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通过建立一个自洽耦合的一维流体模型来描述低气压氙气介质阻挡放电(DBD),并采用有限元法对模型进行数值仿真研究,得到了不同外加电压幅值和频率下的气体间隙压降、放电电流、介质表面电荷随时间的变化关系以及电子、离子、中性粒子和空间电场的时域分布.仿真结果表明:介质表面电荷对放电的点燃与熄灭起着关键的作用;在一个放电周期内,根据气体间隙压降的变化情况,介质表面电荷可按六个阶段进行分析;随着外施电压幅值的增加,间隙击穿逐渐提前至外施电压过零点之前发生,放电更为剧烈;随着外施电压频率的提高,气体间隙压降减小,间隙容易击穿,放电也更加均匀.粒子及空间电场的时域分布表明氙气DBD为典型的辉光放电.A self-consistent one-dimensional fluid coupled model is built to describe the low pressure xenon dielectric barrier discharge (DBD). And the finite-element method is employed to investigate gas voltages, discharge currents and the time evolutions of surface charges on dielectric barrier under different applied voltage amplitudes and frequencies. The spatial and temporal distributions of electrons, ions, excited, resonance, metastable particles and spatial electrical field are also achieved. The simulation results show that the surface charges accumulated on the dielectric barriers play a key role in the ignition and the extinguishment of the discharge. And based on the variation of gas voltage, the surface charging can be divided into six stages in one discharge cycle. With the increase of applied voltage amplitude, the gas gap breakdown moves ahead of the zero-crossing point of applied voltage gradually, and the discharge becomes more and more intense. Furthermore, with the increase of applied voltage frequency, the gas voltage decreases gradually, gas gap tends to breakdown, and discharge becomes uniform. Finally, spatiotemporal distributions of particles and electric field indicate that the xenon DBD is a typical glow discharge.
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Keywords:
- dielectric barrier discharge /
- fluid model /
- numerical computation /
- low temperature plasma
[1] Wang Y H, Wang D Z 2006 Acta Phys. Sin. 55 5923 (in Chinese)
[2] Carman R J, Mildren R P 2003 J. Phys. D 36 19
[3] Yurgelenas Y V, Wagner H E 2006 J. Phys. D 39 4031
[4] Luo H Y, Wang X X, Mao T, Liang Z, Lü B, Guan Z C, Wang L M 2008 Acta Phys. Sin. 57 4298 (in Chinese) [罗海云、王新新、毛 婷、梁 卓、吕 博、关志成、王黎明 2008 物理学报 57 4298]
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[7] Li G, Li Y M, Xu Y J, Zhang Y, Li H M, Nie C Q, Zhu J Q 2009 Acta Phys. Sin. 58 4026 (in Chinese) [李 钢、李轶明、徐燕骥、张 翼、李汉明、聂超群、朱俊强 2009 物理学报 58 4026]
[8] Li G, Xu Y J, Mu K J, Nie C Q, Zhu J Q, Zhang Y, Li H M 2008 Acta Phys.Sin. 57 6444 (in Chinese) [李 钢、徐燕骥、穆克进、聂超群、朱俊强、张 翼、李汉明 2008 物理学报 57 6444]
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[12] Wang Y H, Wang D Z 2005 Acta Phys. Sin. 54 1295 (in Chinese) [王艳辉、王德真 2005 物理学报 54 1295]
[13] Zhang Y, Gu B, Wang W C, Peng X W, Wang D Z 2009 Acta Phys. Sin. 58 5532 (in Chinese) [张 燕、顾 彪、王文春、彭许文、王德真 2009 物理学报 58 5532]
[14] Zhang H Y, Wang D Z, Wang X G 2007 Chin. Phys. 16 1089
[15] Li X C, Liu Z H, Jia P Y, Li L C, Yin Z Q, Dong L F 2007 Chin. Phys. 16 3016
[16] Yin Z Q, Chai Z F, Dong L F, Li X C 2003 Acta Phys. Sin. 52 925 (in Chinese) [尹增谦、柴志方、董丽芳、李雪辰 2003 物理学报 52 925]
[17] Li X C, Jia P Y, Liu Z H, Li L C, Dong L F 2008 Acta Phys. Sin. 57 1001 (in Chinese) [李雪辰、贾鹏英、刘志辉、李立春、董丽芳 2008 物理学报 57 1001]
[18] Eliasson B, Kogelschatz U 1988 Appl. Phys. B 46 299
[19] Mildren R P, Carman R J 2001 J. Phys. D 34 L1
[20] Oda A, Sakai Y, Akashi H, Sugawara H 1999 J. Phys. D 32 2726
[21] Xu Y L, Xu X J 2000 Phys. Scr. 62 76
[22] Cook. D C, Haydon S C 1984 IEE Proc. Sci. Meas. Tech. 131 145
