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利用同步辐射光源测量Na2s二次电子部分产额谱得到Na诱导Si(111)3×1结构的近边X射线吸收精细结构(NEXAFS)谱,并用原子集团多重散射方法对几种可能的模型进行计算,与实验结果比较,认为Na/Si(111)3×1吸附结构与Mnch模型相一致.Na原子吸附在Si的顶位,Na—Si键长为0.3nm.The investigation of the near-edge X-ray absorption fine structure(NEXAFS) of Na-induced Si(111)3×1 surface structure using the secondary electron partial yield method with synchrotron radiation is reported. Comparing the possible absorption models by the multiple-scattering cluster method, we find that the calculated results by using the Mnch model agree with the experiments.The sodium atom is absorbed on the top site with Na—Si bond length 0.3 nm.
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