-
采用原位X射线衍射法定量地分析研究了多晶Ni/非晶Si成分调制膜中的固相反应非晶化过程.提出了非晶Ni-Si相在Ni/a-Si多层膜固相非晶化反应中的生长模型.并对Ni晶界上的非晶化现象给予热力学和动力学上的解释.Solid state amorphization reaction process in Ni/amorphous Si multilayers has been quanlitatively studied by using in situ X-ray diffraction. An amorphous formation and growth model is suggested for elucidating the solid state reaction in the Ni/amorphous Si multilayers. Thermodynamic and kinetic interpretations for the amorphization reaction at grain boundaries in Ni sublayers are presented.
计量
- 文章访问数: 6265
- PDF下载量: 599
- 被引次数: 0