搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

椭偏与光度法联用精确测定吸收薄膜的光学常数与厚度

周毅 吴国松 代伟 李洪波 汪爱英

引用本文:
Citation:

椭偏与光度法联用精确测定吸收薄膜的光学常数与厚度

周毅, 吴国松, 代伟, 李洪波, 汪爱英

Accurate determination of optical constants and thickness of absorbing thin films by a combined ellipsometry and spectrophotometry approach

Zhou Yi, Wu Guo-Song, Dai Wei, Li Hong-Bo, Wang Ai-Ying
PDF
导出引用
  • 介绍了一种同时利用椭偏仪和分光光度计精确测量薄膜光学常数的方法, 并详细比较了该方法与使用单一椭偏仪拟合结果的可靠性.采用可变入射角光谱型椭偏仪(VASE)表征了250—1700 nm波段辉光放电法沉积的类金刚石薄膜,研究发现当仅用椭偏参数拟合时,由于厚度与折射率、消光系数的强烈相关性,无法得到吸收薄膜光学常数的准确解.如果加入分光光度计测得的透射率同时拟合,得到的结果具有很好的惟一性.该方法无需设定色散模型即可快速拟合出理想的结果,特别适合于确定透明衬底上较薄吸收膜的光学常数.
    A new approach for accurate measurement of the absorbing film thickness and optical constants by combined ellipsometry and spectrophotometry is introduced. The details are studied in terms of the mathematical models and formulats in comparison with the commonly used method which is only dependent on the ellipsometry data specifically. Using variable angle spectroscopic ellipsometry (VASE), the diamond-like carbon film deposited by a glow discharge technique was characterized at the wavelength range of 250—1700 nm. The results indicate that, generally, it is rather difficult to determine the thickness and optical constants of absorbing film accurately and rapidly due to the strong correlation between thickness and n, k. By simultaneously fitting ellipsometry parameters and film transmittance, however, the optical constants could be obtained easily and accurately from a unique solution without any predetermined dispersion model. The fitting results of DLC show that this approach is a promising method to determine the thicknesses and optical constants of films, especially of the thin absorbing films.
    • 基金项目: 宁波市自然科学基金(批准号:2008A610054)资助的课题.
    [1]

    [1]Xu Z J 2007 Detection and Analysis of Semiconductor (Bejing: Science Press) p254 (in Chinese)[许振嘉 2007半导体的检测与分析 (北京: 科学出版社) 第254页]

    [2]

    [2]Mulato M, Chambouleyron I, Birgin E G, Martinez J M 2000 Appl. Phys. Lett. 77 2133

    [3]

    [3]Wang C W, Wang J, Li Y, Liu W M, Xu T, Sun X W, Li H L 2005 Acta Phys. Sin. 54 439 (in Chinese)[王成伟、王建、李燕、刘维民、徐洮、孙小伟、力虎林 2005 物理学报 54 439]

    [4]

    [4]Gu P F, Chen H X, Zhen Z R, Liu X 2005 Acta Phys. Sin. 54 3722 (in Chinese)[顾培夫、陈海星、郑臻荣、刘 旭 2005 物理学报 54 3722]

    [5]

    [5]Tang J F, Gu P F, Li X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) pp407—412 (in Chinese)[唐晋发、顾培夫、李旭、李海峰 2006 现代光学薄膜技术 (杭州: 浙江大学出版社) 第407—412页]

    [6]

    [6]Chen Y P, Yu F H 2006 Opt. Instru. 28 84 (in Chinese)[陈燕平、余飞鸿 2006 光学仪器 28 84]

    [7]

    [7]Palik E D 1985 Handbook of Optical Constants of Solids (San Diego: Academic Press) pp89—110

    [8]

    [8]Tompkins H G, Irene E A 2005 Handbook of Ellipsometry (Norwich: William Andrew Publishing) pp252—253

    [9]

    [9]Herzinger C M, Yao H, Snyder P G, Celii F G, Kao Y C, Johs B, Woollam J A 1995 J. Appl. Phys. 77 4677

