-Chun Sun Jian Geng Xin-Hua Xiong Shao-Zhen

Fabrication of microcrystalline silicon thin film and the study of its microstructure and stability

Zhang Xiao-Dan, Zhao Ying, Gao Yan-Tao, Zhu Feng, Wei Chang-Chun, Sun Jian, Geng Xin-Hua, Xiong Shao-Zhen
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Publishing process
  • Received Date:  21 October 2004
  • Accepted Date:  21 March 2005
  • Published Online:  05 April 2005

Fabrication of microcrystalline silicon thin film and the study of its microstructure and stability

  • 1. 南开大学光电子薄膜器件与技术研究所,天津 300071;南开大学光电子薄膜器件与技术天津市重点实验室,天津 300071;南开大学光电信息技术科学教育部重点实验室,天津 300071

Abstract: A series of microcrystalline silicon thin films were fabricated by very high frequency plasma-enhanced chemical vapor deposition at different substrate temperat ures (Ts). Analysis of materials structure was conducted using Fourie r tra nsform infrared (FTIR). The results showed that hydrogen content of the samples decreased with the increase of Ts. The results of FTIR and secondary ion m ass spectra indicated that the oxygen content of the samples increased with the increase of Ts. Compared with those at higher Ts, samples prepared at low Ts easily adsorbed oxygen, and showed bad stability.

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