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利用X 射线衍射(XRD)和X射线吸收精细结构(XAFS)方法研究了磁控共溅射方法制备的MnxGe1-x薄膜样品的结构随掺杂磁性原子Mn含量的变化规律.XRD结果表明，在Mn的含量较低(7.0%)的Mn0.07Ge0.93样品中，只能观察到对应于多晶Ge的XRD衍射峰，而对Mn含量较高(25.0%, 36.0%)的Mn0.25Ge0.75和Mn
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关键词:
- 磁控溅射 /
- XRD /
- XAFS /
- MnxGe1-x稀磁半导体薄膜
The structure of MnxGe1-x dilute magnetic semiconductor thin films prepared by magnetron co-sputtering has been studied by X-ray diffraction (XRD) and X-ray absorption fine structure (XAFS) techniques. The XRD results show that in the MnxGe1-x thin film with low Mn doping concentration (x=0.070), only diffraction peaks attributed to crystalline Ge can be observed. In samples with high Mn doping concentrations (x=0.250, 0.360), the secondary phase Ge3Mn5 appears, and its content enhances with Mn doping concentration. The XAFS results indicate that for the Mn0.07Ge0.93 thin film, Mn atoms are mainly incorporated into the Ge lattice and located at the substitutional sites of Ge atoms with the ratio of 75%, while for the Mn0.25Ge0.75 and Mn0.36Ge0.64 samples, most of the Mn atoms are aggregated to form Ge3Mn5.-
Keywords:
- magnetron sputtering /
- XRD /
- XAFS /
- MnxGe1-x dilute magnetic semiconductor thin films
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物理学报. 2007, 56(9): 5471-5475.
doi: 10.7498/aps.56.5471.
MnxGe1－x稀磁半导体薄膜的结构研究
- 收稿日期: 2007-01-23
- 修回日期: 2007-02-25
- 刊出日期: 2007-09-20
摘要: 利用X 射线衍射(XRD)和X射线吸收精细结构(XAFS)方法研究了磁控共溅射方法制备的MnxGe1-x薄膜样品的结构随掺杂磁性原子Mn含量的变化规律.XRD结果表明，在Mn的含量较低(7.0%)的Mn0.07Ge0.93样品中，只能观察到对应于多晶Ge的XRD衍射峰，而对Mn含量较高(25.0%, 36.0%)的Mn0.25Ge0.75和Mn
关键词:
English Abstract
Structure of MnxGe1－x dilute magnetic semiconductor films
- Received Date:
23 January 2007
- Accepted Date:
25 February 2007
- Published Online:
20 September 2007
Abstract: The structure of MnxGe1-x dilute magnetic semiconductor thin films prepared by magnetron co-sputtering has been studied by X-ray diffraction (XRD) and X-ray absorption fine structure (XAFS) techniques. The XRD results show that in the MnxGe1-x thin film with low Mn doping concentration (x=0.070), only diffraction peaks attributed to crystalline Ge can be observed. In samples with high Mn doping concentrations (x=0.250, 0.360), the secondary phase Ge3Mn5 appears, and its content enhances with Mn doping concentration. The XAFS results indicate that for the Mn0.07Ge0.93 thin film, Mn atoms are mainly incorporated into the Ge lattice and located at the substitutional sites of Ge atoms with the ratio of 75%, while for the Mn0.25Ge0.75 and Mn0.36Ge0.64 samples, most of the Mn atoms are aggregated to form Ge3Mn5.
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