搜索

x

留言板

尊敬的读者、作者、审稿人, 关于本刊的投稿、审稿、编辑和出版的任何问题, 您可以本页添加留言。我们将尽快给您答复。谢谢您的支持!

姓名
邮箱
手机号码
标题
留言内容
验证码

离子束溅射法薄膜生长中结瘤微缺陷的生长机理

张东平 齐红基 邵建达 范瑞瑛 范正修

引用本文:
Citation:

离子束溅射法薄膜生长中结瘤微缺陷的生长机理

张东平, 齐红基, 邵建达, 范瑞瑛, 范正修

Mechanism of nodule growth in ion beam sputtering films

Zhang Dong-Ping, Qi Hong-Ji, Shao Jian-Da, Fan Rui-Ying, Fan Zheng-Xiu
PDF
导出引用
  • 用离子束溅射法制备了锆单层薄膜.用设计新型夹具和预置种子方法,对薄膜中结瘤微缺陷的生长过程进行了研究.在高分辨率光学显微镜和扫描电子显微镜下观察发现,结瘤在其生长初期呈现出分形的特征.用分子动力学和薄膜生长的扩散限制聚集模型,薄膜中结瘤微缺陷成核时的分形现象得到了很好的解释.
    Zirconium singlelayer films were prepared by ion beam sputtering method. By using a novel designed substrate holder in preplanting seeds method, the growth process of the nodular defects in thin films was studied. With the help of high resolution optical microscopy and electron scanning microcopy, the phenomenon that the nodules nucleation exhibits fractal characters in their initial growth period was observed. By using the molecular dynamics theory and diffusion limited aggregation model of film growth, the fractal phenomenon of the nodule nucleation was well explained.
    • 基金项目: 国家高技术研究发展计划(批准号:2003AA311040)资助的课题.
计量
  • 文章访问数:  6407
  • PDF下载量:  838
  • 被引次数: 0
出版历程
  • 收稿日期:  2003-05-29
  • 修回日期:  2004-07-02
  • 刊出日期:  2005-03-17

/

返回文章
返回