    [10]

    ]Hilfiker J N, Bungay C L, Synowicki R A, Tiwald T E, Herzinger C M, Johs B, Pribil G K, Woollam J A 2003 J. Vac. Sci. Technol. A 21 1103

    [11]

    ]Jarrendahl K, Arwin H 1998 Thin Solid Films 313 114

    [12]

    ]McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443

    [13]

    ]Fujiwara H 2007 Spectroscopic Ellipsometry: Principles and Applications (Chichester: John Wiley & Sons) pp81—87

    [14]

    ]Macloed H A 2001 Thin-film Optical Filters 3rd Ed. (Bristol: Institute of Physics Publishing) pp27—69

    [15]

    ]Shen H J, Wang L J, Fang Z J, Zhang M L, Yang Y, Wang L, Xia Y B 2004 Acta Phys. Sin. 53 2009 (in Chinese)[沈沪江、王林军、方志军、张明龙、杨莹、汪琳、夏义本 2004 物理学报 53 2009]

    [16]

    ]Aspnes D E, Theeten J B 1979 Phys. Rev. B 20 3292

    [17]

    ]Tikhonravov A V, Trubetskov M K, Tikhonravov A A, Duparre A 2003 Appl. Opt. 42 5140

    [18]

    ]McMarr P J, Blanco J R 1988 Appl. Opt. 27 4265

    [19]

    ]Bruggeman D A G 1935 Ann. Phys. -Berlin 24 636

    [20]

    ]Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832

    [21]

    ]Franta D, Zajickova L, Ohlidal I, Janca J, Veltruska K 2002 Diam. Relat. Mater. 11 105

    [22]

    ]Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946

    [23]

    ]Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979

    [24]

    ]Liang L P, Hao J Y, Qin M, Zhen J J 2008 Acta Phys. Sin. 57 7906 (in Chinese)[梁丽萍、郝建英、秦梅、郑建军 2008 物理学报 57 7906]

    [25]

    ]Robertson J 2002 Mat. Sci. Eng. 37 153

    [26]

    ]Tauc J, Grigorov R, Vancu A 1966 Phys. Status Solidi 15 627

  • [1]

    [1]Xu Z J 2007 Detection and Analysis of Semiconductor (Bejing: Science Press) p254 (in Chinese)[许振嘉 2007半导体的检测与分析 (北京: 科学出版社) 第254页]

    [2]

    [2]Mulato M, Chambouleyron I, Birgin E G, Martinez J M 2000 Appl. Phys. Lett. 77 2133

    [3]

    [3]Wang C W, Wang J, Li Y, Liu W M, Xu T, Sun X W, Li H L 2005 Acta Phys. Sin. 54 439 (in Chinese)[王成伟、王建、李燕、刘维民、徐洮、孙小伟、力虎林 2005 物理学报 54 439]

    [4]

    [4]Gu P F, Chen H X, Zhen Z R, Liu X 2005 Acta Phys. Sin. 54 3722 (in Chinese)[顾培夫、陈海星、郑臻荣、刘 旭 2005 物理学报 54 3722]

    [5]

    [5]Tang J F, Gu P F, Li X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) pp407—412 (in Chinese)[唐晋发、顾培夫、李旭、李海峰 2006 现代光学薄膜技术 (杭州: 浙江大学出版社) 第407—412页]

    [6]

    [6]Chen Y P, Yu F H 2006 Opt. Instru. 28 84 (in Chinese)[陈燕平、余飞鸿 2006 光学仪器 28 84]

    [7]

    [7]Palik E D 1985 Handbook of Optical Constants of Solids (San Diego: Academic Press) pp89—110

    [8]

    [8]Tompkins H G, Irene E A 2005 Handbook of Ellipsometry (Norwich: William Andrew Publishing) pp252—253

    [9]

    [9]Herzinger C M, Yao H, Snyder P G, Celii F G, Kao Y C, Johs B, Woollam J A 1995 J. Appl. Phys. 77 4677

    [10]

