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物理学报. 2008, 57(9): 6013-6017.
doi: 10.7498/aps.57.6013.
退火对含氮氟非晶碳膜结构及光学带隙的影响
- 收稿日期: 2007-12-04
- 修回日期: 2008-01-24
- 刊出日期: 2008-09-20
English Abstract
Influence of annealing on structure and optical band gap of nitrogen doping fluorinated amorphous carbon films
- Received Date:
04 December 2007
- Accepted Date:
24 January 2008
- Published Online:
20 September 2008
Abstract: Radio frequency plasma enhance chemical vapor deposition (RF-PECVD) was used todeposit nitrogen doped fluorinated amorphous carbon (a -C:F,N) films with CF4, CH4 and N2 as source gases. We focused on the influence of annealing temperature on the structure and optical band gap (Eg) of the films. The as-deposited films undergo significant chemical and optical changes during annealing. The films are thermally stable at 350℃. The optical band gap shows decrease of different degrees with increasing annealing temperature. Raman and Fourier transform infrared absorption spectra show that the relative content of F in the films decreased, while the content of sp2 carbon increased, and as a result, the density of states near the band edgye of σ-σ* decreases, which is responsible for the increasing Eg.
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