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Radio frequency (RF) thermal plasma involves abundant and complex physics. The understanding of the physical field distributions of the RF thermal plasma is helpful to its applications in industrial field. In this paper, an electro-thermal-magnetic-flow strong coupling mathematical and physical model of three-dimensional RF thermal plasma is established, the actual solenoid structure of the induction coil is considered, and a C++ code is developed for calculating the complex electromagnetic field in a customized version of the computational fluid dynamics commercial code FLUENT. The physical fields of RF thermal plasma, such as temperature field, flow field and electromagnetic field are studied. The electrical conductivity, thermal conductivity and viscosity distribution of the plasma are investigated. The results show that the physical field distribution of RF thermal plasma has an important non-axisymmetric three-dimensional effect due to the actual shape of the non-axisymmetric induction coil structure. The plasma discharge presents an annular distribution with a certain deflection angle. The distribution of plasma flow field shows a non-axisymmetric electromagnetic pump effect which is different from that of the two-dimensional model. The results have great guiding significance for optimizing and controlling the RF thermal plasma in various application areas.
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Keywords:
- temperature fields /
- flow fields /
- electromagnetic fields /
- radio frequency thermal plasma /
- three-dimensional numerical simulation
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Google Scholar
[11] 朱海龙 2014 博士学位论文(成都: 核工业西南物理研究院)
Zhu H L 2014 Ph. D. Dissertation (Chengdu: Southwestern Institute of Physics) (in Chinese)
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Google Scholar
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Google Scholar
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Google Scholar
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Google Scholar
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Google Scholar
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Google Scholar
[25] 陈熙 2009 热等离子体传热与流动 (北京: 科学出版社) 第28页
Chen X 2009 Heat Transfer and Flow of Thermal Plasma (Beijing: Science Press) p28 (in Chinese)
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Google Scholar
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Google Scholar
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图 1 等离子体炬及腔室 (a)几何结构示意图; (b)计算域和网格结构
Figure 1. Plasma torch system: (a) Geometric structure; (b) computational domain and grid.
图 2 射频电源电路框图
Figure 2. Diagram of radio frequency power supply circuit.
图 3 磁矢势Ax分布图 (a)实部; (b)虚部
Figure 3. Distribution of magnetic vector potential Ax: (a) Real part; (b) imaginary part.
图 4 磁矢势Ay分布图 (a)实部; (b)虚部
Figure 4. Distribution of magnetic vector potential Ay: (a) Real part; (b) imaginary part.
图 5 磁矢势Az分布图 (a)实部; (b)虚部
Figure 5. Distribution of magnetic vector potential Az: (a) Real part; (b) imaginary part.
图 6 YZ平面上的磁感应强度B分布 (a)实部; (b)虚部
Figure 6. Distribution of magnetic flux density on YZ plane: (a) Real part; (b) imaginary part.
图 7 XY平面上的电场E分布, z = 180 mm
Figure 7. Electric field distribution on the XY plane, z = 180 mm.
图 8 温度场场分布图 (a) YZ平面; (b) XZ平面; (c) XY平面, z = 180 mm
Figure 8. Temperature field distribution: (a) YZ plane; (b) XZ plane; (c) XY plane, z = 180 mm.
图 9 (a)焦耳热分布; (b) XY 平面上的焦耳热, z = 180 mm; (c)焓值分布
Figure 9. (a) Joule heat distribution; (b) Joule heat distribution on the XY plane, z = 180 mm; (c) enthalpy distribution.
图 10 (a)电导率分布; (b)热导率分布; (c)黏性系数分布
Figure 10. (a) Electrical conductivity distribution; (b) thermal conductivity distribution; (c) viscosity distribution.
图 12 射频热等离子体流场放大图
Figure 12. Magnified view of radio frequency thermal plasma flow field.
图 13 洛伦兹力Fx矢量分布图
Figure 13. Lorentz force distribution(Fx).