    ]Hilfiker J N, Bungay C L, Synowicki R A, Tiwald T E, Herzinger C M, Johs B, Pribil G K, Woollam J A 2003 J. Vac. Sci. Technol. A 21 1103

    [11]

    ]Jarrendahl K, Arwin H 1998 Thin Solid Films 313 114

    [12]

    ]McGahan W A, Johs B, Woollam J A 1993 Thin Solid Films 234 443

    [13]

    ]Fujiwara H 2007 Spectroscopic Ellipsometry: Principles and Applications (Chichester: John Wiley & Sons) pp81—87

    [14]

    ]Macloed H A 2001 Thin-film Optical Filters 3rd Ed. (Bristol: Institute of Physics Publishing) pp27—69

    [15]

    ]Shen H J, Wang L J, Fang Z J, Zhang M L, Yang Y, Wang L, Xia Y B 2004 Acta Phys. Sin. 53 2009 (in Chinese)[沈沪江、王林军、方志军、张明龙、杨莹、汪琳、夏义本 2004 物理学报 53 2009]

    [16]

    ]Aspnes D E, Theeten J B 1979 Phys. Rev. B 20 3292

    [17]

    ]Tikhonravov A V, Trubetskov M K, Tikhonravov A A, Duparre A 2003 Appl. Opt. 42 5140

    [18]

    ]McMarr P J, Blanco J R 1988 Appl. Opt. 27 4265

    [19]

    ]Bruggeman D A G 1935 Ann. Phys. -Berlin 24 636

    [20]

    ]Fujiwara H, Koh J, Rovira P I, Collins R W 2000 Phys. Rev. B 61 10832

    [21]

    ]Franta D, Zajickova L, Ohlidal I, Janca J, Veltruska K 2002 Diam. Relat. Mater. 11 105

    [22]

    ]Tompkins H G, Tasic S 2000 J. Vac. Sci. Technol. A 18 946

    [23]

    ]Hilfiker J N, Singh N, Tiwald T, Convey D, Smith S M, Baker J H, Tompkins H G 2008 Thin Solid Films 516 7979

    [24]

    ]Liang L P, Hao J Y, Qin M, Zhen J J 2008 Acta Phys. Sin. 57 7906 (in Chinese)[梁丽萍、郝建英、秦梅、郑建军 2008 物理学报 57 7906]

    [25]

    ]Robertson J 2002 Mat. Sci. Eng. 37 153

    [26]

