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The heterojunction device based on two-dimensional materials possesses unique photoelectric properties due to its nanoscale thickness and van der Waals (vdWs) contact surface. In this paper, a gate-voltage-tunable MoS2/MoTe2 vertical vdWs heterojunction device is constructed. The Kelvin probe force microscopy (KPFM) technology is combined with the electric transport measurement technology, thereby revealing the charge transport behavior of the MoS2/MoTe2 heterojunction under dark condition and laser-irradition condition, including the bipolarity characteristics of the transition from n-n+ junction to p-n junction. In this paper, the charge transport mechanism of heterojunction is explained comprehensively and systematically, including the charge transmission process of n-n+ junction and p-n junction under positive and negative bias conditions, the transformation of nodule behavior with gate voltage, the influence of barriers on charge transmission, the different rectification characteristics between n-n+ junction and p-n junction, the major role of source and leakage bias voltage in band tunneling, and the influence of photogenerated carriers on electrical transmission. The method in this work can be generalized to other two-dimensional heterojunction systems and also provide an important reference for improving the performance of two-dimensional semiconductor devices and their applications in the future.
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Keywords:
- two-dimensional transition metal chalcogenide heterojunction /
- charge transmission mechanism /
- energy band structure /
- Kelvin probe force microscope
[1] Novoselov K S, Geim A K, Morozov S V, Jiang D, Zhang Y, Dubonos S V, Grigorieva I V, Firsov A A 2004 Science 306 666Google Scholar
[2] Manzeli S, Ovchinnikov D, Pasquier D, Yazyev O V, Kis A 2017 Nat. Rev. Mater. 2 17033Google Scholar
[3] Li L K, Yu Y J, Ye G J, Ge Q Q, Ou X D, Wu H, Feng D L, Chen X H, Zhang Y B 2014 Nat. Nanotechnol. 9 372Google Scholar
[4] Song L, Ci L J, Lu H, Sorokin P B, Jin C H, Ni J, Kvashnin A G, Kvashnin D G, Lou J, Yakobson B I 2010 Nano Lett. 10 3209Google Scholar
[5] Jian S K, Jiang Y F, Yao H 2015 Phys. Rev. Lett. 114 237001Google Scholar
[6] Lozovoy K A, Izhnin I I, Kokhanenko A P, Dirko V V, Vinarskiy V P, Voitsekhovskii A V, Fitsych O I, Akimenko N Y 2022 Nanomaterials 12 2221Google Scholar
[7] Novoselov K S, Mishchenko A, Carvalho A, Neto A H C 2016 Science 353 aac9439Google Scholar
[8] Iannaccone G, Bonaccorso F, Colombo L, Fiori G 2018 Nat. Nanotechnol. 13 183Google Scholar
[9] Zeng M Q, Xiao Y, Liu J X, Yang K, Fu L 2018 Chem. Rev. 118 6236Google Scholar
[10] Chi Z H, Chen X L, Yen F, Peng F, Zhou Y H, Zhu J L, Zhang Y J, Liu X D, Lin C L, Chu SQ 2018 Phys. Rev. Lett. 120 037002Google Scholar
[11] Fei Z Y, Zhao W J, Palomaki T A, Sun B S, Miller M K, Zhao Z Y, Yan J Q, Xu X D, Cobden D H 2018 Nature 560 336Google Scholar
[12] Bonilla M, Kolekar S, Ma Y J, Diaz H C, Kalappattil V, Das R, Eggers T, Gutierrez H R, Phan M H, Batzill M 2018 Nat. Nanotechnol. 13 289Google Scholar
[13] Li T X, Jiang S W, Shen B, Zhang Y, Li L Z, Tao Z, Trithep D, Kenji W, Takashi T, Fu L, Shan J, Kin F M 2022 Nature 600 641Google Scholar
[14] Guo H W, Hu Z, Liu Z B, Tian J G 2021 Adv. Funct. Mater. 31 2007810Google Scholar
[15] Liu Y, Weiss N O, Duan X D, Cheng H C, Huang Y, Duan X F 2016 Nat. Rev. Mater. 1 16042Google Scholar
[16] Cheng R, Li D H, Zhou H L, Wang C, Yin A X, Jiang S, Liu Y, Chen Y, Huang Y, Duan X F 2014 Nano Lett. 14 5590Google Scholar