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[1] Murphy A B, Uhrlandt D 2018 Plasma Sources Sci. Technol. 27 063001
Google Scholar
[2] Mostaghimi J, Boulos M I 2015 Plasma Chem. Plasma Process. 35 421
Google Scholar
[3] Yu C F, Zhou X, Wang D Z, Linh N Van, Liu W 2018 Plasma Sci. Technol. 20 14019
Google Scholar
[4] Zhu H L, Tong H H, Cheng C M, Liu N 2017 Int. J. Refract. Met. Hard Mater. 66 76
Google Scholar
[5] Li J L, Hu R J, Qu H, Su Y, Wang N, Su H Q, Gu X J 2019 Appl. Catal. B 249 63
Google Scholar
[6] Oh J W, Na H, Cho Y S, Choi H 2018 Nanoscale Res. Lett. 13 1
Google Scholar
[7] Hou H D, Veilleux J, Gitzhofer F, Wang Q S 2020 Surf. Coat. Technol. 393 125803
Google Scholar
[8] Kulacki F A 2017 Handbook of Thermal Science and Engineering (Berlin: Springer) pp2923−3005
[9] Altenberend J, Chichignoud G, Delannoy Y 2012 Plasma Sources Sci. Technol. 21 045011
Google Scholar
[10] Razzak M A, Kondo K, Uesugi Y, Ohno N, Takamura S 2004 J. Appl. Phys. 95 427
Google Scholar
[11] 朱海龙 2014 博士学位论文(成都: 核工业西南物理研究院)
Zhu H L 2014 Ph. D. Dissertation (Chengdu: Southwestern Institute of Physics) (in Chinese)
[12] Xue S W, Proulx P, Boulos M I 2001 J. Phys. D: Appl. Phys. 34 1897
Google Scholar
[13] Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 27 55
Google Scholar
[14] Watanabe T, Atsuchi N, Shigeta M 2007 Thin Solid Films 515 4209
Google Scholar
[15] Tanaka Y 2004 J. Phys. D: Appl. Phys. 37 1190
Google Scholar
[16] Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 25 271
Google Scholar
[17] Bernardi D, Colombo V, Ghedini E, Mentrelli A 2003 Eur. Phys. J. D 25 279
Google Scholar
[18] Miller R C, Ayen R J 1969 J. Appl. Chem. 40 5260
[19] ANSYS FLUENT 15 Documentation, Theory Guide 2013 (Canonsburg, PA: ANSYS. Inc.)
[20] Boulos M I, Fauchais P, Pfender E 1994 Thermal Plasmas Fundamentals and Applications (Vol. 1) (New York: Plenum Press) p162
[21] Boulos M I 1985 Pure Appl. Chem. 57 1321
Google Scholar
[22] Chen L J, Chen W B, Liu C D, Tong H H, Zhao Q 2019 Plasma Sci. Technol. 21 074006
Google Scholar
[23] Punjabi S B, Das T K, Joshi N K, Mangalvedekar H A, Lande B K, Das A K 2010 J. Phys. Conf. Ser. 208 012048
Google Scholar
[24] Bernardi D, Colombo V, Ghedini E, Mentrelli A 2005 Pure Appl. Chem. 77 359
Google Scholar
[25] 陈熙 2009 热等离子体传热与流动 (北京: 科学出版社) 第28页
Chen X 2009 Heat Transfer and Flow of Thermal Plasma (Beijing: Science Press) p28 (in Chinese)
[26] Schreuders C 2006 Ph. D. Dissertation (Limoges: University of limoges)
[27] Raizer Y P 1987 Gas Discharge Physics (Berlin: Springer-Verlag) p14
[28] Boulos M I 1991 IEEE Trans. Plasma Sci. 19 1078
Google Scholar
[29] Kong P C, Lau Y C 1990 Pure Appl. Chem. 62 1809
Google Scholar
[30] Mauer G, Vaβen R, Stöver D, Kirner S, Marqués J L, Zimmermann S, Forster G, Schein J 2011 J. Therm. Spray Technol. 20 3
Google Scholar
[31] Yu M H, Yamada K, Takahashi Y, Liu K, Zhao T 2016 Phys. Plasmas 23 123523
Google Scholar
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