[23] Cook D C, Haydon S C 1984 IEE Proc. Sci. Meas. Tech. 131 153
[24] Hagelaar G J M, Pitchford L C 2005 Plasma Source Sci. Tech. 14 722
[25] Hagelaar G J M 2000 Ph. D. Dissertation (Eindhoven: Eindhoven University of Technology)
[26] McDaniel E W, Mason E A 1973 The Mobility and Diffusion of Ions in Gases (New York: Wiley Press) p344
[27] Morrow R, Sato N 1999 J. Phys. D 32 L20
[28] Hagelaar G J M, de Hoog F J, Kroesen G M W 2000 Phys. Rev. E 62 1452
[29] Feng C Z, Ma X K 2000 An Introduction to Engineering Electromagnetic Field (Beijing: Higher Education Press) pp21,22 (in Chinese) [冯慈彰、马西奎 2000 工程电磁场导论 (北京:高等教育出版社)第21,22页]
[30] Codina R 1998 Comp. Meth. Appl. Mech. Eng. 156 185
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[1] Wang Y H, Wang D Z 2006 Acta Phys. Sin. 55 5923 (in Chinese)
[2] Carman R J, Mildren R P 2003 J. Phys. D 36 19
[3] Yurgelenas Y V, Wagner H E 2006 J. Phys. D 39 4031
[4] Luo H Y, Wang X X, Mao T, Liang Z, Lü B, Guan Z C, Wang L M 2008 Acta Phys. Sin. 57 4298 (in Chinese) [罗海云、王新新、毛 婷、梁 卓、吕 博、关志成、王黎明 2008 物理学报 57 4298]
[5] Wang X X, Lu M Z, Pu Y K 2002 Acta Phys. Sin. 51 2778 (in Chinese) [王新新、芦明泽、蒲以康 2002 物理学报 51 2778]
[6] Dong L F, Mao Z G, Ran J X 2005 Chin. Phys. 14 1618
[7] Li G, Li Y M, Xu Y J, Zhang Y, Li H M, Nie C Q, Zhu J Q 2009 Acta Phys. Sin. 58 4026 (in Chinese) [李 钢、李轶明、徐燕骥、张 翼、李汉明、聂超群、朱俊强 2009 物理学报 58 4026]
[8] Li G, Xu Y J, Mu K J, Nie C Q, Zhu J Q, Zhang Y, Li H M 2008 Acta Phys.Sin. 57 6444 (in Chinese) [李 钢、徐燕骥、穆克进、聂超群、朱俊强、张 翼、李汉明 2008 物理学报 57 6444]
[9] Massines F, Rabehi A, Decomps P, Gadri R B, Ségur P, Mayoux C 1998 J. Appl. Phys. 83 2950
[10] Stollenwerk L, Amiranashvili S, Boeuf J P, Pirwins H G 2006 Phys. Rev. Lett. 96 255001
[11] Wang Y H, Wang D Z 2003 Acta Phys. Sin. 52 1694 (in Chinese) [王艳辉、王德真 2003 物理学报 52 1694]
[12] Wang Y H, Wang D Z 2005 Acta Phys. Sin. 54 1295 (in Chinese) [王艳辉、王德真 2005 物理学报 54 1295]
[13] Zhang Y, Gu B, Wang W C, Peng X W, Wang D Z 2009 Acta Phys. Sin. 58 5532 (in Chinese) [张 燕、顾 彪、王文春、彭许文、王德真 2009 物理学报 58 5532]
[14] Zhang H Y, Wang D Z, Wang X G 2007 Chin. Phys. 16 1089
[15] Li X C, Liu Z H, Jia P Y, Li L C, Yin Z Q, Dong L F 2007 Chin. Phys. 16 3016
[16] Yin Z Q, Chai Z F, Dong L F, Li X C 2003 Acta Phys. Sin. 52 925 (in Chinese) [尹增谦、柴志方、董丽芳、李雪辰 2003 物理学报 52 925]
[17] Li X C, Jia P Y, Liu Z H, Li L C, Dong L F 2008 Acta Phys. Sin. 57 1001 (in Chinese) [李雪辰、贾鹏英、刘志辉、李立春、董丽芳 2008 物理学报 57 1001]
[18] Eliasson B, Kogelschatz U 1988 Appl. Phys. B 46 299
[19] Mildren R P, Carman R J 2001 J. Phys. D 34 L1
[20] Oda A, Sakai Y, Akashi H, Sugawara H 1999 J. Phys. D 32 2726
[21] Xu Y L, Xu X J 2000 Phys. Scr. 62 76
[22] Cook. D C, Haydon S C 1984 IEE Proc. Sci. Meas. Tech. 131 145
[23] Cook D C, Haydon S C 1984 IEE Proc. Sci. Meas. Tech. 131 153
[24] Hagelaar G J M, Pitchford L C 2005 Plasma Source Sci. Tech. 14 722
[25] Hagelaar G J M 2000 Ph. D. Dissertation (Eindhoven: Eindhoven University of Technology)
[26] McDaniel E W, Mason E A 1973 The Mobility and Diffusion of Ions in Gases (New York: Wiley Press) p344
[27] Morrow R, Sato N 1999 J. Phys. D 32 L20
[28] Hagelaar G J M, de Hoog F J, Kroesen G M W 2000 Phys. Rev. E 62 1452
[29] Feng C Z, Ma X K 2000 An Introduction to Engineering Electromagnetic Field (Beijing: Higher Education Press) pp21,22 (in Chinese) [冯慈彰、马西奎 2000 工程电磁场导论 (北京:高等教育出版社)第21,22页]
[30] Codina R 1998 Comp. Meth. Appl. Mech. Eng. 156 185
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