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本文针对恶劣条件下滑动弧等离子体放电稳定性问题, 搭建了高气压交流旋转滑动弧放电实验系统, 开展了高气压下交流旋转滑动弧放电特性实验, 并对其放电特性、电弧运动特性、光谱特性进行了分析. 研究结果表明: 随着介质气体压力的升高, 滑动弧放电的电压、电流、能量均呈现增大趋势, 当介质气体压力升高到0.52 MPa时, 滑动弧放电的能量从常压下的84.74 J增大到147.13 J; 且随着介质气体压力的升高, 电弧的击穿频率并不是单调变化, 而是在0.2 MPa时达到最大为26.55 kHz; 高气压下电弧运动过程中会出现“弧道骤变”现象; 随着介质气体压力的升高, 滑动弧放电的整体光谱发射强度呈现变强趋势; 通过两谱线法对滑动弧放电的电子激发温度进行了计算, 常压下滑动弧放电的电子激发温度为0.8153 eV, 随着介质气体压力的升高, 电子激发温度呈现升高趋势, 当介质气体压力达到0.4 MPa时, 滑动弧放电的电子激发温度升高至5.3165 eV.In order to study the stability of gliding arc plasma discharge under mal-conditions, an experimental system for studying the high air pressure alternating current rotating gliding arc discharge is built. The discharge characteristics, arc motion characteristics and spectral characteristics of rotating gliding arc discharge are analyzed under high pressure experimentally. Experimental results show that the voltage, current and energy increase in the gliding arc discharge with the increase of air pressure. As the air pressure rises to 0.52 MPa, the discharge energy increases from 84.74 to 147.13 J. With the increase of gas pressure, the breakdown frequency of the arc does not change monotonically, but reaches a maximum value of 26.55 kHz at 0.2 MPa, while the emission spectral intensity increases. The “arc channel mutation” occurs in the process of arc motion under high pressure. The electron excitation temperature in the process of gliding arc discharge is calculated by the two-line method, and the electron excitation temperature of gliding arc discharge is 0.8153 eV at an atmosphere pressure. The electron excitation temperature rises with the increase of air pressure. The excitation temperature increases to 5.3165 eV at an air pressure of 0.4 MPa.
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Keywords:
- rotating gliding arc plasma /
- high air pressure discharge /
- electron excitation temperature /
- breakdown frequency
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图 2 光纤探头测点位置分布示意图
Fig. 2. Distribution diagram of measuring points of optical fiber probe.
图 4 两种不同状态下电弧放电的照片 (a) 放电状态一; (b) 放电状态二
Fig. 4. Photos of arc discharge in two different states: (a) Discharge state Ⅰ (b) discharge state Ⅱ.
图 5 常压放电电压、电流波形图 (a) 0—40 ms; (b) 22.2—22.5 ms; (c) 24.7—25 ms
Fig. 5. Voltage and current waveforms of atmospheric discharge: (a) 0–40 ms; (b) 22.2–22.5 ms; (c) 24.7–25 ms.
图 6 不同气体压力条件下电压电流波形图 (a) 0.1 MPa; (b) 0.2 MPa; (c) 0.3 MPa; (d) 0.4 MPa; (e) 0.5 MPa
Fig. 6. Voltage and current waveforms under different gas pressures: (a) 0.1 MPa; (b) 0.2 MPa; (c) 0.3 MPa; (d) 0.4 MPa; (e) 0.5 MPa.
图 7 不同气压条件下电弧运动图 (a) 0.1 MPa; (b) 0.3 MPa; (c) 0.4 MPa; (d) 0.5 MPa
Fig. 7. Arc motion image under different air pressure: (a) 0.1 MPa; (b) 0.3 MPa; (c) 0.4 MPa; (d) 0.5 MPa.
图 9 不同气压下击穿频率、放电模式
Fig. 9. Breakdown frequency and discharge mode under different air pressure.
图 10 常压下滑动弧放电的瞬时功率和能量
Fig. 10. Instantaneous power and energy of gliding arc discharge at atmospheric pressure.
图 12 大气压滑动弧放电发射光谱
Fig. 12. Emission spectra of atmospheric pressure sliding arc discharge.
图 13 不同气体压力条件下滑动弧放电发射光谱
Fig. 13. Emission spectra of sliding arc discharge under different gas pressures.
图 14 气体压力对活性粒子发射强度的影响
Fig. 14. Influence of gas pressure on emission intensity of active particles.
图 15 气体压力对电子激发温度的影响
Fig. 15. Influence of gas pressure on electron excitation temperature.
表 1 氮原子光谱数据
Table 1. Structural parameters of capillary of different kind of fluid.