    ]Tauc J, Grigorov R, Vancu A 1966 Phys. Status Solidi 15 627

  • [1] 董正琼, 赵杭, 朱金龙, 石雅婷. 入射光照对典型光刻胶纳米结构的光学散射测量影响分析. 物理学报, 2020, 69(3): 030601. doi: 10.7498/aps.69.20191525
    [2] 王盼盼, 章俞之, 彭明栋, 张云龙, 吴岭南, 曹韫真, 宋力昕. VO2薄膜Vis-NIR及NIR-MIR椭圆偏振光谱分析. 物理学报, 2016, 65(12): 127201. doi: 10.7498/aps.65.127201
    [3] 李江, 唐敬友, 裴旺, 魏贤华, 黄峰. 椭偏精确测定透明衬底上吸收薄膜的厚度及光学常数. 物理学报, 2015, 64(11): 110702. doi: 10.7498/aps.64.110702
    [4] 于天燕, 秦杨, 刘定权. 沉积温度对硫化锌(ZnS)薄膜的结晶和光学特性影响研究. 物理学报, 2013, 62(21): 214211. doi: 10.7498/aps.62.214211
    [5] 吴绍全, 陈佳峰, 赵国平. 串型耦合双量子点之间库仑作用对其近藤共振的影响. 物理学报, 2012, 61(8): 087203. doi: 10.7498/aps.61.087203
    [6] 黄卓寅, 李国龙, 李衎, 甄红宇, 沈伟东, 刘向东, 刘旭. 基于透射率曲线确定聚合物太阳能电池功能层的光学常数和厚度. 物理学报, 2012, 61(4): 048801. doi: 10.7498/aps.61.048801
    [7] 李国龙, 黄卓寅, 李衎, 甄红宇, 沈伟东, 刘旭. 基于光学与光—电转换模型对聚合物电池功能层厚度与性能相关性分析. 物理学报, 2011, 60(7): 077207. doi: 10.7498/aps.60.077207
    [8] 廖国进, 骆红, 闫绍峰, 戴晓春, 陈明. 基于透射光谱确定溅射Al2O3薄膜的光学(已撤稿). 物理学报, 2011, 60(3): 034201. doi: 10.7498/aps.60.034201
    [9] 薛春荣, 易葵, 齐红基, 邵建达, 范正修. 氟化物材料在深紫外波段的光学常数. 物理学报, 2009, 58(7): 5035-5040. doi: 10.7498/aps.58.5035
    [10] 王晓栋, 沈军, 王生钊, 张志华. 椭偏光谱法研究溶胶-凝胶TiO2薄膜的光学常数. 物理学报, 2009, 58(11): 8027-8032. doi: 10.7498/aps.58.8027
    [11] 杜晓宇, 郑婉华, 张冶金, 任 刚, 王 科, 邢名欣, 陈良惠. 慢光在光子晶体弯折波导中的高透射传播. 物理学报, 2008, 57(11): 7005-7011. doi: 10.7498/aps.57.7005
    [12] 袁宁一, 何泽军, 赵常宁, 李 峰, 周 懿, 李金华. 纳米ZnO和ZnO-SiO2复合薄膜的光学性质研究. 物理学报, 2008, 57(4): 2537-2542. doi: 10.7498/aps.57.2537
    [13] 杜 娟, 张淳民, 赵葆常, 孙 尧. 稳态大视场偏振干涉成像光谱仪中视场补偿型Savart偏光镜透射率研究. 物理学报, 2008, 57(10): 6311-6318. doi: 10.7498/aps.57.6311
    [14] 梁丽萍, 郝建英, 秦 梅, 郑建军. 基于透射光谱确定溶胶凝胶ZrO2薄膜的光学常数. 物理学报, 2008, 57(12): 7906-7911. doi: 10.7498/aps.57.7906
    [15] 张拴勤, 石云龙, 黄长庚, 连长春. 隐身涂层的光谱反射特性设计. 物理学报, 2007, 56(9): 5508-5512. doi: 10.7498/aps.56.5508
    [16] 苏伟涛, 李 斌, 刘定权, 张凤山. 氟化铒薄膜晶体结构与红外光学性能的关系. 物理学报, 2007, 56(5): 2541-2546. doi: 10.7498/aps.56.2541
    [17] 孙成伟, 刘志文, 秦福文, 张庆瑜, 刘 琨, 吴世法. 生长温度对磁控溅射ZnO薄膜的结晶特性和光学性能的影响. 物理学报, 2006, 55(3): 1390-1397. doi: 10.7498/aps.55.1390
    [18] 穆全全, 刘永军, 胡立发, 李大禹, 曹召良, 宣 丽. 光谱型椭偏仪对各向异性液晶层的测量. 物理学报, 2006, 55(3): 1055-1060. doi: 10.7498/aps.55.1055
    [19] 彭志红, 张淳民, 赵葆常, 李英才, 吴福全. 新型偏振干涉成像光谱仪中Savart偏光镜透射率的研究. 物理学报, 2006, 55(12): 6374-6381. doi: 10.7498/aps.55.6374
    [20] 王成伟, 王 建, 李 燕, 刘维民, 徐 洮, 孙小伟, 力虎林. 多孔阳极氧化铝薄膜光学常数的确定. 物理学报, 2005, 54(1): 439-444. doi: 10.7498/aps.54.439
计量
  • 文章访问数:  9650
  • PDF下载量:  2443
  • 被引次数: 0
出版历程
  • 收稿日期:  2009-06-18
  • 修回日期:  2009-07-28
  • 刊出日期:  2010-02-05

/

返回文章
返回