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The distribution of intensity of incident irradiation in photo-resist during exposure is figured out, and it is shown that the pattern in photo-resist on surface with high reflectivity will suffer standing wave due to the fact that the incidence irradiation interferences with the reflective beam from the photo-resist-substrate interface. The higher the reflectivity, the worse the effect of standing wave is, and it is shown that the standing wave will have adverse effects on the profile and the duty cycle of photo-resist grating and restricts the most groove depth. Inserting a layer of anti-reflection coating (ARC) can minimize the effect of standing wave. Experimental results show that it is a good way to use ARC between photo-resist and substrate to attenuate standing wave.
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Keywords:
- holographic lithography /
- standing wave /
- anti-reflection coating
[1] Xu X D, Hong Y L, Fu S J 2004 Physics 33 340 (in Chinese) [徐向东, 洪义麟, 付绍军 2004 物理 33 340]
[2] Zhu X L, Xie C Q Ye T C, Zhao M, Ma J, Jiang J, Niu J B, Liu M 2007 Proc. SPIE 6832 68320V1-6
[3] Pelzer R, Lindner P, Glinsner T, Vratzov B, Gourgon C, Landis S, Kettner P, Schaefer C 2004 Equipment for Electronic Products Manufacturing 114 1
[4] Xu X D 2001 Ph. D. Dissertation (Hefei: University of Science and Technology of China) (in Chinese) [徐向东 2001 博士学位论文(合肥: 中国科学技术大学)
[5] Qiu K Q, Xu X D, Liu Y Hong Y L, Fu S J 2008 Acta Phys. Sin. 57 6329 (in Chinese) [邱克强, 徐向东, 刘颖, 洪义麟, 付绍军 2008 物理学报 57 6329]
[6] Zhao J S, Li L F,Wu Z H 2004 Acta Opt. Sin. 24 1285 (in Chinese) [赵劲松, 李立峰, 吴振华 2004 光学学报 24 1285]
[7] Mack C A 1986 Appl. Opt. 25 1958
[8] Johnson L F 1978 App. Opt. 17 1165
[9] Liu S J, Du J L, Xiao X, Tang X G, Peng Q J, Liu J L, Guo Y K 2004 Micronanoelectronic Technol. 2 41 (in Chinese) [刘世杰, 杜惊雷, 肖啸, 唐雄贵, 彭钦军, 刘建莉, 郭永康 2004 微纳电子技术 2 41]
[10] Born M, Wolf E 1999 Principles of Optics (7th Ed.) (UK: Cambridge University Press) pp342–380
[11] Weber M J 2003 Handbook of Optical Materials (US: CRC Press) pp328–329
[12] Greer F, Van L, Fraser D, Coburn J W, Graves D B 2002 J. Vac. Sci. Tech. B 20 1901
[13] Xu X D, Hong Y L, Fu S J 2003 Vac. Sci. Technol. 23 362 (in Chinese) [徐向东, 洪义麟, 付绍军 2003 真空科学技术 23 362]
[14] Xiao X 2004 J. Leshan Teachers College 19 20 (in Chinese) [肖啸 2004 乐山师范学院学报 19 20]
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[1] Xu X D, Hong Y L, Fu S J 2004 Physics 33 340 (in Chinese) [徐向东, 洪义麟, 付绍军 2004 物理 33 340]
[2] Zhu X L, Xie C Q Ye T C, Zhao M, Ma J, Jiang J, Niu J B, Liu M 2007 Proc. SPIE 6832 68320V1-6
[3] Pelzer R, Lindner P, Glinsner T, Vratzov B, Gourgon C, Landis S, Kettner P, Schaefer C 2004 Equipment for Electronic Products Manufacturing 114 1
[4] Xu X D 2001 Ph. D. Dissertation (Hefei: University of Science and Technology of China) (in Chinese) [徐向东 2001 博士学位论文(合肥: 中国科学技术大学)
[5] Qiu K Q, Xu X D, Liu Y Hong Y L, Fu S J 2008 Acta Phys. Sin. 57 6329 (in Chinese) [邱克强, 徐向东, 刘颖, 洪义麟, 付绍军 2008 物理学报 57 6329]
[6] Zhao J S, Li L F,Wu Z H 2004 Acta Opt. Sin. 24 1285 (in Chinese) [赵劲松, 李立峰, 吴振华 2004 光学学报 24 1285]
[7] Mack C A 1986 Appl. Opt. 25 1958
[8] Johnson L F 1978 App. Opt. 17 1165
[9] Liu S J, Du J L, Xiao X, Tang X G, Peng Q J, Liu J L, Guo Y K 2004 Micronanoelectronic Technol. 2 41 (in Chinese) [刘世杰, 杜惊雷, 肖啸, 唐雄贵, 彭钦军, 刘建莉, 郭永康 2004 微纳电子技术 2 41]
[10] Born M, Wolf E 1999 Principles of Optics (7th Ed.) (UK: Cambridge University Press) pp342–380
[11] Weber M J 2003 Handbook of Optical Materials (US: CRC Press) pp328–329
[12] Greer F, Van L, Fraser D, Coburn J W, Graves D B 2002 J. Vac. Sci. Tech. B 20 1901
[13] Xu X D, Hong Y L, Fu S J 2003 Vac. Sci. Technol. 23 362 (in Chinese) [徐向东, 洪义麟, 付绍军 2003 真空科学技术 23 362]
[14] Xiao X 2004 J. Leshan Teachers College 19 20 (in Chinese) [肖啸 2004 乐山师范学院学报 19 20]
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