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Li Liu-He, Liu Hong-Tao, Luo Ji, Xu Yi. Plasma distribution properties of vacuum ribbon-like cathodic arc plasma fliter and Raman studies of diamond-like carbon films perpared by it. Acta Physica Sinica,
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He Su-Ming, Dai Shan-Shan, Luo Xiang-Dong, Zhang Bo, Wang Jin-Bin. Preparation of SiON film by plasma enhanced chemical vapor deposition and passivation on Si. Acta Physica Sinica,
2014, 63(12): 128102.
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2013, 62(1): 017802.
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Han Liang, Ning Tao, Liu De-Lian, He Liang. The study on the stress and the friction coefficient of tetrahedral amorphous carbon films bombarded by energetic Ar ion. Acta Physica Sinica,
2012, 61(17): 176801.
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Liu Yan-Yan, Bauer-Grosse E., Zhang Qing-Yu. Structure and growth behavior of low N-doped diamond film by microwave plasma assisted chemical vapor deposition. Acta Physica Sinica,
2007, 56(4): 2359-2368.
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2004, 53(12): 4410-4413.
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Yang Wu-Bao, Wang Jiu-Li, Zhang Gu-Ling, Fan Song-Hua, Liu Chi-Zi, Yang Si-Ze. Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method. Acta Physica Sinica,
2004, 53(9): 3099-3103.
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Yang Hui-Dong, Wu Chun-Ya, Zhao Ying, Xue Jun-Ming, Geng Xin-Hua, Xiong Shao-Zhen. Investigation on the oxygen contamination in the μc-Si∶H thin film deposited b y VHF-PECVD. Acta Physica Sinica,
2003, 52(11): 2865-2869.
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2001, 50(4): 784-789.
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2000, 49(11): 2310-2314.
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1999, 48(12): 2382-2388.
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