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中国物理学会期刊

多晶硅发射极高速双极晶体管质子单粒子效应

CSTR: 32037.14.aps.74.20250276

Proton single-event effects in high-speed polysilicon-emitter bipolar transistors

CSTR: 32037.14.aps.74.20250276
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  • 随着半导体工艺的发展, 具有深沟槽隔离(DTI)技术的双极晶体管因其优异的电气性能和隔离效果, 逐步应用于性能和集成度要求更高的先进半导体器件. 现有的双极晶体管单粒子效应研究表明, 深沟槽隔离技术会导致双极器件产生新的单粒子效应机制. 本文针对深沟槽隔离结构的多晶硅发射极双极晶体管, 开展了质子入射角度对其单粒子效应的影响研究. 实验结果表明, 质子入射角度会显著影响晶体管集电极的单粒子瞬态电压脉冲振幅. 利用Sentaurus TCAD软件模拟了多晶硅发射极双极晶体管的单粒子效应电荷收集过程, 根据模拟结果分析了深沟槽隔离器件的灵敏体积, 并基于Geant4蒙特卡罗模拟方法开展了质子不同角度入射深沟槽器件灵敏体积的模拟. 结果表明, 次级离子在灵敏体积内的积分截面会随着入射角度的增加而增大, 为深沟槽隔离双极晶体管的单粒子效应抗辐射加固提供了理论支撑.

     

    Deep-trench isolation (DTI) bipolar transistors have been increasingly adopted in high-performance, highly integrated advanced semiconductor devices due to their superior electrical characteristics and isolation capabilities. However, existing research has shown that DTI bipolar transistors exhibit a lower linear energy transfer (LET) threshold for single-event effects (SEEs) and a larger saturated cross-section than traditional structures, making the traditional rectangular parallelepiped (RPP) model unsuitable for such devices.
    In this study, we investigate the influence of proton incidence angle on single-event effects in high-speed DTI bipolar transistors. Proton multi-angle irradiation experiments reveal that the incidence angle significantly changes the amplitude characteristics of single-event transient voltage pulses at the collector. By introducing a nested sensitive volume in TCAD numerical simulations, the sensitive region of the DTI device is accurately defined. Geant4 simulations further demonstrate that with the increase of proton incidence angle, the integral cross-section of secondary ions in the sensitive volume significantly increases, which is determined to be the primary reason for the voltage amplitudes at the collector and base increasing with augment of tilt angle. This work provides theoretical support for radiation hardening of DTI bipolar transistors against single-event effects.

     

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