[17] Lee C H, Lee G H, van der Zande A M, Chen W C, Li Y L, Han M Y, Cui X, Arefe G, Nuckolls C, Heinz T F, Guo J, Hone J, Kim P 2014 Nat. Nanotechnol. 9 676Google Scholar
[18] Zhang K A, Zhang T N, Cheng G H, Li T X, Wang S X, Wei W, Zhou X H, Yu W W, Sun Y, Wang P, Zhang D, Zeng C G, Wang X J, Hu W D, Fan H J, Shen G Z, Chen X, Duan X F, Chang K, Dai N 2016 ACS Nano 10 3852Google Scholar
[19] Nowack K C, Spanton E M, Baenninger M, Konig M, Kirtley J R, Kalisky B, Ames C, Leubner P, Brune C, Buhmann H, Molenkamp L W, Goldhaber-Gordon D, Moler K A 2013 Nature 12 787Google Scholar
[20] Duong N T, Lee J, Bang S, Park C, Lim S C, Jeong M S 2019 ACS Nano 13 4478Google Scholar
[21] Cao G M, Meng P, Chen J G, Liu H S, Bian R J, Zhu C, Liu F C, Liu Z 2021 Adv. Funct. Mater. 31 2005443Google Scholar
[22] Nazir G, Kim H, Kim J, Kim K S, Shin D H, Khan M F, Lee D S, Hwang J Y, Hwang C, Suh J, Eom J, Jung S 2018 Nat. Commun. 9 5371Google Scholar
[23] Khan S, Khan A, Azadmanjiri J, Roy P K, Děkanovský L, Sofer Z, Numan A 2022 Adv. Photonics Res. 3 2100342Google Scholar
[24] Melitz W, Shen J, Kummel AC, Lee S 2011 Surf. Sci. Rep. 66 1Google Scholar
[25] Grzeszczyk M, Golasa K, Zinkiewicz M, Nogajewski K, Molas M R, Potemski M, Wysmolek A, Babinski A 2016 2D Mater. 3 025010Google Scholar
[26] Golasa K, Grzeszczyk M, Bozek R, Leszczynski P, Wysmolek A, Potemski M, Babinski A 2014 Solid State Commun. 197 53Google Scholar
[27] Balaji Y, Smets Q, Szabo A, Mascaro M, Lin D, Asselberghs I, Radu I, Luisier M, Groeseneken G 2020 Adv. Funct. Mater. 30 1905970Google Scholar
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图 1 MoS2/MoTe2异质结器件及其电学性质 (a) MoS2/MoTe2异质结器件的示意图; (b) MoS2/MoTe2异质结器件的光学图像; (c) MoS2/MoTe2异质结的拉曼光谱; (d) MoS2/MoTe2异质结的能带结构; (e) MoS2/MoTe2异质结器件转移曲线; (f) MoS2/MoTe2异质结器件输出曲线
Figure 1. MoS2/MoTe2 heterojunction devices and it’s electrical properties: (a) Diagrammatic sketch of MoS2/MoTe2 heterojunction device; (b) optical image of the MoTe2/MoS2 heterostructure device; (c) Raman spectra of MoTe2/MoS2 heterojunction; (d) band structure of the MoTe2/MoS2 heterojunction; (e) transfer curves of MoS2/MoTe2 heterojunction device; (f) output curves of MoS2/MoTe2 heterojunction device.
图 2 MoS2/MoTe2异质结器件的电学特性 (a) Vds = –6 V时不同功率下的转移曲线; (b) Vds = +6 V时不同功率下的转移曲线; (c) Vg = +40 V时不同功率下的输出曲线; (d) Vg = –10 V时不同功率下的输出曲线; (e) 在Vg
$\gg $ 0和Vg$\ll $ 0条件下, MoS2/MoTe2异质结的能带结构Figure 2. Electrical characteristics of MoTe2/MoS2 heterojunction device: (a) Power intensity-dependent Ids-Vg curves, Vds = –6 V; (b) power intensity-dependent Ids-Vg curves, Vds = +6 V; (c) power intensity-dependent Ids-Vds curves, Vg = +40 V; (d) power intensity-dependent Ids-Vds, Vg = –10 V; (e) band structure of MoTe2/MoS2 heterojunction at Vg
$\gg $ 0 and Vg$\ll$ 0.图 3 MoS2/MoTe2异质结器件的表面电势分布 (a) KPFM原理示意图; (b) MoS2/MoTe2异质结的AFM图像; (c) Vds = +2 V时异质结器件的表面电势分布; (d) Vds = –2 V时异质结器件的表面电势分布
Figure 3. Surface potential distribution of MoS2/MoTe2 heterojunction devices: (a) Schematic diagram of KPFM; (b) AFM image of MoS2/MoTe2 heterojunction; (c) surface potential distribution of heterojunction device, Vds = +2 V; (d) surface potential distribution of heterojunction device, Vds = –2 V.
图 4 MoTe2/MoS2异质结器件的表面电势分布及其物理机理 (a) Vds = +2 V时的表面电势归一化数据; (b), (c) Vds>0时的能带结构; (d) Vds = –2 V时的表面电势归一化数据; (e), (f) Vds<0的能带结构
Figure 4. Surface potential distribution of vertical MoTe2/MoS2 heterojunction device and it’s physical mechanism: (a) Surface potential normalized profiles of heterojunction, Vds = +2 V; (b), (c) band structure of heterojunction, Vds>0; (d) surface potential normalized profiles of heterojunction, Vds = –2 V; (e), (f) band structure of heterojunction, Vds<0.
