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In this paper, the effect of the coil structure, as well as the gas pressure, on the spatial distribution of an inductively coupled argon plasma is numerically investigated based on a self-developed three-dimensional fluid model. The model is based on a modified ambipolar diffusion model, in which the electron density is solved by quasi-neutral condition, the ion density and neutral particle density are obtained by solving continuity equations, and the ion flux is achieved by solving the full momentum balance equation. In addition, the inductive electric field is governed by the Maxwell equations, which are solved in the frequency domain. The results show that the electron density is nonuniform along the azimuthal direction due to the asymmetry of the coil structure, and the uniformity becomes better as gas pressure decreases. Besides, the plasma azimuthal uniformity can also be improved by reducing the opening of the coil. As the coil radius enlarges, the plasma density decreases, while the plasma radial uniformity becomes better, and the azimuthal uniformity becomes worse. In addition, the effect of the current amplitude ratio of the inner and outer coils on the plasma uniformity is also investigated in dual-coil discharges. It is found that the plasma radial uniformity becomes better by decreasing the inter-to-outer coil current amplitude ratio. The results obtained in this work demonstrate that the plasma uniformity can be improved by optimizing the coil structure and adjusting the discharge parameters, which is of significant importance for etching and deposition processes.
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Keywords:
- Inductively coupled plasma /
- Three-dimensional fluid simulation /
- plasma uniformity /
- coil structure
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[1] Lieberman M A, Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (New York: Wiley) pp350-351
[2] Wang Y N, Song Y H, Zhang Y R 2024 Fundamentals of Radio-frequency Plasma Physics (Beijing: Science Press) p314 (in Chinese) [王友年，宋远红，张钰如 2024 射频等离子体物理基础(北京:科学出版社) 第314页]
[3] Rauf S, Kenney J, Collins K S 2009 J. Appl. Phys. 105 103301
[4] Kenney J, Rauf S, Collins K S 2009 J. Appl. Phys. 106 103302
[5] Agarwal A, Bera K, Kenney J, Likhanskii A, Rauf S 2017 J. Phys. D: Appl. Phys. 50 424001
[6] Ventzek P L, Sommerer T J, Hoekstra R J, Kushner M J 1993 Appl. Phys. Lett. 63 605
[7] Thorsteinsson E, Gudmundsson J 2010 J. Phys. D: Appl. Phys. 43 115201
[8] Thorsteinsson E, Gudmundsson J 2010 J. Phys. D: Appl. Phys. 43 115202
[9] Hjartarson A, Thorsteinsson E, Gudmundsson J 2010 Plasma Sources Sci. Technol. 19 065008
[10] Takao Y, Kusaba N, Eriguchi K, Ono K 2010 J. Appl. Phys. 108 093309
[11] Mattei S, Nishida K, Onai M, Lettry L, Tran M Q, Hatayama A 2017 J. Comput. Phys 350 891
[12] Kushner M J 2009 J. Phys. D: Appl. Phys. 42 194013
[13] Sun X Y, Zhang Y R, Li X C, Wang Y N 2015 Phys. Plasmas 22 053508
[14] Wang Y H, Wei L, Zhang Y R, Wang Y N 2015 Chin. Phys. B 24 095203.
[15] Wu H M, Yu B W, Li M, Yang Y 2002 IEEE Trans. Plasma Sci 25 1
[16] Kushner M J, Collison W Z, Grapperhaus M J, Holland J P, Barnes M S 1996 J. Appl. Phys. 80 1337
[17] Panagopoulos T, Kim D, Midha V, Economou D J 2002 J. Appl. Phys. 91 2687
[18] Brcka J 2016 Jpn.J.Appl.Phys 55 07LD08
[19] Zhao M L, Zhang Y R, Gao F, Song Y H, Wang Y N 2023 Chin. J. Theor. Appl. Mech. 55 2891 (in Chinese) [赵明亮，张钰如，高飞，宋远红，王友年 2023 力学学报 55 2891]
[20] De Bleecker K, Bogaerts A, Gijbels R, Goedheer W 2004 Phys. Rev. E 69 056409
[21] Ariskin D, Schweigert I, Alexandrov A, Bogaerts A, Peeters F M 2009 J. Appl. Phys. 105 063305
[22] Lee C, Lieberman M. 1995 J. Vac. Sci. Technol. A 13 368
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