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A fluid model has been used to study the Bohm criterion of the plasma sheath with different species. The charge particle includes electrons, ions, negative ions and secondary electrons from the wall striked by the electrons. Numerical calculation results are obtained through quasi-Newton method. It is found that secondary electron emission(SEE) can increase the critical ion Mach number of the plasma sheath. The critical ion Mach number decreases with the increase of the temperature of the electrons emitted. Negative ions reduce this critical number. In addition, it is obvious that the SEE affects the ion Mach number when the density of negative ions is small, but the ion Mach number is mainly affected by negative ions when the density of negative ions is high in the presence of secondary electron emission and negative ions.
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Keywords:
- sheath /
- plasma /
- Bohm criterion
[1] Bohm 1949 The Characteristics of Electrical Discharges in Magnetic Fields edited by A. Guthrie and Wakerling (New York: McGraw-Hill) Chap.2
[2] Severn G D 2007 Am. J. Phys. 75 92
[3] Wang D Z, Ma T C 2000 Acta Phys. Sin. 49 2404 (in Chinese)[王德真、马腾才 2008 物理学报 49 2404]
[4] Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156
[5] Amemiya H 1990 Journal of Physics D:Applied Physics 23 999
[6] Amemiya H, Annaratone B M, Allen J E 1998 J. Plasma Physics(UK) 60 81
[7] Mahanta M K, Goswami K S 1999 Physics of Plasmas 6 4781
[8] Keidar M, Boyd I D 2001 Physics of Plasmas 8 5315
[9] Ahedo E, Parra F I 2005 Phys. plasmas 12 073503
[10] Verheest F, Hellberg M A 1997 J. Plasma Phys. 57 465
[11] Gu Y P, Ma T C 2003 Acta Phys. Sin. 52 1196 (in Chinese) [谷云鹏、马腾才 2003 物理学报 52 1196]
[12] Deutsch R, Rauchle E 1992 Phys. Rev. A 46 3442
[13] Lieberman M A, Lichtenberg A J 1994 Principles of plasma discharges and materials processing (New York:Wiley) p167
[14] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chin. Phys. Lett. 20 1537
[15] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637
[16] Riemann K U 1995 IEEE Trans. Plasma Sci. 23 709
[17] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹、刘金远、邹 秀、刘 悦、王晓钢 2004 物理学报 53 793]
[18] Lee D, Oksuz L, Hershkowitz N 2007 Appl. Phys. Lett. 91 041505
[19] Yaroshenko V V, Verheest F, Thomas H M, Morfill G E 2009 New Jouranal of Physics 11 073013
[20] Lin C, Lin M M 2009 Commun Nonlinear Sci Numer Simulat 14 2597
[21] Wang D Y, Ma J X, Li Y R, Zhang W G 2009 Acta Phys. Sin. 58 8432 (in Chinese) [王道泳、马锦秀、李毅人、张文贵 2009 物理学报 58 8432]
[22] Zou X, Jin Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese)[邹 秀、籍延坤、邹滨雁 2010 物理学报 59 1902]
[23] Hobbs G D, Wesson J A 1967 Plasma Phys. 9 85
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[1] Bohm 1949 The Characteristics of Electrical Discharges in Magnetic Fields edited by A. Guthrie and Wakerling (New York: McGraw-Hill) Chap.2
[2] Severn G D 2007 Am. J. Phys. 75 92
[3] Wang D Z, Ma T C 2000 Acta Phys. Sin. 49 2404 (in Chinese)[王德真、马腾才 2008 物理学报 49 2404]
[4] Chen F F 1974 Introduction to Plasma Physics (New York: Plenum) p156
[5] Amemiya H 1990 Journal of Physics D:Applied Physics 23 999
[6] Amemiya H, Annaratone B M, Allen J E 1998 J. Plasma Physics(UK) 60 81
[7] Mahanta M K, Goswami K S 1999 Physics of Plasmas 6 4781
[8] Keidar M, Boyd I D 2001 Physics of Plasmas 8 5315
[9] Ahedo E, Parra F I 2005 Phys. plasmas 12 073503
[10] Verheest F, Hellberg M A 1997 J. Plasma Phys. 57 465
[11] Gu Y P, Ma T C 2003 Acta Phys. Sin. 52 1196 (in Chinese) [谷云鹏、马腾才 2003 物理学报 52 1196]
[12] Deutsch R, Rauchle E 1992 Phys. Rev. A 46 3442
[13] Lieberman M A, Lichtenberg A J 1994 Principles of plasma discharges and materials processing (New York:Wiley) p167
[14] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2003 Chin. Phys. Lett. 20 1537
[15] Wang Z X, Liu Y, Ren L W, Liu J Y, Wang X G 2006 Thin Solid Films 506-507 637
[16] Riemann K U 1995 IEEE Trans. Plasma Sci. 23 709
[17] Wang Z X, Liu J Y, Zou X, Liu Y, Wang X G 2004 Acta Phys. Sin. 53 793 (in Chinese) [王正汹、刘金远、邹 秀、刘 悦、王晓钢 2004 物理学报 53 793]
[18] Lee D, Oksuz L, Hershkowitz N 2007 Appl. Phys. Lett. 91 041505
[19] Yaroshenko V V, Verheest F, Thomas H M, Morfill G E 2009 New Jouranal of Physics 11 073013
[20] Lin C, Lin M M 2009 Commun Nonlinear Sci Numer Simulat 14 2597
[21] Wang D Y, Ma J X, Li Y R, Zhang W G 2009 Acta Phys. Sin. 58 8432 (in Chinese) [王道泳、马锦秀、李毅人、张文贵 2009 物理学报 58 8432]
[22] Zou X, Jin Y K, Zou B Y 2010 Acta Phys. Sin. 59 1902 (in Chinese)[邹 秀、籍延坤、邹滨雁 2010 物理学报 59 1902]
[23] Hobbs G D, Wesson J A 1967 Plasma Phys. 9 85
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