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Ta2O5 films were deposited at room temperature by radio frequency(RF) sputtering with the target of bulk Ta2O5, in Ar or Ar-O2 mixture atmosphere. The reflectivity spectra measured from two sides of a film are compared to evaluate the optical absorption of the film. It is found that the excess optical absorption arises from deficiency in oxygen during sputtering. These defects can be eliminated effectively by selecting adequate Ar-O2 mixture and power for sputtering, and unabsorbing Ta2O5 films with compactness and smoothness can be obtained without annealing.
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Keywords:
- Ta2O5 film /
- optical absorption /
- surface morphology /
- RF sputtering
[1] Mohammad M A, Morgan D V 1989 Phys. State A 115 213
[2] Chanelere C, Autran J L, Devine R A B, Balland B 1998 J. Mater. Sci. and Enging. R22 269 Atanassova E, Paskaleva A 2007 J. Microelectronics Reliability 47 913 Rubio F, Albella J M, Martinz-Duart J M 1982 Thin Solid Films 90 405 Herrmann W C 1981 J. Vac. Sci. Technol. 18 1303 Tu Y K, Lin C C, Wang W S, Huang S L 1987 Proceedings of the SPIE 836 40 Xu C, Yao J K, Ma J Y, Jin Y X, Shao J D 2007 Chin. Opt. Lett. 5 727 Xu C, Li D W, Ma J Y, Jin Y X, Shao J D, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Opt. Laser Technol. 40 545 Tien P K 1971 Appl. Opt. 10 2395 Hensier D H, Cuthbert J D, Martin R J, Tien P K 1971 Appl. Opt. 10 1037 Lo G Q, Kwong D L, Lee S 1992 Appl. Phys. 60 3286 Nishimura Y, Tokunaga K, Tsuji M 1993 Thin Solid Films 226 144 Porporati A, Roitti S, Sbaizero O 2003 J. European Ceramic Society 23 247 Demiryont H, Sites James R, Geib Kent 1985 Appl. Opt. 24 490 Marius G, Wilhelm H, Markus K T 2007 Thin Solid Films 516 136 Cevro M, Carter M 1995 Opt. Eng. 34 596 Pai Y H, Chou C C, Shieu F S 2008 Materials Chemistry and Physics 107 524 Riekkinen T, Molarius J 2003 Microelectron. Eng. 70 392 Huang T W, Lee H Y, Hsieh Y W, Lee C H 2002 J. Cryst. Growth 237 492 Reith T M, Ficalora P J 1983 J. Vac. Sci. Technol. A 1 1362 Paskaleva A, Atanassova E, Dimitrova T 2000 Vacuum 58 470 Gruger H, Kunath Ch, Kurth E, Sorge S, Pufe W, Pechstein T, 2004 Thin Solid Films 447/448 509 Spassov D, Atanassova E, Beshkov G 2000 Microelectronics Journal 31 653 Zhang J Y, Fang Q, Boyd I W 1999 Appl. Surf. Sci. 138 320 Pignolet A, Rao G M, Krupanidhi S B 1995 Thin Solid Films 258 230 Masse J P, Szymanowski H, Zabeida O, Amassian A, Klemberg-Sapieha J E, Martinu L 2006 Thin Solid Films 515 1674 Xu C, Xiao Q L, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Appl. Surf. Sci. 254 6554 Zhou J C, Luo D T, Li Y Z, Liu Z 2009 Trans. Nonferrous Met. Soc. China 19 359 Zhang G Y, Xue Y Y, Guo P T, Wang H H, Ma Z J 2008 Piezoel Ectectrics and Acoustooptics 30 12(in Chinese) [张光勇、 薛亦渝、郭培涛、王汉华、马中杰 2008 压电与声光 30 12] Guo P T, Xue Y Y, Zhang G Y, Wang H H 2007 Vacuum 44 32(in Chinese) [郭培涛、薛亦渝、张光勇、王汉华、马中杰 2007 真空44 32] Azim O A, Abdel-Aziz M M, Yahia I S 2009 Appl. Surf. Sci. 255 4829 Lee C C, Chen H C, Jaing C C 2005 Appl. Opt. 44 2996 Rabady R, Avrutsky I 2005 Appl. Opt. 44 378 Lin Y C, Lu W Q 1990 Principle in Optical Films (Beijing: National Defense Industry Press) p101(in Chinese)[林永昌、卢维强 1990 光学薄膜原理(北京:国防工业出版社)第101页] Xu C, Qiang Y H, Zhu Y B, Zhai T T, Guo L T, Zhao Y L, Shao J D, Fan Z X 2010 Vacuum doi:10.1016/j.vacuum.2010.02.009
