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The time behavior and the optimum conditions for the Xe gas capillary discharge extrem ultraviolet source are investigated theoretically and experimentally. By setting up a one-dimensional magneto-fluid-mechanics model, the plasma compressing characteristics and the emission characteristics are simulated under different gas pressures and different discharge currents. The time characteristic and the intensity of the 13.5 nm (2% bandwidth) emission are measured experimentally. The theoretical and experimental results show that there are the optimum gas pressures for different discharge currents. Meanwhile, the optimum gas pressure increases with the discharge current increasing. Moreover, the time to generate the highest 13.5 nm (2% bandwidth) emission should decrease by the increase of the discharge current. All the results should be useful to better understand the plasma condition for the discharge experiments and the EUV source. And it can be used to increase the power of the extreme ultraviolet source as well.
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Keywords:
- extreme ultraviolet source /
- capillary discharge /
- magneto-hydrodynamics /
- Xe plasma
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[2] Sasa B, Jennifer B A, Troy W B, Clift W M, Folta J A, Kaufmann B, Spiller E A 2002 Opt. Eng. 41 1797
[3] Takahiro I, Okino H, Nica P E, Amano S, Miyamoto S, Mochizuki T 2007 Rev. Sci. Instrum. 78 105105
[4] Malcolm M 1998 Appl. Opt. 37 1651
[5] Fomenkov I V, Bowering N, Rettig C L, Melnychuk S T, Oliver I R, Hoffman J R, Khodykin O V, Ness R M, Partlo W N 2004 J. Phys. D: Appl. Phys. 37 3266
[6] Nowakowska-Langier K, Jakubowski L, Baronova E O, Czaus K, Rabinski M, Jakubowski M J 2009 Eur. Phys. J. D 54 377
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[9] Zuppella P, Reale A, Ritucci A, Tucceri P, Prezioso S, Flora F, Mezi L, Dunne P 2009 Plasma Sources Sci. T. 18 025014
[10] Bergmann K, Danylyuk S V, Juschkin L 2009 J. Appl. Phys. 106 073309
[11] Zhao T, Zou X B, Zhang R, Wang X X 2010 Chin. Phys. B 19 075205
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[14] Kim S H, Lee K T, Kim D E, Lee T N 1997 Phys. Plasmas 4 730
[15] Lee K T, Kim S H, Kim D, Lee T N 1996 Phys. Plasmas 3 1340
[16] Bobrova N A, Bulanov S V, Farina D, Pozzoli R, Razinkova T L, Sakai J I, Sasorov P V, Sokolov I V 2000 Laser Part. Beams 18 623
[17] Ding N, Zhang Y, Ning C, Shu X J, Xiao D L 2008 Acta Phys. Sin. 57 3027 (in Chinese) [丁宁, 张扬, 宁成, 束小建, 肖德龙 2008 物理学报 57 3027]
[18] Zhang Y, Ding N 2006 Acta Phys. Sin. 55 2333 (in Chinese) [张扬, 丁宁 2006 物理学报 55 2333]
[19] Cheng Y L, Luan B H, Wu Y C, Zhao Y P, Wang Q, Zheng W D, Peng H M, Yang D W 2005 Acta Phys. Sin. 54 4979 (in Chinese) [程元丽, 栾伯含, 吴寅初, 赵永蓬, 王骐, 郑无敌, 彭惠民, 杨大为 2005 物理学报 54 4979]
[20] Zeng J L, Gao C, Yuan J 2010 Eur. Phys. J. D: 60 309
[21] Banine V Y, Koshelev K N, Swinkels G H P M 2011 J. Phys. D: Appl. Phys. 44 253001
[22] Gilleron F, Poirier M, Blenski T, Schmidt M, Ceccotti T 2003 J. Appl. Phys. 94 2086
[23] Xu Q, Zhao Y P, Liu Y, Li Q, Wang Q 2013 Eur. Phys. J. D 67 125
[24] Lan K, Zhang Y, Zheng W D 1999 Phys. Plasmas 6 4343
[25] Gao C, Shen Y F, Zeng J L 2008 Acta Phys. Sin. 57 4059 (in Chinese) [高城, 沈云峰, 曾交龙 2008 物理学报 57 4059]
[26] Churilov S S, Joshi Y N, Reader J, Kildiyarova R R 2004 Phys. Scripta 70 126
