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物理学报. 2009, 58(4): 2742-2745.
doi: 10.7498/aps.58.2742.
NiTi合金薄膜厚度对相变温度影响的X射线光电子能谱分析
- 收稿日期: 2008-02-25
- 修回日期: 3009-09-23
- 刊出日期: 2009-04-20
English Abstract
X-ray photoelectron spectroscopy analysis of the effect of thickness on the transformation temperature of NiTi alloy thin films
- Received Date:
25 February 2008
- Accepted Date:
23 September 3009
- Published Online:
20 April 2009
Abstract: The effect of thickness on transformation temperature of the NiTi thin films has been studied by X-ray diffraction and X-ray photoelectron spectroscopy. Results show that the crystallization temperature for 3?μm-thick film is higher than that for 18?μm thick film at the same growth temperature and post annealing. With the substrate temperature increasing, the start temperature （As） of austenite phase is lowered after annealing at 763 K for 1?h. There is an oxide layer （TiO2） on the film surface, which prevents the Ni atom from coming onto the surface. There is an oxide layer of a mixture Ti2O3 with NiO on the film /substrate interface. The oxide layers affect the transformation temperature by changing the Ni atomic content in the interior of the film.
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