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[1] Mohammad M A, Morgan D V 1989 Phys. State A 115 213
[2] Chanelere C, Autran J L, Devine R A B, Balland B 1998 J. Mater. Sci. and Enging. R22 269 Atanassova E, Paskaleva A 2007 J. Microelectronics Reliability 47 913 Rubio F, Albella J M, Martinz-Duart J M 1982 Thin Solid Films 90 405 Herrmann W C 1981 J. Vac. Sci. Technol. 18 1303 Tu Y K, Lin C C, Wang W S, Huang S L 1987 Proceedings of the SPIE 836 40 Xu C, Yao J K, Ma J Y, Jin Y X, Shao J D 2007 Chin. Opt. Lett. 5 727 Xu C, Li D W, Ma J Y, Jin Y X, Shao J D, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Opt. Laser Technol. 40 545 Tien P K 1971 Appl. Opt. 10 2395 Hensier D H, Cuthbert J D, Martin R J, Tien P K 1971 Appl. Opt. 10 1037 Lo G Q, Kwong D L, Lee S 1992 Appl. Phys. 60 3286 Nishimura Y, Tokunaga K, Tsuji M 1993 Thin Solid Films 226 144 Porporati A, Roitti S, Sbaizero O 2003 J. European Ceramic Society 23 247 Demiryont H, Sites James R, Geib Kent 1985 Appl. Opt. 24 490 Marius G, Wilhelm H, Markus K T 2007 Thin Solid Films 516 136 Cevro M, Carter M 1995 Opt. Eng. 34 596 Pai Y H, Chou C C, Shieu F S 2008 Materials Chemistry and Physics 107 524 Riekkinen T, Molarius J 2003 Microelectron. Eng. 70 392 Huang T W, Lee H Y, Hsieh Y W, Lee C H 2002 J. Cryst. Growth 237 492 Reith T M, Ficalora P J 1983 J. Vac. Sci. Technol. A 1 1362 Paskaleva A, Atanassova E, Dimitrova T 2000 Vacuum 58 470 Gruger H, Kunath Ch, Kurth E, Sorge S, Pufe W, Pechstein T, 2004 Thin Solid Films 447/448 509 Spassov D, Atanassova E, Beshkov G 2000 Microelectronics Journal 31 653 Zhang J Y, Fang Q, Boyd I W 1999 Appl. Surf. Sci. 138 320 Pignolet A, Rao G M, Krupanidhi S B 1995 Thin Solid Films 258 230 Masse J P, Szymanowski H, Zabeida O, Amassian A, Klemberg-Sapieha J E, Martinu L 2006 Thin Solid Films 515 1674 Xu C, Xiao Q L, Ma J Y, Jin Y X, Shao J D, Fan Z X 2008 Appl. Surf. Sci. 254 6554 Zhou J C, Luo D T, Li Y Z, Liu Z 2009 Trans. Nonferrous Met. Soc. China 19 359 Zhang G Y, Xue Y Y, Guo P T, Wang H H, Ma Z J 2008 Piezoel Ectectrics and Acoustooptics 30 12(in Chinese) [张光勇、 薛亦渝、郭培涛、王汉华、马中杰 2008 压电与声光 30 12] Guo P T, Xue Y Y, Zhang G Y, Wang H H 2007 Vacuum 44 32(in Chinese) [郭培涛、薛亦渝、张光勇、王汉华、马中杰 2007 真空44 32] Azim O A, Abdel-Aziz M M, Yahia I S 2009 Appl. Surf. Sci. 255 4829 Lee C C, Chen H C, Jaing C C 2005 Appl. Opt. 44 2996 Rabady R, Avrutsky I 2005 Appl. Opt. 44 378 Lin Y C, Lu W Q 1990 Principle in Optical Films (Beijing: National Defense Industry Press) p101(in Chinese)[林永昌、卢维强 1990 光学薄膜原理(北京:国防工业出版社)第101页] Xu C, Qiang Y H, Zhu Y B, Zhai T T, Guo L T, Zhao Y L, Shao J D, Fan Z X 2010 Vacuum doi:10.1016/j.vacuum.2010.02.009
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