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Ti(Cr)缓冲层对用于垂直磁记录材料CoCrTa介质磁特性和微结构的影响

甄聪棉 马 丽 张金娟 刘 英 聂向富

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Ti(Cr)缓冲层对用于垂直磁记录材料CoCrTa介质磁特性和微结构的影响

甄聪棉, 马 丽, 张金娟, 刘 英, 聂向富

Effect of Ti(Cr) underlayer on the magnetic properties and microstructure of CoCrTa film for perpendicular magnetic recording media

Zhen Cong-Mian, Ma Li, Zhang Jin-Juan, Liu Ying, Nie Xiang-Fu
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  • 利用直流对靶磁控溅射技术在单晶Si衬底上制备了C/CoCrTa/X (X=Cr,Ti)介质材料.分别采用振动样品磁强计、X射线衍射仪、扫描探针显微镜对样品的磁性、微结构等进行了测试分析.研究发现,Ti缓冲层有利于样品中Co晶粒的易轴垂直于膜面生长.以Ti为缓冲层的样品,颗粒尺寸和表面粗糙度较小,而且磁畴明显,说明以Ti为缓冲层的薄膜样品更适宜做垂直磁记录.
    C/CoCrTa/X (X=Cr, Ti) films were fabricated with DC facing target magnetron sputtering apparatus. Their magnetic properties and microstructure were characterized by vibrating sample magnetometer (VSM), X-ray diffraction (XRD), and scan probe microscope (SPM), respectively. The experimental results indicate that the Ti underlayer can induce the c-axis orientation of Co grain in the direction perpendicular to the film surface. For samples with Ti underlayer, the grain size and the surface roughness are relatively finer, and magnetic domains can be observed obviously. These results show that the sample with Ti underlayer is more suitable for the perpendicular magnetic recording media.
    • 基金项目: 国家自然科学基金(批准号:10274018)、河北师范大学博士基金(批准号:L2003B08)和河北省自然科学基金 (批准号:A2005000143) 资助的课题.
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  • 文章访问数:  6945
  • PDF下载量:  1080
  • 被引次数: 0
出版历程
  • 收稿日期:  2006-08-02
  • 修回日期:  2006-09-01
  • 刊出日期:  2007-07-11

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