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The electron energy distribution function (EEDF) is usually assumed to be of the Maxwellian distribution in the fluid model in the simulation of high power microwave breakdown in gas. However, this assumption may lead to some large errors in the simulations. In this paper we compute the non-equilibrium EEDF via solving the Boltzmann equation directly, and incorporate it into the fluid model for argon breakdown. Numerical simulations show that the breakdown time obtained by the fluid model with the non-equilibrium EEDF accords well with the Particle-in-cell-Monte Carlo collision simulation result, while the Maxwellian EEDF has higher energy tail and results in faster breakdown time at low mean electron energy. Based on the non-equilibrium EEDF, the dependence of the breakdown threshold on the pressure predicted by the fluid model accord well with the argon breakdown experimental result.
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Keywords:
- microwave breakdown in gas /
- electron energy distribution function /
- fluid model /
- Boltzmann equation
[1] Zhou Q H, Dong Z W, Chen J Y 2011 Acta Phys. Sin. 60 125202 (in Chinese) [周前红, 董志伟, 陈京元 2011 物理学报 60 125202]
[2] Cai L B, Wang J G 2011 Acta Phys. Sin. 60 025217 (in Chinese) [蔡利兵, 王建国 2011 物理学报 60 025217]
[3] Yu D, Pang X, Jin X, Zhou D, Guo Y 2011 High Power Laser and Particle Beams 23 449 (in Chinese) [余道杰, 庞学民, 金晓磊, 周东方, 郭玉华 2011 强激光与粒子束 23 449]
[4] Zhang Z, Shao X, Zhang G, Li Y, Peng Z 2012 Acta Phys. Sin. 61 045205 (in Chinese) [张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕 2012 物理学报 61 045205]
[5] Cai L B, Wang J G, Zhu X, Wang Y, Xuan C, Xia H 2012 Acta Phys. Sin. 61 075101 (in Chinese) [蔡利兵, 王建国, 朱湘琴, 王玥, 宣春, 夏洪富 2012 物理学报 61 075101]
[6] Wang G P, Xiang F, Tan J, Cao S H, Luo M, Kang Q, Chang A B 2011 Acta Phys. Sin. 60 072901 (in Chinese) [王淦平, 向飞, 谭杰, 曹绍云, 罗敏, 康强, 常安壁 2011 物理学报 60 072901]
[7] Liu G Z, Liu J, Huang W, Zhou J, Song X, Ning H 2000 Chin. Phys. 9 757
[8] Chaudhury B, Boeuf J P 2010 IEEE Trans. Plasma Sci. 38 2281
[9] Nam S K, Verboncoeur J P 2009 Phys. Rev. Lett. 103 055004
[10] Balcon N, Hagelaar G J M, Boeuf J P 2008 IEEE Trans. Plasma Sci. 36 2782
[11] Yee J H, Alvarez R, Mayhall D J, Byrne D P, Degroot J 1986 Phys. Fluids 29 1238
[12] Kim J, Kuo S P, Kossey P 1995 J. Plasma Phys. 53 253
[13] Zhao P, Liao C, Lin W, Chang C, Fu H 2011 Phys. Plasmas 18 102111
[14] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 93 151504
[15] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol 14 722
[16] Zhao P, Liao C, Lin W 2011 J. of Electromagn. Waves and Appl. 25 2365
[17] Nam S K, Verboncoeur J P 2009 Computer Phys. Communications 180 628
[18] Kim H C, Verboncoeur J P 2006 Phys. Plasmas 13 123506
[19] Cook A, Shapiro M, Temkin R 2010 Appl. Phys. Lett. 97 011504
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[1] Zhou Q H, Dong Z W, Chen J Y 2011 Acta Phys. Sin. 60 125202 (in Chinese) [周前红, 董志伟, 陈京元 2011 物理学报 60 125202]
[2] Cai L B, Wang J G 2011 Acta Phys. Sin. 60 025217 (in Chinese) [蔡利兵, 王建国 2011 物理学报 60 025217]
[3] Yu D, Pang X, Jin X, Zhou D, Guo Y 2011 High Power Laser and Particle Beams 23 449 (in Chinese) [余道杰, 庞学民, 金晓磊, 周东方, 郭玉华 2011 强激光与粒子束 23 449]
[4] Zhang Z, Shao X, Zhang G, Li Y, Peng Z 2012 Acta Phys. Sin. 61 045205 (in Chinese) [张增辉, 邵先军, 张冠军, 李娅西, 彭兆裕 2012 物理学报 61 045205]
[5] Cai L B, Wang J G, Zhu X, Wang Y, Xuan C, Xia H 2012 Acta Phys. Sin. 61 075101 (in Chinese) [蔡利兵, 王建国, 朱湘琴, 王玥, 宣春, 夏洪富 2012 物理学报 61 075101]
[6] Wang G P, Xiang F, Tan J, Cao S H, Luo M, Kang Q, Chang A B 2011 Acta Phys. Sin. 60 072901 (in Chinese) [王淦平, 向飞, 谭杰, 曹绍云, 罗敏, 康强, 常安壁 2011 物理学报 60 072901]
[7] Liu G Z, Liu J, Huang W, Zhou J, Song X, Ning H 2000 Chin. Phys. 9 757
[8] Chaudhury B, Boeuf J P 2010 IEEE Trans. Plasma Sci. 38 2281
[9] Nam S K, Verboncoeur J P 2009 Phys. Rev. Lett. 103 055004
[10] Balcon N, Hagelaar G J M, Boeuf J P 2008 IEEE Trans. Plasma Sci. 36 2782
[11] Yee J H, Alvarez R, Mayhall D J, Byrne D P, Degroot J 1986 Phys. Fluids 29 1238
[12] Kim J, Kuo S P, Kossey P 1995 J. Plasma Phys. 53 253
[13] Zhao P, Liao C, Lin W, Chang C, Fu H 2011 Phys. Plasmas 18 102111
[14] Nam S K, Verboncoeur J P 2008 Appl. Phys. Lett. 93 151504
[15] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol 14 722
[16] Zhao P, Liao C, Lin W 2011 J. of Electromagn. Waves and Appl. 25 2365
[17] Nam S K, Verboncoeur J P 2009 Computer Phys. Communications 180 628
[18] Kim H C, Verboncoeur J P 2006 Phys. Plasmas 13 123506
[19] Cook A, Shapiro M, Temkin R 2010 Appl. Phys. Lett. 97 011504
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