激光超衍射加工机理与研究进展

张心正; 夏峰; 许京军

doi:10.7498/aps.66.144207

摘要

随着纳米科技和微纳电子器件的发展，制造业对微纳加工技术的要求越来越高.激光加工技术是一种绿色先进制造技术，具有巨大的发展潜力，已广泛应用于不同的制造领域.为实现低成本、高效率、大面积尤其是高精度的激光微纳加工制造，研究和发展激光超衍射加工技术具有十分重要的科学意义和应用价值.本文首先阐述了基于非线性效应的远场激光直写超衍射加工技术的原理与国内外发展状况，包括激光烧蚀加工技术、激光诱导改性加工技术和多光子光聚合加工技术等；然后介绍了几种基于倏逝波的近场激光超衍射加工技术，包括扫描近场光刻技术、表面等离子激元光刻技术等新型超衍射激光近场光刻技术的机理与研究进展；最后对激光超衍射加工中存在的问题及未来发展方向进行了讨论.

关键词:

Abstract

Laser is recognized as one of the top technological achievements of 20th century and plays an important role in many fields, such as medicine, industry, entertainment and so on. Laser processing technology is one of the earliest and most developed applications of laser. With the rapid development of nanoscience and nanotechnology and micro/nano electronic devices, the micro/nanofabrication technologies become increasingly demanding in manufacturing industries. In order to realize low-cost, large-area and especially high-precision micro-nanofabrication, it has great scientific significance and application value to study and develop the laser fabrication technologies that can break the diffraction limit. In this article, the super resolution laser fabrication technologies are classified into two groups, far-filed laser direct writing technologies and near-field laser fabrication technologies. Firstly, the mechanisms and progress of several far-field laser direct writing technologies beyond the diffraction limit are summarized, which are attributed to the lasermatter nonlinear interaction. The super-diffraction laser ablation was achieved for the temperature-dependent reaction of materials with the Gaussian distribution laser, and the super-diffraction laser-induced oxidation in Metal-Transparent Metallic Oxide grayscale photomasks was realized by the laser-induced Cabrera-Mott oxidation process. Besides, the multi-photon polymerization techniques including degenerate/non-degenerate two-photon polymerization are introduced and the resolution beyond the diffraction limit was achieved based on the third-order nonlinear optical process. Moreover, the latest stimulated emission depletion technique used in the laser super-resolution fabrication is also introduced. Secondly, the mechanisms and recent advances of novel super diffraction near-field laser fabrication technologies based on the evanescent waves or surface plasmon polaritons are recommended. Scanning near-field lithography used a near-field scanning optical microscope coupled with a laser to create nanoscale structures with a resolution beyond 100 nm. Besides, near-field optical lithography beyond the diffraction limit could also be achieved through super resolution near-field structures, such as a bow-tie nanostructure. The interference by the surface plasmon polariton waves could lead to the fabrication of super diffraction interference fringe structures with a period smaller than 100 nm. Moreover, a femtosecond laser beam could also excite and interfere with surface plasmon polaritons to form laser-induced periodic surface structures. Furthermore, the super-resolution superlens and hyperlens imaging lithography are introduced. Evanescent waves could be amplified by using the superlens of metal film to improve the optical lithography resolution beyond the diffraction resolution. The unique anisotropic dispersion of hyperlens could provide the high wave vector component without the resonance relationship, which could also realize the super resolution imaging. Finally, prospective research and development tend of super diffraction laser fabrication technologies are presented. It is necessary to expand the range of materials which can be fabricated by laser beyond the diffraction limit, especially 2D materials.

Keywords:

作者及机构信息

1.
南开大学物理科学学院, 泰达应用物理研究院, 弱光非线性光子学教育部重点实验室, 天津 300457;

2.
青岛大学物理科学学院, 青岛 266071

通信作者: 许京军, jjxu@nankai.edu.cn

基金项目: 国家重点基础研究发展计划（批准号：2013CB328702）、国家自然科学基金（批准号：11674182）、天津市自然科学基金（批准号：17JCYBJC16700）、111计划（批准号：B07013）、教育部长江学者和创新团队发展计划（批准号：IRT_13R29）和山西大学极端光学协同创新中心资助的课题.

Authors and contacts

1.
The MOE Key Laboratory of Weak-Light Nonlinear Photonics, TEDA Institute of Applied Physics, School of Physics, Nankai University, Tianjin 300457, China;

2.
College of Physics Science, Qingdao University, Qingdao 266071, China

Corresponding author: Xu Jing-Jun, jjxu@nankai.edu.cn

Funds: Project supported by the National Basic Research Program of China (Grant No. 2013CB328702), the National Natural Science Foundation of China (Grant No. 11674182), the Natural Science Foundation of Tianjin, China (Grant No. 17JCYBJC16700), the 111 Project, China (Grant No. B07013), the PCSIRT (Grant No. IRT_13R29), and the Collaborative Innovation Center of Extreme Optics of Shanxi University, China.

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施引文献

[1]	Wagner C, Harned N 2010 Nat. Photon. 4 24
[2]	Gale M T, Knop K 1983 Proc. SPIE 0398 347
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[7]	Cui Z 2005 Micro-Nanofabrication Technologies and Applications (Beijing: Higher Education Press) p51
[8]	Wang Y, Guo C, Cao S, Miao J, Ren T, Liu Q 2010 J. Nanosci. Nanotechnol. 10 7134
[9]	Liu Q, Duan X, Peng C 2014 Novel Optical Technologies for Nanofabrication (Berlin Heidelberg: Springer-Verlag) p8
[10]	Kurihara K, Nakano T, Ikeya H, Ujiie M, Tominaga J 2008 Microelectron. Eng. 85 1197
[11]	Hao Y F, Sun M Y, Shi S, Pan X, Zhu J Q 2017 Chin. J. Lasers 44 0102015 (in Chinese) [郝艳飞, 孙明营, 时双, 潘雪, 朱健强 2017 中国激光 44 0102015]
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[48]	Andrew T L, Tsai H Y, Menon R 2009 Science 324 917
[49]	Fischer J, von Freymann G, Wegener M 2010 Adv. Mater. 22 3578
[50]	Wollhofen R, Katzmann J, Hrelescu C, Jacak J, Klar T A 2013 Opt. Express 21 10831
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[65]	Barnes W L, Dereux A, Ebbesen T W 2003 Nature 424 824
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[68]	Liu Z W, Wei Q H, Zhang X 2005 Nano Lett. 5 957
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