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[1] Novoselov K S, Geim A K, Morozov S V, Jiang D, Zhang Y, Dubonos S V, Grigorieva I V, Firsov A A 2004 Science 306 666Google Scholar
[2] Manzeli S, Ovchinnikov D, Pasquier D, Yazyev O V, Kis A 2017 Nat. Rev. Mater. 2 17033Google Scholar
[3] Li L K, Yu Y J, Ye G J, Ge Q Q, Ou X D, Wu H, Feng D L, Chen X H, Zhang Y B 2014 Nat. Nanotechnol. 9 372Google Scholar
[4] Song L, Ci L J, Lu H, Sorokin P B, Jin C H, Ni J, Kvashnin A G, Kvashnin D G, Lou J, Yakobson B I 2010 Nano Lett. 10 3209Google Scholar
[5] Jian S K, Jiang Y F, Yao H 2015 Phys. Rev. Lett. 114 237001Google Scholar
[6] Lozovoy K A, Izhnin I I, Kokhanenko A P, Dirko V V, Vinarskiy V P, Voitsekhovskii A V, Fitsych O I, Akimenko N Y 2022 Nanomaterials 12 2221Google Scholar
[7] Novoselov K S, Mishchenko A, Carvalho A, Neto A H C 2016 Science 353 aac9439Google Scholar
[8] Iannaccone G, Bonaccorso F, Colombo L, Fiori G 2018 Nat. Nanotechnol. 13 183Google Scholar
[9] Zeng M Q, Xiao Y, Liu J X, Yang K, Fu L 2018 Chem. Rev. 118 6236Google Scholar
[10] Chi Z H, Chen X L, Yen F, Peng F, Zhou Y H, Zhu J L, Zhang Y J, Liu X D, Lin C L, Chu SQ 2018 Phys. Rev. Lett. 120 037002Google Scholar
[11] Fei Z Y, Zhao W J, Palomaki T A, Sun B S, Miller M K, Zhao Z Y, Yan J Q, Xu X D, Cobden D H 2018 Nature 560 336Google Scholar
[12] Bonilla M, Kolekar S, Ma Y J, Diaz H C, Kalappattil V, Das R, Eggers T, Gutierrez H R, Phan M H, Batzill M 2018 Nat. Nanotechnol. 13 289Google Scholar
[13] Li T X, Jiang S W, Shen B, Zhang Y, Li L Z, Tao Z, Trithep D, Kenji W, Takashi T, Fu L, Shan J, Kin F M 2022 Nature 600 641Google Scholar
[14] Guo H W, Hu Z, Liu Z B, Tian J G 2021 Adv. Funct. Mater. 31 2007810Google Scholar
[15] Liu Y, Weiss N O, Duan X D, Cheng H C, Huang Y, Duan X F 2016 Nat. Rev. Mater. 1 16042Google Scholar
[16] Cheng R, Li D H, Zhou H L, Wang C, Yin A X, Jiang S, Liu Y, Chen Y, Huang Y, Duan X F 2014 Nano Lett. 14 5590Google Scholar
[17] Lee C H, Lee G H, van der Zande A M, Chen W C, Li Y L, Han M Y, Cui X, Arefe G, Nuckolls C, Heinz T F, Guo J, Hone J, Kim P 2014 Nat. Nanotechnol. 9 676Google Scholar
[18] Zhang K A, Zhang T N, Cheng G H, Li T X, Wang S X, Wei W, Zhou X H, Yu W W, Sun Y, Wang P, Zhang D, Zeng C G, Wang X J, Hu W D, Fan H J, Shen G Z, Chen X, Duan X F, Chang K, Dai N 2016 ACS Nano 10 3852Google Scholar
[19] Nowack K C, Spanton E M, Baenninger M, Konig M, Kirtley J R, Kalisky B, Ames C, Leubner P, Brune C, Buhmann H, Molenkamp L W, Goldhaber-Gordon D, Moler K A 2013 Nature 12 787Google Scholar
[20] Duong N T, Lee J, Bang S, Park C, Lim S C, Jeong M S 2019 ACS Nano 13 4478Google Scholar
[21] Cao G M, Meng P, Chen J G, Liu H S, Bian R J, Zhu C, Liu F C, Liu Z 2021 Adv. Funct. Mater. 31 2005443Google Scholar
[22] Nazir G, Kim H, Kim J, Kim K S, Shin D H, Khan M F, Lee D S, Hwang J Y, Hwang C, Suh J, Eom J, Jung S 2018 Nat. Commun. 9 5371Google Scholar
[23] Khan S, Khan A, Azadmanjiri J, Roy P K, Děkanovský L, Sofer Z, Numan A 2022 Adv. Photonics Res. 3 2100342Google Scholar
[24] Melitz W, Shen J, Kummel AC, Lee S 2011 Surf. Sci. Rep. 66 1Google Scholar
[25] Grzeszczyk M, Golasa K, Zinkiewicz M, Nogajewski K, Molas M R, Potemski M, Wysmolek A, Babinski A 2016 2D Mater. 3 025010Google Scholar
[26] Golasa K, Grzeszczyk M, Bozek R, Leszczynski P, Wysmolek A, Potemski M, Babinski A 2014 Solid State Commun. 197 53Google Scholar
[27] Balaji Y, Smets Q, Szabo A, Mascaro M, Lin D, Asselberghs I, Radu I, Luisier M, Groeseneken G 2020 Adv. Funct. Mater. 30 1905970Google Scholar
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