λ/nm E/cm–1 A/s–1 g 391.9001 190120.24 7.56 × 107 3 399.4997 174212.03 1.22 × 108 5 
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[1] Lesueur H, Czernichowski A, Chapelle J F. R. Patent 2639172[1988]
[2] 杜长明 2015 非热电弧等离子体技术与应用 (北京: 化学工业出版社) 第15页
Du C M 2015 Non-Thermal Arc Plasma Technology and Application (Beijing: Chemical Industry Press) p15 (in Chinese)
[3] 张浩, 朱风森, 李晓东, 杜长明, 薄拯, 岑可法 2015 高电压技术 41 2930
Google Scholar
Zhang H, Zhu F S, Li X D, Du C M, Bao Z, Cen K F 2015 High Voltage Eng. 41 2930
Google Scholar
[4] 雷健平, 何立明, 陈一, 陈高成, 赵兵兵, 赵志宇, 张华磊, 邓俊, 费力 2020 物理学报 19 195203
Google Scholar
Lei J P, He L M, Chen Y, Chen G C, Zhao B B, Zhao Z Y, Zhang H L, Deng J, Fei L 2020 Acta Phys. Sin. 19 195203
Google Scholar
[5] Fridman A, Chirokov A, Gutsol A 2005 J. Phys. D:Appl. Phys. 38 1
Google Scholar
[6] Kim H S, Lee D H, Fridman A, Cho Y I 2014 Int. J. Heat Mass Transfer 77 1075
Google Scholar
[7] Kusano Y, Sorensen B F, Andersen T L, Toftegaard H L, Leipold F, Salewski M, Sun Z W, Zhu J J, Li Z S, Alden M 2013 J. Phys. D:Appl. Phys. 46 135203
Google Scholar
[8] 杜长明, 李俊岭, 严建华 2008 高电压技术 34 512
Du C M, Li J L, Yan J H 2008 High Voltage Eng. 34 512
[9] 于锦禄 2017 第三届全国青年燃烧学术会议 陕西西安 2017年4月14—17日 第1页
Yu J L 2017 The Third National Young Scholar Meeting on Combustion Research Conference Shaanxi xian, China, April 14–17, 2017 p1 (in Chinese)
[10] 何立明, 陈一, 刘兴建, 吴勇, 刘鹏飞, 张一汉 2016 高电压技术 42 1921
Google Scholar
He L M, Chen Y, Liu X J, Wu Y, Liu P F, Zhang Y H 2016 High Voltage Eng. 42 1921
Google Scholar
[11] Sun Z W, Zhu J J, Li Z S, Aldén M, Leipold F, Salewski M, Kusano Y 2013 Opt. Express 21 6028
Google Scholar
[12] Du C M, Shi T H, Sun Y W, Zhuang X F 2008 J. Hazard. Mater. 154 1192
Google Scholar
[13] 鲁娜, 孙丹凤, 王冰, 李杰, 吴彦 2018 高电压技术 44 1930
Google Scholar
Lu N, Sun D F, Wang B, Li J, Wu Y 2018 High Voltage Eng. 44 1930
Google Scholar
[14] Chen Z, Yu J L, Cheng W D, Jiang Y J, Jiang L Y, Tian Y, Zhang L 2021 J. Phys. D:Appl. Phys. 54 225203
Google Scholar
[15] Wu A J, Zhang H, Li X D, Lu S Y, Du C M, Yan J H 2015 IEEE Trans. Plasma Sci. 43 836
Google Scholar
[16] 汪宇, 李晓东, 余量, 严建华 2011 物理学报 60 035203
Google Scholar
Wang Y, Li X D, Yu L, Yan J H 2011 Acta Phys. Sin. 60 035203
Google Scholar
[17] Kolev S, Bogaerts A 2018 Plasma Sources Sci. Technol. 27 102704
[18] 张磊, 于锦禄, 陈一, 胡长淮, 蒋永健, 田裕 2021 航空学报 42 124308
Google Scholar
Zhang L, Yu J L, Chen Y, Hu C H, Jiang Y J, Tian Y 2021 Acta Aeronaut. Astronaut. Sin. 42 124308
Google Scholar
[19] Liu X, Subash A A, Bao Y, Hurtig T, Li Z S, Ehn A, Larfeldt J, Lörstad D, Nilson T, Fureby C 2021 American Institute of Aeronautics and Astronautics 2021 Scitech Forum Reston VA, USA, January 11–21, 2021 p0653
[20] 何立明, 于锦禄, 曾昊 2019 等离子体点火与助燃技术 (北京: 航空工业出版社) 第71页
He L M, Yu J L, Zeng H 2019 The Technology of Plasma Ignition and Assisted Combustion (Beijing: Aviation Industry Press) p71 (in Chinese)
[21] 柯以侃, 董慧茹 1998 分析化学手册(第三卷) (北京: 化学工业出版社) 第36页
Ke Y K, Dong H R 1998 Handbook of Analytical Chemistry (Vol. 3) (Beijing: Chemical Industry Press) p36 (in Chinese)
[22] 孙殿平 2019 物理实验 39 4
Google Scholar
Sun D P 2019 Physics Experimentation 39 4
Google Scholar
[23] Park H, Choe W 2010 Curr. Appl. Phys. 10 1456
Google Scholar
[24] 宋飞龙, 金迪, 贾敏, 宋志杰 2018 光谱学与光谱分析 38 1675
Song F L, Jin D, Jia M, Song Z J 2018 Spectrosc. Spectral. Anal. 38 1675
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