[27] Xu Q, Zhao Y P, Guan Z L, Zhang Y, Wang Q, Li Q 2010 Proceedings of 2010 ASOMT & 10th CRST Harbin, October 12–16, 2010 p213
[28] Marek R, Zdunek K 2003 Vacuum 70 303
[29] Vrba P, Vrbov M 2000 Contrib. Plasma. Phys. 40 581
[30] Zhao Y P, Wang Q, Xie Y, Cheng Y L, Luan B H 2008 J. Plasma Phys. 74 839
[31] Zhao Y P, Cheng Y L, Luan B H, Wu Y C, Wang Q 2006 J. Phys. D: Appl. Phys. 39 342
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[1] Banine V Y, Benschop J P H, Werij H G C 2000 Microelectron Eng. 53 681
[2] Sasa B, Jennifer B A, Troy W B, Clift W M, Folta J A, Kaufmann B, Spiller E A 2002 Opt. Eng. 41 1797
[3] Takahiro I, Okino H, Nica P E, Amano S, Miyamoto S, Mochizuki T 2007 Rev. Sci. Instrum. 78 105105
[4] Malcolm M 1998 Appl. Opt. 37 1651
[5] Fomenkov I V, Bowering N, Rettig C L, Melnychuk S T, Oliver I R, Hoffman J R, Khodykin O V, Ness R M, Partlo W N 2004 J. Phys. D: Appl. Phys. 37 3266
[6] Nowakowska-Langier K, Jakubowski L, Baronova E O, Czaus K, Rabinski M, Jakubowski M J 2009 Eur. Phys. J. D 54 377
[7] Klosner M A, Silfvast W T 1998 Opt. Lett. 23 1609
[8] Böwering N, Martins M, Partlo W N, Fomenkov I V 2004 J. Appl. Phys. 95 16
[9] Zuppella P, Reale A, Ritucci A, Tucceri P, Prezioso S, Flora F, Mezi L, Dunne P 2009 Plasma Sources Sci. T. 18 025014
[10] Bergmann K, Danylyuk S V, Juschkin L 2009 J. Appl. Phys. 106 073309
[11] Zhao T, Zou X B, Zhang R, Wang X X 2010 Chin. Phys. B 19 075205
[12] Huang X B, Yang L B, Li J, Zhou S T, Ren X D, Zhang S Q, Dan J K, Cai H C, Duan S C, Chen G H, Zhang Z W, Ouyang K, Li J, Zhang Z H, Zhou R G, Wang G L 2012 Chin. Phys. B 21 055206
[13] Li M, Wu J, Wang L P, Wu G, Han J J, Guo N, Qiu M T 2012 Chin. Phys. B 21 125202
[14] Kim S H, Lee K T, Kim D E, Lee T N 1997 Phys. Plasmas 4 730
[15] Lee K T, Kim S H, Kim D, Lee T N 1996 Phys. Plasmas 3 1340
[16] Bobrova N A, Bulanov S V, Farina D, Pozzoli R, Razinkova T L, Sakai J I, Sasorov P V, Sokolov I V 2000 Laser Part. Beams 18 623
[17] Ding N, Zhang Y, Ning C, Shu X J, Xiao D L 2008 Acta Phys. Sin. 57 3027 (in Chinese) [丁宁, 张扬, 宁成, 束小建, 肖德龙 2008 物理学报 57 3027]
[18] Zhang Y, Ding N 2006 Acta Phys. Sin. 55 2333 (in Chinese) [张扬, 丁宁 2006 物理学报 55 2333]
[19] Cheng Y L, Luan B H, Wu Y C, Zhao Y P, Wang Q, Zheng W D, Peng H M, Yang D W 2005 Acta Phys. Sin. 54 4979 (in Chinese) [程元丽, 栾伯含, 吴寅初, 赵永蓬, 王骐, 郑无敌, 彭惠民, 杨大为 2005 物理学报 54 4979]
[20] Zeng J L, Gao C, Yuan J 2010 Eur. Phys. J. D: 60 309
[21] Banine V Y, Koshelev K N, Swinkels G H P M 2011 J. Phys. D: Appl. Phys. 44 253001
[22] Gilleron F, Poirier M, Blenski T, Schmidt M, Ceccotti T 2003 J. Appl. Phys. 94 2086
[23] Xu Q, Zhao Y P, Liu Y, Li Q, Wang Q 2013 Eur. Phys. J. D 67 125
[24] Lan K, Zhang Y, Zheng W D 1999 Phys. Plasmas 6 4343
[25] Gao C, Shen Y F, Zeng J L 2008 Acta Phys. Sin. 57 4059 (in Chinese) [高城, 沈云峰, 曾交龙 2008 物理学报 57 4059]
[26] Churilov S S, Joshi Y N, Reader J, Kildiyarova R R 2004 Phys. Scripta 70 126
[27] Xu Q, Zhao Y P, Guan Z L, Zhang Y, Wang Q, Li Q 2010 Proceedings of 2010 ASOMT & 10th CRST Harbin, October 12–16, 2010 p213
[28] Marek R, Zdunek K 2003 Vacuum 70 303
[29] Vrba P, Vrbov M 2000 Contrib. Plasma. Phys. 40 581
[30] Zhao Y P, Wang Q, Xie Y, Cheng Y L, Luan B H 2008 J. Plasma Phys. 74 839
[31] Zhao Y P, Cheng Y L, Luan B H, Wu Y C, Wang Q 2006 J. Phys. D: Appl. Phys. 39 342
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