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The Bohm criterion for a collisinal electronegative plasma sheath in an oblique magnetic field is investigated with a fluid model. The effects of negative ions and magnetic field on the Bohm criterion are discussed. It is shown that the parameters of the negative ions affect only the lower limit for Bohm criterion, and the external magnetic field can affect the whole range of the ion Mach number values.
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Keywords:
- plasma /
- magnetized sheath /
- Bohm criterion /
- electronegative
[1] Amemiya H 1990 J. Phys. D: Appl. Phys. 23 999
[2] Franklin R N, Snell J 1998 J. Phys. D: Appl. Phys. 31 2532
[3] Franklin R N 1999 J. Phys. D: Appl. Phys. 32 71
[4] Allen J E 2004 Plasma Sources Sci. Technol. 13 48
[5] Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A, Dengra A 1995 J. Appl. Phys. 77 2937
[6] Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A, Dengra A 1996 Surface and Coatings Technology 84 341
[7] Valentini H B, Herrmann F 1996 J. Phys. D 29 1175
[8] Lichtenberg A J, Kouznetsov I G, Lee Y T, Lieberman M A, Kaganovich I D, Tsendin L D 1997 Plasma Sources Sci. Technol. 6 437
[9] Franklin R N, Snell J 2000 J. Plasma Phys. 64 131
[10] Annaratone B M, Antonova T, Thomas H M, Morfill G E 2004 Phys. Rev. Lett. 93 185001
[11] Ghim Y C, Kim, Hershkowitz N 2009 Appl. Phys. Lett. 94 51503
[12] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chinese Physics Letters 20 1537
[13] Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chinese J. Computational Physics 27 883
[14] Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60 045205 (in Chinese)[赵晓云, 刘金远, 段萍, 倪致祥 2011 物理学报 60 045205]
[15] Liu J Y, Wang Z X, Wang X 2003 Phys. Plasmas 10 3032
[16] Ghomi H, Khoramabadi M 2010 J. Plasma Phys. 76 247
[17] Chodura R 1982 Phys. Fluids 25 1628
[18] Riemann K U 1994 Phys. Plasmas 1 552
[19] Stangeby P C 1995 Phys. Plasmas 2 702
[20] Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 物理学报 59 1902]
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[1] Amemiya H 1990 J. Phys. D: Appl. Phys. 23 999
[2] Franklin R N, Snell J 1998 J. Phys. D: Appl. Phys. 31 2532
[3] Franklin R N 1999 J. Phys. D: Appl. Phys. 32 71
[4] Allen J E 2004 Plasma Sources Sci. Technol. 13 48
[5] Femandez Palop J I, Ballesteros J, Colomer V, Hemandez M A, Dengra A 1995 J. Appl. Phys. 77 2937
[6] Femandez Palop J I, Colomer V, Ballesteros J, Hemandez M A, Dengra A 1996 Surface and Coatings Technology 84 341
[7] Valentini H B, Herrmann F 1996 J. Phys. D 29 1175
[8] Lichtenberg A J, Kouznetsov I G, Lee Y T, Lieberman M A, Kaganovich I D, Tsendin L D 1997 Plasma Sources Sci. Technol. 6 437
[9] Franklin R N, Snell J 2000 J. Plasma Phys. 64 131
[10] Annaratone B M, Antonova T, Thomas H M, Morfill G E 2004 Phys. Rev. Lett. 93 185001
[11] Ghim Y C, Kim, Hershkowitz N 2009 Appl. Phys. Lett. 94 51503
[12] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chinese Physics Letters 20 1537
[13] Gong Y, Duan P, Zhang J H, Zou X, Liu J Y, Liu Y 2010 Chinese J. Computational Physics 27 883
[14] Zhao X Y, Liu J Y, Duan P, Ni Z X 2011 Acta Phys. Sin. 60 045205 (in Chinese)[赵晓云, 刘金远, 段萍, 倪致祥 2011 物理学报 60 045205]
[15] Liu J Y, Wang Z X, Wang X 2003 Phys. Plasmas 10 3032
[16] Ghomi H, Khoramabadi M 2010 J. Plasma Phys. 76 247
[17] Chodura R 1982 Phys. Fluids 25 1628
[18] Riemann K U 1994 Phys. Plasmas 1 552
[19] Stangeby P C 1995 Phys. Plasmas 2 702
[20] Zou X, Ji Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese) [邹秀, 籍延坤, 邹滨雁 2010 物理学报 59 1902]
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